Patents by Inventor Yukako ANRYU
Yukako ANRYU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9771346Abstract: A salt represented by formula (I): wherein R1 and R2 independently represent a hydrogen atom, a hydroxy group or a C1 to C12 hydrocarbon group in which a methylene group may be replaced by a —O— or —CO—; m and n independently represent 1 or 2; Ar represents an optionally substituted phenyl group; Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, A1 represents a single bond, a C1 to C24 alkanediyl group or the like, and Y represents an optionally substituted C1 to C18 alkyl group or monovalent C3 to C18 alicyclic hydrocarbon group, and a methylene group therein may be replaced by a —O—, O— or —SO2—, provided that the alkyl group or the alicyclic hydrocarbon group has at least one substituent, or at least one methylene group contained therein is replaced by a —O—, —CO— or —SO2—.Type: GrantFiled: December 14, 2015Date of Patent: September 26, 2017Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Takayuki Miyagawa, Yukako Anryu, Koji Ichikawa
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Patent number: 9645490Abstract: A salt represented by the formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; R1 represents a C1 to C12 alkyl group in which a methylene group may be replaced by an oxygen atom or a carbonyl group; A1 represents a C2 to C8 alkanediyl group; and R2 represents a C5 to C18 alicyclic hydrocarbon group in which a hydrogen atom may be replaced by a hydroxy group, and in which a methylene group may be replaced by an oxygen atom or a carbonyl group, and which alicyclic hydrocarbon group may have a cyclic ketal structure optionally having a fluorine atom; and “m” represents an integer of 0, 1, 2 or 3.Type: GrantFiled: December 10, 2015Date of Patent: May 9, 2017Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Yukako Anryu, Koji Ichikawa
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Publication number: 20160170298Abstract: A salt represented by the formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; R1 represents a C1 to C12 alkyl group in which a methylene group may be replaced by an oxygen atom or a carbonyl group; A1 represents a C2 to C8 alkanediyl group; and R2 represents a C5 to C18 alicyclic hydrocarbon group in which a hydrogen atom may be replaced by a hydroxy group, and in which a methylene group may be replaced by an oxygen atom or a carbonyl group, and which alicyclic hydrocarbon group may have a cyclic ketal structure optionally having a fluorine atom; and “m” represents an integer of 0, 1, 2 or 3.Type: ApplicationFiled: December 10, 2015Publication date: June 16, 2016Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Yukako ANRYU, Koji ICHIKAWA
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Publication number: 20160168115Abstract: A salt represented by formula (I): wherein R1 and R2 independently represent a hydrogen atom, a hydroxy group or a C1 to C12 hydrocarbon group in which a methylene group may be replaced by a —O— or —CO—; m and n independently represent 1 or 2; Ar represents an optionally substituted phenyl group; Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, A1 represents a single bond, a C1 to C24 alkanediyl group or the like, and Y represents an optionally substituted C1 to C18 alkyl group or monovalent C3 to C18 alicyclic hydrocarbon group, and a methylene group therein may be replaced by a —O—, O— or —SO2—, provided that the alkyl group or the alicyclic hydrocarbon group has at least one substituent, or at least one methylene group contained therein is replaced by a —O—, —CO— or —SO2—.Type: ApplicationFiled: December 14, 2015Publication date: June 16, 2016Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Takayuki MIYAGAWA, Yukako ANRYU, Koji ICHIKAWA
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Publication number: 20160154304Abstract: A salt represented by formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, R1 and R2 each independently represent a hydrogen atom, a fluorine atom or a C1 to C6 perfluoroalkyl group, z represents an integer of 0 to 6, X1 represents *—O—, *—CO—O— or *—O—CO—, * represents a binding site to CR1R2 or CQ1Q2, L1 represents a C1 to C6 alkanediyl group, R3 represents a C5 to C18 alicyclic hydrocarbon group in which a hydrogen atom may be replaced by a hydroxy group, and in which a methylene group may be replaced by an oxygen atom or a carbonyl group, and which alicyclic hydrocarbon group may have a cyclic ketal structure optionally having a fluorine atom; and Z+ represents an organic cation.Type: ApplicationFiled: November 27, 2015Publication date: June 2, 2016Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Yukako ANRYU, Mitsuyoshi OCHIAI, Koji ICHIKAWA
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Patent number: 9348221Abstract: A salt represented by the formula (I): wherein R1 and R2 independently each represent a hydrogen atom, a hydroxy group or a C1-C12 hydrocarbon group where a methylene group can be replaced by an oxygen atom or a carbonyl group; Ar represents a C6-C36 aromatic hydrocarbon group which can have a substituent or a C6-C36 heteroaromatic hydrocarbon group which can have a substituent; A? represents an organic anion; and “m” and “n” independently each represent an integer of 1 or 2.Type: GrantFiled: October 21, 2014Date of Patent: May 24, 2016Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Yukako Anryu, Koji Ichikawa, Takahiro Yasue
