Patents by Inventor Yuka ZENITANI

Yuka ZENITANI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12162769
    Abstract: Silica particles have silica base particles, a structure that covers at least a part of a surface of the silica base particles and is configured with a reaction product of a trifunctional silane coupling agent, and a nitrogen element-containing compound, in which a content of the nitrogen element-containing compound with respect to the silica particles is 0.005% by mass or more and 0.50% by mass or less in terms of N atoms, and the silica particles have a degree of hydrophobicity of 10% or more and 60% or less and a volume resistivity of 1×108 ?·cm or more and 1×1012.5 ?·cm or less.
    Type: Grant
    Filed: January 27, 2022
    Date of Patent: December 10, 2024
    Assignee: FUJIFILM Business Innovation Corp.
    Inventors: Koji Sasaki, Sakae Takeuchi, Yuka Zenitani, Yoshifumi Eri, Mai Mochida
  • Patent number: 12077443
    Abstract: Silica particles include a nitrogen-containing compound. When the volumes of pores having a diameter of 1 nm or more and 50 nm or less, the volumes being determined from a pore size distribution curve of the silica particles before and after the silica particles are baked at 350° C., the pore size distribution curve being obtained by nitrogen gas adsorption, are defined as A and B, respectively, B/A is 1.2 or more and 5 or less and B is 0.2 cm3/g or more and 3 cm3/g or less.
    Type: Grant
    Filed: February 2, 2022
    Date of Patent: September 3, 2024
    Assignee: FUJIFILM Business Innovation Corp.
    Inventors: Yuka Zenitani, Sakae Takeuchi, Koji Sasaki, Yoshifumi Eri, Mai Mochida
  • Publication number: 20240126186
    Abstract: A silica particle contains a nitrogen-containing compound, ?/? is 0.30 or greater and 0.80 or less, where ? and ? are the BET specific surface areas of the silica particle before and after baking at 350° C., respectively, and the absolute ratio of the triboelectric series of the silica particle before baking at 350° C. to that of the silica particle after baking at 350° C. is 0.10 1or greater and 0.85 or less.
    Type: Application
    Filed: September 18, 2023
    Publication date: April 18, 2024
    Applicant: FUJIFILM Business Innovation Corp.
    Inventors: Kota NOHARA, Sakae TAKEUCHI, Yuka ZENITANI, Hajime SUGAHARA, Mai MOCHIDA, Mieko SEKI
  • Publication number: 20240118645
    Abstract: A silica particle is provided in which a pore size distribution curve obtained by nitrogen gas adsorption of the silica particle after baking at 350° C. has at least one peak at a pore diameter of 2 nm or less and at least one peak at a pore diameter of more than 2 nm and 50 nm or less, and D/B is 0.50 or greater and 2.50 or less, where D and B are the volumes of pores having a diameter of 2 nm or less and a diameter of 2 nm or more and 25 nm or less, respectively, determined from the pore size distribution curve obtained by nitrogen gas adsorption of the silica particle after baking at 350° C.
    Type: Application
    Filed: September 18, 2023
    Publication date: April 11, 2024
    Applicant: FUJIFILM Business Innovation Corp.
    Inventors: Mai MOCHIDA, Sakae TAKEUCHI, Yuka ZENITANI, Hajime SUGAHARA, Mieko SEKI, Kota NOHARA
  • Publication number: 20240118644
    Abstract: Silica particles having silica base particles, a coating structure that coats the silica base particles and is composed of a reaction product of a trifunctional silane compound, and a nitrogen element-containing compound that has adhered to the coating structure and contains a molybdenum element, in which in a molybdenum element map created by SEM-EDX, a ratio of a total area of a region forming a lump having a long diameter of 500 nm or more is 5% or less to a total area of the molybdenum element.
    Type: Application
    Filed: May 7, 2023
    Publication date: April 11, 2024
    Applicant: FUJIFILM Business Innovation Corp.
    Inventors: Mieko SEKI, Sakae TAKEUCHI, Yuka ZENITANI, Hajime SUGAHARA, Mai MOCHIDA, Kota NOHARA
  • Publication number: 20240109781
    Abstract: A manufacturing method of silica particles includes coating of forming a coating structure composed of a reaction product of a trifunctional silane compound on a surface of silica base particles, attaching a nitrogen element-containing compound containing a molybdenum element to the coating structure in a reaction solution which contains water, an alcohol, silica particles having the coating structure composed of the reaction product of the trifunctional silane compound, the nitrogen element-containing compound containing the molybdenum element, and at least one compound selected from the group consisting of ammonia and an amine and in which a total amount of ammonia and an amine is 0.2% by mass or more and 4.5% by mass or less, and drying of removing the water and the alcohol from the reaction solution.
