Patents by Inventor Yukari Hama

Yukari Hama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8815490
    Abstract: The radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation sensitive acid generator. The first polymer includes a repeating unit represented by formula (1). The second polymer includes an acid labile group and is dissociated by an action of acid so that alkali solubility is given by dissociation of said acid labile group. R1 represents a hydrogen atom, a methyl group or a trifluoromethyl group. R2 represents a single bond or a divalent linear, branched or cyclic, saturated or unsaturated hydrocarbon group having 1-20 carbon atoms. X represents a fluorine atom-substituted methylene group or a linear or branched fluoroalkylene group having 2-20 carbon atoms. R3 represents a hydrogen atom or a monovalent organic group.
    Type: Grant
    Filed: December 2, 2011
    Date of Patent: August 26, 2014
    Assignee: JSR Corporation
    Inventors: Yasuhiko Matsuda, Tomohisa Fujisawa, Yukari Hama, Takanori Kawakami
  • Publication number: 20120094234
    Abstract: The radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation sensitive acid generator. The first polymer includes a repeating unit represented by formula (1). The second polymer includes an acid labile group and is dissociated by an action of acid so that alkali solubility is given by dissociation of said acid labile group. R1 represents a hydrogen atom, a methyl group or a trifluoromethyl group. R2 represents a single bond or a divalent linear, branched or cyclic, saturated or unsaturated hydrocarbon group having 1-20 carbon atoms. X represents a fluorine atom-substituted methylene group or a linear or branched fluoroalkylene group having 2-20 carbon atoms. R3 represents a hydrogen atom or a monovalent organic group.
    Type: Application
    Filed: December 2, 2011
    Publication date: April 19, 2012
    Applicant: JSR Corporation
    Inventors: Yasuhiko MATSUDA, Tomohisa FUJISAWA, Yukari HAMA, Takanori KAWAKAMI
  • Publication number: 20110212401
    Abstract: A radiation-sensitive resin composition includes a resin, a photoacid generator, a fluorine-containing resin, and a lactone compound. The resin does not include a first fluorine-containing repeating unit. The resin includes a first repeating unit that becomes alkali-soluble due to an acid. The fluorine-containing resin includes a second fluorine-containing repeating unit and a second repeating unit that becomes alkali-soluble due to an acid. A content of the lactone compound in the radiation-sensitive resin composition is about 31 to about 200 parts by mass based on 100 parts by mass of the resin.
    Type: Application
    Filed: March 11, 2011
    Publication date: September 1, 2011
    Applicant: JSR Corporation
    Inventors: Yukio NISHIMURA, Yasuhiko Matsuda, Hiroki Nakagawa, Tomohisa Fujisawa, Yukari Hama, Kazuki Kasahara