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Publication number: 20160130210Abstract: A compound represented by formula (I), a resin including a structural unit derived from the compound and a resist composition including the resin: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group in which a hydrogen atom may be replaced by a halogen atom, R2 represents a C1 to C6 perfluoroalkyl group or *—CHRf1Rf2, * represents a binding site to a carbonyl group, Rf1 and Rf2 each independently represent a C1 to C4 perfluoroalkyl group or Rf1 and Rf2 may be bonded together with a carbon atom bonded thereto to form a ring, A1 represents a single bond, a C1 to C6 alkanediyl group or **-A3-X1-(A4-X2)a-(A5)b-, ** represents a binding site to an oxygen atom, A2, A3, A4 and A5 each independently represent a C1 to C6 alkanediyl group, X1 and X2 each independently represent —O—, —CO—O— or —O—CO—, a and b each represent 0 or 1, and W1 represents a C5 to C18 divalent alicyclic hydrocarbon group.Type: ApplicationFiled: November 10, 2015Publication date: May 12, 2016Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Yukako ANRYU, Shingo FUJITA, Koji ICHIKAWA
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Patent number: 9274421Abstract: A salt represented by formula (I): wherein R1 and R2 independently in each occurrence represent a hydrogen atom, a hydroxy group or a C1-C12 hydrocarbon group where a methylene group can be replaced by an oxygen atom or a carbonyl group; Ar1 and Ar2 each independently represent a C6-C36 aromatic hydrocarbon group which can have a substituent or a C6-C36 heteroaromatic hydrocarbon group which can have a substituent; A? and A?? each independently represent an organic anion; and “m” and “n” independently each represent an integer of 1 to 2.Type: GrantFiled: October 21, 2014Date of Patent: March 1, 2016Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Yukako Anryu, Koji Ichikawa, Masafumi Yoshida
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Patent number: 9260407Abstract: The present invention provides a salt represented by the formula (I): wherein R1, R2, L1, Y, R3, R4, R5, R6, R7, n, s, and R8 represent variables outlined in the specification.Type: GrantFiled: November 14, 2011Date of Patent: February 16, 2016Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Yukako Anryu, Koji Ichikawa
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Publication number: 20150338735Abstract: A salt represented by formula (I): in which X represents an oxygen atom, a sulfur atom or —N(SO2R5)—; R5 represents a C1-C12 alkyl group which can have a fluorine atom and in which a methylene group can be replaced by an oxygen atom or a carbonyl group, a C3-C12 cycloalkyl group which can have a fluorine atom, or a C6-C12 aromatic hydrocarbon group which can have a fluorine atom; Ar represents a C6-C36 aromatic hydrocarbon group which can have a substituent or a C4-C36 heteroaromatic hydrocarbon group which can have a substituent; R1 and R2 each independently represent a hydrogen atom, a hydroxy group, or a C1-C12 hydrocarbon group in which a methylene group can be replaced by an oxygen atom or a carbonyl group; “m” and “n” each independently represent 1 or 2; R3 and R4 each independently represent a hydrogen atom or a C1-C12 hydrocarbon group, R3 and R4 may be bonded to form a ring, or R3 or R4 may form a ring together with Ar; and A? represents an organic anion which has an acid-labile group, an organType: ApplicationFiled: May 18, 2015Publication date: November 26, 2015Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Yukako ANRYU, Satoshi YAMAMOTO, Koji ICHIKAWA
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Patent number: 9051247Abstract: A salt represented by formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, n represents 0 or 1, Ll represents a single bond or a C1-C10 alkanediyl group in which a methylene group may be replaced by an oxygen atom or carbonyl group, provided that Ll is not a single bond when n is 0, ring W represents a C3-C36 aliphatic ring in which a methylene group may be replaced by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom may be replaced by a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group, Rl represents a hydroxyl group or a hydroxyl group protected by a protecting group, and Z+ represents an organic cation.Type: GrantFiled: April 10, 2012Date of Patent: June 9, 2015Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Yukako Anryu, Koji Ichikawa
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Publication number: 20150118620Abstract: A salt represented by formula (I): wherein R1 and R2 independently in each occurrence represent a hydrogen atom, a hydroxy group or a C1-C12 hydrocarbon group where a methylene group can be replaced by an oxygen atom or a carbonyl group; Ar1 and Ar2 each independently represent a C6-C36 aromatic hydrocarbon group which can have a substituent or a C6-C36 heteroaromatic hydrocarbon group which can have a substituent; A? and A?? each independently represent an organic anion; and “m” and “n” independently each represent an integer of 1 to 2.Type: ApplicationFiled: October 21, 2014Publication date: April 30, 2015Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Yukako ANRYU, Koji ICHIKAWA, Masafumi YOSHIDA
