Patents by Inventor Yujie Han

Yujie Han has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12285793
    Abstract: A forming device and a forming method for a part with a regular cross-section are provided, and relates to the technical field of metal member forming and manufacturing. A part to be formed is heated by a part heating temperature control assembly to obtain required microstructure evolution, so that the forming performance is improved. A temperature control die assembly can be heated by setting die heating assemblies, so that hot stamping, die quenching and stress relaxation can be carried out. The internal stress state of the part is controlled by an axial force control assembly.
    Type: Grant
    Filed: March 31, 2024
    Date of Patent: April 29, 2025
    Assignees: DALIAN UNIVERSITY OF TECHNOLOGY, AVIC MANUFACTURING TECHNOLOGY INSTITUTE
    Inventors: Kailun Zheng, Dechong Li, Lihua Du, Yujie Han
  • Publication number: 20250083209
    Abstract: A forming device and a forming method for a part with a regular cross-section are provided, and relates to the technical field of metal member forming and manufacturing. A part to be formed is heated by a part heating temperature control assembly to obtain required microstructure evolution, so that the forming performance is improved. A temperature control die assembly can be heated by setting die heating assemblies, so that hot stamping, die quenching and stress relaxation can be carried out. The internal stress state of the part is controlled by an axial force control assembly.
    Type: Application
    Filed: March 31, 2024
    Publication date: March 13, 2025
    Inventors: Kailun ZHENG, Dechong LI, Lihua DU, Yujie HAN
  • Patent number: 6864190
    Abstract: Disclosed is a process for fabricating luminescent porous material, the process comprising pre-treating a substrate (e.g. crystalline silicon) with laser radiation (e.g from a Nd:YAG laser) in a predetermined pattern followed by exposing the irradiated substrate to a chemical stain etchant (e.g. HF:HNO3:H2O) to produce a luminescent nanoporous material. Luminescent porous material having a luminescence maximum greater than about 2100 meV may be produced by this method. Such nanoporous materials are useful in optoelectronic and other semiconductor devices.
    Type: Grant
    Filed: October 17, 2002
    Date of Patent: March 8, 2005
    Assignee: National Research Council of Canada
    Inventors: Yujie Han, Suwas Nikumb, Ben Li Luan, John Nagata
  • Publication number: 20040076813
    Abstract: Disclosed is a process for fabricating luminescent porous material, the process comprising pre-treating a substrate (e.g. crystalline silicon) with laser radiation (e.g from a Nd:YAG laser) in a predetermined pattern followed by exposing the irradiated substrate to a chemical stain etchant (e.g. HF:HNO3:H2O) to produce a luminescent nanoporous material. Luminescent porous material having a luminescence maximum greater than about 2100 meV may be produced by this method. Such nanoporous materials are useful in optoelectronic and other semiconductor devices.
    Type: Application
    Filed: October 17, 2002
    Publication date: April 22, 2004
    Applicant: NATIONAL RESEARCH COUNCIL OF CANADA
    Inventors: Yujie Han, Suwas Krishna Nikumb, Ben Li Luan, John Nagata