Abstract: The present invention relates to a glass sheet including a first main surface and a second main surface opposing the first main surface, in which the glass sheet has an affected layer directly below the first main surface, in at least a part of the first main surface, an average element length RSm is from 2500 nm to 6000 nm, a root-mean-square height Sq is from 3 nm to 45 nm, and a skewness Ssk is a negative value.

Abstract: A glass laminate, in which an inorganic laminated film having a total thickness of 90 to 500 nm is laminated on a surface of a glass plate with an adhesive film including a resin film interposed therebetween, a carbon-containing film thinner than the inorganic laminated film is attached to a surface of the inorganic laminated film, a storage elastic modulus of an outermost surface on the inorganic laminated film side that is measured by a nanoindentation method using a flat punch indenter under conditions of 1 Hz and 28° C. is 50 MPa to 30 GPa, and a loss coefficient of the outermost surface on the inorganic laminated film side that is measured by the nanoindentation method using the flat punch indenter under conditions of 1 Hz and 28° C. is 0.005 to 0.14.

Abstract: A laminated substrate for an electrochromic dimmer element includes a glass substrate; and a transparent conductive film. The glass substrate includes a silicon oxide, an aluminum oxide, a boron oxide, an alkaline earth metal oxide, and an alkali metal oxide in a total amount of 90 mol % or more, and includes the alkali metal oxide in a total amount of 12 mol % or less. The transparent conductive film includes an indium oxide film containing tin, and a tin oxide film containing at least one of tantalum, antimony and fluorine, in this order from a glass substrate side. The indium oxide film is formed directly on the glass substrate, a refractive index and an extinction coefficient of the indium oxide film at a wavelength of 1.3 ?m is less than 0.4, and greater than 0.4, respectively. A film thickness of the tin oxide film is greater than 35 nm.

Abstract: The present invention relates to a glass sheet including a first main surface and a second main surface opposing the first main surface, in which the glass sheet has an affected layer directly below the first main surface, in at least a part of the first main surface, an average element length RSm is from 2500 nm to 6000 nm, a root-mean-square height Sq is from 3 nm to 45 nm, and a skewness Ssk is a negative value.

Abstract: A substrate with conductive film includes a base material; and a film of a conductive metal oxide arranged on an upper part of the base material. The film includes, by a top plan view, a first region and a second region, the second region is configured of a same material as the first region, and an electric resistance of the second region is higher than an electric resistance of the first region. The second region includes a part configured by a plurality of cellular sections surrounded by a plurality of fine cracks. In the part, each fine crack has a width of 1 nm to 50 nm, and each cellular section has a largest measure of less than 10 ?m.

Abstract: A method of producing a glass substrate having a first layer formed on a surface of the substrate by low-temperature CVD includes preparing the glass substrate and forming the first layer on the glass substrate by the low-temperature CVD. In the glass substrate after forming the first layer, an integrated value after a baseline correction in a wavenumber range of 2600 cm?1 to 3800 cm?1 in a peak due to OH groups obtained by an FTIR measurement on the first layer is 9.0 or less, and the C content of the first layer is 1.64 at % or less.

Abstract: A laminated substrate for an electrochromic dimmer element includes a glass substrate; and a transparent conductive film. The glass substrate includes a silicon oxide, an aluminum oxide, a boron oxide, an alkaline earth metal oxide, and an alkali metal oxide in a total amount of 90 mol % or more, and includes the alkali metal oxide in a total amount of 12 mol % or less. The transparent conductive film includes an indium oxide film containing tin, and a tin oxide film containing at least one of tantalum, antimony and fluorine, in this order from a glass substrate side. The indium oxide film is formed directly on the glass substrate, a refractive index and an extinction coefficient of the indium oxide film at a wavelength of 1.3 ?m is less than 0.4, and greater than 0.4, respectively. A film thickness of the tin oxide film is greater than 35 nm.

Abstract: A plasma source for a plasma CVD apparatus that includes an electrode group including four electrodes, which are a first electrode, a second electrode, a third electrode and a fourth electrode arranged in a row. The electrode group is connected to at least one AC power supply. A voltage supplied to two of the four electrodes is shifted in phase from a voltage supplied to the remaining two electrodes. A space to which a source gas is supplied is provided between the adjacent electrodes, and voltages applied to at least one set among the adjacent two electrodes are in the same phase.