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Publication number: 20150118619Abstract: A salt represented by the formula (I): wherein R1 and R2 independently each represent a hydrogen atom, a hydroxy group or a C1-C12 hydrocarbon group where a methylene group can be replaced by an oxygen atom or a carbonyl group; Ar represents a C6-C36 aromatic hydrocarbon group which can have a substituent or a C6-C36 heteroaromatic hydrocarbon group which can have a substituent; A? represents an organic anion; and “m” and “n” independently each represent an integer of 1 or 2.Type: ApplicationFiled: October 21, 2014Publication date: April 30, 2015Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Yukako ANRYU, Koji ICHIKAWA, Takahiro YASUE
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Patent number: 8921029Abstract: A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), wherein R1, A1, R2, RII1, RII2, LII1, YII1, RII3, RII4, RII5, RII6, RII7, n, s and RII8 are defined in the specification.Type: GrantFiled: July 18, 2012Date of Patent: December 30, 2014Assignee: Sumitomo Chemical Company, LimitedInventors: Koji Ichikawa, Yukako Anryu, Shingo Fujita
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Patent number: 8852846Abstract: The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C20 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, W represents a group represented by the formula (W1), (W2), (W3), (W4) or (W5): and Z+ represents an organic counter ion.Type: GrantFiled: April 4, 2012Date of Patent: October 7, 2014Assignee: Sumitomo Chemical Company, LimitedInventors: Yukako Anryu, Koji Ichikawa
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Patent number: 8846294Abstract: The present invention provides a photoresist composition comprising the following components (A), (B) and (X): (A) a resin being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, (B) an acid generator, (X) at least one compound selected from the group consisting of a compound represented by the formula (I-a): wherein Z1 represent a C1-C20 divalent saturated aliphatic hydrocarbon group in which one or more —CH2— may be replaced by —O— or —CO—, and a compound represented by the formula (I-b): wherein R1 represents a C1-C20 monovalent saturated aliphatic hydrocarbon group in which one or more hydrogen atoms may be substituted with a hydroxyl group and one or more —CH2— may be replaced by —O— or —CO—, and n represents 0 or 1.Type: GrantFiled: March 29, 2012Date of Patent: September 30, 2014Assignee: Sumitomo Chemical Company, LimitedInventors: Koji Ichikawa, Yukako Anryu, Satoshi Yamaguchi
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Patent number: 8663900Abstract: A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), wherein R1, A1, A13, A14, X12, RII1, RII2, LII1, YII1, RII3, RII4, RII5, RII6, RII7, n, s and RII8 are defined in the specification.Type: GrantFiled: July 18, 2012Date of Patent: March 4, 2014Assignee: Sumitomo Chemical Company, LimitedInventors: Koji Ichikawa, Yukako Anryu, Shingo Fujita
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Patent number: 8617790Abstract: A photoresist composition comprising (A) a resin which has an acid-labile group-containing structural unit and a lactone ring-containing structural unit, and (B) a salt represented by formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, n represents 0 or 1, L1 represents a single bond or a C1-C10 alkanediyl group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, provided that L1 is not a single bond when n is 0, R1 represents a hydroxy group or a hydroxy group protected by a protecting group, and Z+ represents an organic cation.Type: GrantFiled: April 17, 2012Date of Patent: December 31, 2013Assignee: Sumitomo Chemical Company, LimitedInventors: Koji Ichikawa, Yukako Anryu, Shingo Fujita
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Patent number: 8420294Abstract: The present invention provides a salt represented by the formula (I): wherein R1 and R2 independently each represent a C1-C6 alkyl group or R1 and R2 are bonded each other to form a C5-C20 aliphatic ring together with the carbon atom to which they are bonded, R3 and R4 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, X1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO— and which may be substituted with one or more fluorine atoms, and Z1+ represents an organic counter ion.Type: GrantFiled: November 25, 2011Date of Patent: April 16, 2013Assignee: Sumitomo Chemical Company, LimitedInventors: Koji Ichikawa, Yukako Anryu, Shingo Fujita
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Publication number: 20130022920Abstract: A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), wherein R1, A1, A13, A14, X12, RII1, RII2, LII1, YII1, RII3, RII4, RII5, RII6, RII7, n, s and RII8 are defined in the specification.Type: ApplicationFiled: July 18, 2012Publication date: January 24, 2013Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Koji ICHIKAWA, Yukako ANRYU, Shingo FUJITA