Patents by Inventor Yuka ISHIDA

Yuka ISHIDA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polishing composition for magnetic disk substrate
    Patent number: 10844243
    Abstract: Embodiments relate to a polishing composition including colloidal silica, pulverized wet-process silica particles, and at least one of a nitrogen-containing organic compound and a nitrogen-containing polymer compound. According to another embodiment, the polishing composition includes colloidal silica, pulverized wet-process silica particles, and a copolymer containing a monomer having a carboxylic acid group and a monomer having a sulfonic acid group as essential monomers. According to another embodiment, the polishing composition includes colloidal silica, pulverized wet-process silica particles, a nitrogen-containing organic compound and/or a nitrogen-containing polymer compound, and a copolymer containing a monomer having a carboxylic acid group and a monomer having a sulfonic acid group as essential monomers.
    Type: Grant
    Filed: July 3, 2018
    Date of Patent: November 24, 2020
    Assignee: YAMAGUCHI SEIKEN KOGYO CO., LTD.
    Inventors: Toru Iwata, Akina Ban, Yuka Ishida
  • POLISHING COMPOSITION FOR MAGNETIC DISK SUBSTRATE
    Publication number: 20190010358
    Abstract: Embodiments relate to a polishing composition including colloidal silica, pulverized wet-process silica particles, and at least one of a nitrogen-containing organic compound and a nitrogen-containing polymer compound. According to another embodiment, the polishing composition includes colloidal silica, pulverized wet-process silica particles, and a copolymer containing a monomer having a carboxylic acid group and a monomer having a sulfonic acid group as essential monomers. According to another embodiment, the polishing composition includes colloidal silica, pulverized wet-process silica particles, a nitrogen-containing organic compound and/or a nitrogen-containing polymer compound, and a copolymer containing a monomer having a carboxylic acid group and a monomer having a sulfonic acid group as essential monomers.
    Type: Application
    Filed: July 3, 2018
    Publication date: January 10, 2019
    Applicant: YAMAGUCHI SEIKEN KOGYO CO., LTD.
    Inventors: Toru IWATA, Akina BAN, Yuka ISHIDA