    Type: Application
    Filed: May 14, 2023
    Publication date: April 4, 2024
    Applicant: FUJIFILM Business Innovation Corp.
    Inventors: Hajime SUGAHARA, Sakae TAKEUCHI, Yuka ZENITANI, Mai MOCHIDA, Kota NOHARA, Mieko SEKI
  • Publication number: 20240092645
    Abstract: A silica particle includes: a quaternary ammonium salt, in which the following expressions are satisfied, 0.90?FBEFORE/FAFTER?1.10, and 5?FSINTERING/FBEFORE?20, in which FBEFORE represents a maximum frequency value of a pore diameter of 2 nm or less in the silica particles before washing, which is obtained from a pore distribution curve in a nitrogen gas adsorption method, FAFTER represents a maximum frequency value of the pore diameter of 2 nm or less in the silica particles after washing, which is obtained from the pore distribution curve in the nitrogen gas adsorption method, and FSINTERING represents a maximum frequency value of the pore diameter of 2 nm or less in the silica particles before washing and after sintering at 600° C., which is obtained from the pore distribution curve in the nitrogen gas adsorption method.
    Type: Application
    Filed: November 21, 2023
    Publication date: March 21, 2024
    Applicant: FUJIFILM Business Innovation Corp.
    Inventors: Yuka Zenitani, Koji Sasaki, Sakae Takeuchi, Yoshifumi Eri, Takahiro Mizuguchi
  • Patent number: 11891544
    Abstract: A pressure sensitive adhesive particle includes a pressure sensitive adhesive base particle that contains a styrene resin containing styrene and a vinyl monomer other than styrene as polymerization components, and a (meth)acrylate resin containing at least two (meth)acrylates as polymerization components, in which a mass ratio of the (meth)acrylates relative to a total of polymerization components of the (meth)acrylate resin is 90 mass % or more; and an external additive. The pressure sensitive adhesive particle has a surface having an arithmetic average roughness Ra within a range of 0.005 ?m to 0.100 ?m. The pressure sensitive adhesive particle has at least two glass transition temperatures, and the difference between the lowest glass transition temperature and the highest glass transition temperature among the glass transition temperatures of the pressure sensitive adhesive particle is 30° C. or more.
    Type: Grant
    Filed: August 26, 2020
    Date of Patent: February 6, 2024
    Assignee: FUJIFILM Business Innovation Corp.
    Inventors: Yoshifumi Iida, Sachiko Nishioka, Takashi Hasegawa, Hajime Sugahara, Satomi Kashiwagi, Yuka Zenitani, Satoshi Inoue
  • Patent number: 11866340
    Abstract: A silica particle includes: a quaternary ammonium salt, in which the following expressions are satisfied, 0.90?FBEFORE/FAFTER?1.10, and 5?FSINTERING/FBEFORE?20, in which FBEFORE represents a maximum frequency value of a pore diameter of 2 nm or less in the silica particles before washing, which is obtained from a pore distribution curve in a nitrogen gas adsorption method, FAFTER represents a maximum frequency value of the pore diameter of 2 nm or less in the silica particles after washing, which is obtained from the pore distribution curve in the nitrogen gas adsorption method, and FSINTERING represents a maximum frequency value of the pore diameter of 2 nm or less in the silica particles before washing and after sintering at 600° C., which is obtained from the pore distribution curve in the nitrogen gas adsorption method.
    Type: Grant
    Filed: August 19, 2020
    Date of Patent: January 9, 2024
    Assignee: FUJIFILM Business Innovation Corp.
    Inventors: Yuka Zenitani, Koji Sasaki, Sakae Takeuchi, Yoshifumi Eri, Takahiro Mizuguchi
  • Publication number: 20240002637
    Abstract: Resin particles include resin base particles and silica particles on surfaces of the resin base particles. The silica particles contain a quaternary ammonium salt and have hydrophobized surfaces. A difference (detection temperature A?detection temperature B) between a detection temperature A and a detection temperature B is more than 50° C., where the detection temperature A is a detection temperature from a pyrolysis product of the quaternary ammonium salt determined by pyrolysis mass spectrometry of the resin particles before cleaning, and the detection temperature B is a detection temperature from the pyrolysis product of the quaternary ammonium salt determined by pyrolysis mass spectrometry of the resin particles after cleaning.
    Type: Application
    Filed: September 19, 2023
    Publication date: January 4, 2024
    Applicant: FUJIFILM Business Innovation Corp.
    Inventors: Koji SASAKI, Takahiro MIZUGUCHI, Yuka ZENITANI, Sakae TAKEUCHI, Yoshifumi ERI
  • Patent number: 11795302
    Abstract: Resin particles include resin base particles and silica particles on surfaces of the resin base particles. The silica particles contain a quaternary ammonium salt and have hydrophobized surfaces. A difference (detection temperature A?detection temperature B) between a detection temperature A and a detection temperature B is more than 50° C., where the detection temperature A is a detection temperature from a pyrolysis product of the quaternary ammonium salt determined by pyrolysis mass spectrometry of the resin particles before cleaning, and the detection temperature B is a detection temperature from the pyrolysis product of the quaternary ammonium salt determined by pyrolysis mass spectrometry of the resin particles after cleaning.
    Type: Grant
    Filed: January 25, 2021
    Date of Patent: October 24, 2023
    Assignee: FUJIFILM Business Innovation Corp.
    Inventors: Koji Sasaki, Takahiro Mizuguchi, Yuka Zenitani, Sakae Takeuchi, Yoshifumi Eri
  • Publication number: 20230107000
    Abstract: An electrostatic charge image developing toner has toner particles and silica particles that are added to an exterior of the toner particles and contain a nitrogen element-containing compound, in which in a case where A represents a pore volume of pores of the silica particles having a diameter of 1 nm or more and 50 nm or less determined from a pore size distribution curve obtained by a nitrogen adsorption method before baking at 350° C., and B represents a pore volume of pores of the silica particles having a diameter of 1 nm or more and 50 nm or less determined from a pore size distribution curve obtained by a nitrogen adsorption method after baking at 350° C., B/A is 1.2 or more and 5 or less, and B is 0.2 cm3/g or more and 3 cm3/g or less.
    Type: Application
    Filed: May 20, 2022
    Publication date: April 6, 2023
    Applicant: FUJIFILM Business Innovation Corp.
    Inventors: Yuka ZENITANI, Shimpei TAKAGI, Sakae TAKEUCHI, Koji SASAKI, Yoshifumi ERI, Mai MOCHIDA
  • Publication number: 20230108365
    Abstract: An electrostatic charge image developing toner has toner particles and silica particles that are added to an exterior of the toner particles, contain a nitrogen element-containing compound, have a ratio C/D of 0.10 or more and 0.75 or less where C represents an integral value of signals observed in a range of chemical shift of ?50 ppm or more and ?75 ppm or less in a 29Si solid-state nuclear magnetic resonance (NMR) spectrum obtained by a cross-polarization/magic angle spinning (CP/MAS) method and D represents an integral value of signals observed in a range of chemical shift of ?90 ppm or more and ?120 ppm or less in the same spectrum, have an extraction amount X of the nitrogen element-containing compound by a mixed solution of ammonia/methanol of 0.1% by mass or more, and satisfy Expression: Y/X<0.
    Type: Application
    Filed: April 1, 2022
    Publication date: April 6, 2023
    Applicant: FUJIFILM Business Innovation Corp.
    Inventors: Sakae TAKEUCHI, Shimpei TAKAGI, Yuka ZENITANI, Koji SASAKI, Yoshifumi ERI, Mai MOCHIDA
  • Publication number: 20230095411
    Abstract: An electrostatic charge image developing toner contains toner particles and silica particles that are added to an exterior of the toner particles and contain a nitrogen element-containing compound containing a molybdenum element, in which in the silica particles, a ratio (Mo/Si) of Net intensity of the molybdenum element to Net intensity of a silicon element measured by X-ray fluorescence analysis is 0.035 or more and 0.35 or less.
    Type: Application
    Filed: April 25, 2022
    Publication date: March 30, 2023
    Applicant: FUJIFILM Business Innovation Corp.
    Inventors: Shimpei TAKAGI, Sakae TAKEUCHI, Yuka ZENITANI, Koji SASAKI, Yoshifumi ERI, Mai MOCHIDA
  • Patent number: 11535757
    Abstract: An organic substance-attached porous inorganic oxide particle including porous inorganic oxide particle and an organic substance attached to the surface of the porous inorganic oxide particle. The organic substance-attached porous inorganic oxide particle satisfies a formula below (Cf?Ce)/2>1 where Cf represents the amount of carbon (atom %) measured by subjecting the surface of the particle to X-ray photoelectron spectroscopy (XPS) after the particle is washed, and Ce represents the amount of carbon (atom %) measured by subjecting the surface of the particle to X-ray photoelectron spectroscopy (XPS) after two-minute surface etching of the particle.
    Type: Grant
    Filed: June 17, 2020
    Date of Patent: December 27, 2022
    Assignee: FUJIFILM Business Innovation Corp.
    Inventors: Yoshifumi Eri, Takahiro Mizuguchi, Sakae Takeuchi, Yuka Zenitani, Koji Sasaki
  • Patent number: 11535756
    Abstract: A method for producing a silica composite particle including a silica particle and at least one compound in which an aluminum atom bonds to an organic group through oxygen. The method includes: (i) providing a silica particle dispersion liquid having a silica particle content of about 20 mass % or more; (ii) mixing and reacting a compound represented by formula (S1) and the silica particle dispersion liquid to obtain a slurry; (iii) providing the at least one compound; and (iv) then mixing and reacting the slurry with the at least one compound to form the silica composite particle.
    Type: Grant
    Filed: June 21, 2019
    Date of Patent: December 27, 2022
    Assignee: FUJIFILM Business Innovation Corp.
    Inventors: Koji Sasaki, Hiroyoshi Okuno, Yoshifumi Iida, Yuka Zenitani, Masahiro Takayama, Masashi Ikeda, Shunsuke Nozaki
  • Publication number: 20220315431
    Abstract: Silica particles include a nitrogen-containing compound. When the volumes of pores having a diameter of 1 nm or more and 50 nm or less, the volumes being determined from a pore size distribution curve of the silica particles before and after the silica particles are baked at 350° C., the pore size distribution curve being obtained by nitrogen gas adsorption, are defined as A and B, respectively, B/A is 1.2 or more and 5 or less and B is 0.2 cm3/g or more and 3 cm3/g or less.
    Type: Application
    Filed: February 2, 2022
    Publication date: October 6, 2022
    Applicant: FUJIFILM Business Innovation Corp.
    Inventors: Yuka ZENITANI, Sakae Takeuchi, Koji Sasaki, Yoshifumi Eri, Mai Mochida
  • Publication number: 20220315432
    Abstract: Silica particles contain a nitrogen element-containing compound containing a molybdenum element, in which a ratio (Mo/Si) of Net intensity of the molybdenum element to Net intensity of a silicon element measured by X-ray fluorescence analysis is 0.035 or more and 0.35 or less.
    Type: Application
    Filed: January 26, 2022
    Publication date: October 6, 2022
    Applicant: FUJIFILM Business Innovation Corp.
    Inventors: Yuka ZENITANI, Sakae TAKEUCHI, Koji SASAKI, Yoshifumi ERI, Mai MOCHIDA
  • Publication number: 20220306866
    Abstract: Silica particles includes a nitrogen-containing compound. The ratio of the integral C of a signal observed at a chemical shift of ?50 ppm or more and ?75 ppm or less in a 29Si solid-state nuclei magnetic resonance (NMR) spectrum of the silica particles, the 29Si solid-state NMR spectrum being obtained by cross polarization/magic angle spinning (CP/MAS), to the integral D of a signal observed at a chemical shift of ?90 ppm or more and ?120 ppm or less in the 29Si solid-state NMR spectrum, that is, C/D, is 0.10 or more and 0.75 or less. The amount X of the nitrogen-containing compound extracted from the silica particles with a mixed solution of ammonia and methanol is 0.1% by mass or more. The amount X of the nitrogen-containing compound extracted and the amount Y of the nitrogen-containing compound extracted from the silica particles with water satisfy Y/X<0.3.
    Type: Application
    Filed: February 3, 2022
    Publication date: September 29, 2022
    Applicant: FUJIFILM Business Innovation Corp.
    Inventors: Yuka ZENITANI, Sakae TAKEUCHI, Koji SASAKI, Yoshifumi ERI, Mai MOCHIDA
  • Publication number: 20220306479
    Abstract: Silica particles have silica base particles, a structure that covers at least a part of a surface of the silica base particles and is configured with a reaction product of a trifunctional silane coupling agent, and a nitrogen element-containing compound, in which a content of the nitrogen element-containing compound with respect to the silica particles is 0.005% by mass or more and 0.50% by mass or less in terms of N atoms, and the silica particles have a degree of hydrophobicity of 10% or more and 60% or less and a volume resistivity of 1×108?·cm or more and 1×1012.5 ?·cm or less.
    Type: Application
    Filed: January 27, 2022
    Publication date: September 29, 2022
    Applicant: FUJIFILM Business Innovation Corp.
    Inventors: Koji SASAKI, Sakae TAKEUCHI, Yuka ZENITANI, Yoshifumi ERI, Mai MOCHIDA