Abstract: An electronic device includes a chassis having an opening; a display unit and a touch panel configured to be housed in the chassis; and a cover glass arranged on the opening having a main surface region configured to accommodate a display from the display unit and an input to the touch panel, and an end surface region corresponding to a side surface of the chassis. The end surface region includes a first region having a first surface roughness and configured to accommodate the input to the touch panel, and a second region having a second surface roughness that is different from the first surface roughness.

Abstract: A laminated body includes a substrate provided with a first surface; a rugged layer including fluorine; and an antifouling layer. The rugged layer has an average surface roughness of 0.05-50 nm. A peak of a binding energy of F1s in the rugged layer falls within 684-687.5 eV, a ratio of atomic concentrations of fluorine to silicon obtained from peaks of binding energies of F1s and Si2p falls within 0.003-100. A peak of a binding energy of F1s in the antifouling layer falls within 687.5-691 eV. An F-value, (A?B)/(C?B), is 0.1 or more, where “A” is an F-K? line strength of the laminated body measured from the antifouling layer side by a fluorescent X-ray measurement device, “B” is an F-K? line strength of a glass plate with only trace amounts of fluorine, and “C” is an F-K? line strength of an aluminosilicate glass plate including fluorine of 2 wt %.

Abstract: A plasma source for a plasma CVD apparatus that includes an electrode group including four electrodes, which are a first electrode, a second electrode, a third electrode and a fourth electrode arranged in a row. The electrode group is connected to at least one AC power supply. A voltage supplied to two of the four electrodes is shifted in phase from a voltage supplied to the remaining two electrodes. A space to which a source gas is supplied is provided between the adjacent electrodes, and voltages applied to at least one set among the adjacent two electrodes are in the same phase.

Abstract: A glass substrate provided with a coating film, including a glass substrate and a coating film containing at least one TiO2 layer having a refractive index of at least 2.20 at a wavelength of 632 nm, formed by low temperature plasma CVD method on the glass substrate, and a method for producing a glass substrate provided with a coating film, which includes forming a TiO2 layer on a glass substrate by low temperature plasma CVD method using a film-forming material containing at least one member selected from an alkoxide type titanium material, an amide type titanium material and a halide type titanium material, at a plasma power density of at least 55 kW/m at a film-forming rate of from 15 to 200 nm·m/min.

Abstract: A plasma source for a plasma CVD apparatus that includes an electrode group including four electrodes, which are a first electrode, a second electrode, a third electrode and a fourth electrode arranged in a row. The electrode group is connected to at least one AC power supply. A voltage supplied to two of the four electrodes is shifted in phase from a voltage supplied to the remaining two electrodes. A space to which a source gas is supplied is provided between the adjacent electrodes, and voltages applied to at least one set among the adjacent two electrodes are in the same phase.

Abstract: A method of producing a glass substrate having a first layer formed on a surface of the substrate by low-temperature CVD includes preparing the glass substrate and forming the first layer on the glass substrate by the low-temperature CVD. In the glass substrate after forming the first layer, an integrated value after a baseline correction in a wavenumber range of 2600 cm?1 to 3800 cm?1 in a peak due to OH groups obtained by an FTIR measurement on the first layer is 9.0 or less, and the C content of the first layer is 1.64 at % or less.

Abstract: A substrate with conductive film includes a base material; and a film of a conductive metal oxide arranged on an upper part of the base material. The film includes, by a top plan view, a first region and a second region, the second region is configured of a same material as the first region, and an electric resistance of the second region is higher than an electric resistance of the first region. The second region includes a part configured by a plurality of cellular sections surrounded by a plurality of fine cracks. In the part, each fine crack has a width of 1 nm to 50 nm, and each cellular section has a largest measure of less than 10 ?m.

Abstract: To provide a glass substrate provided with a coating film having a high refractive index titania layer which is excellent in the heat resistance with cracking or the like by heat treatment suppressed, and a method for producing such a glass substrate provided with a coating film. A glass substrate provide with a coating film, comprising a glass substrate and a coating film containing at least one TiO2 layer having a refractive index of at least 2.20 at a wavelength of 632 nm, formed by low temperature plasma CVD method on the glass substrate, and a method for producing a glass substrate provided with a coating film, which comprises a step of forming a TiO2 layer on a glass substrate by low temperature plasma CVD method using a film-forming material containing at least one member selected from an alkoxide type titanium material, an amide type titanium material and a halide type titanium material, at a plasma power density of at least 55 kW/m at a film-forming rate of from 15 to 200 nm·m/m in.

Abstract: The invention relates to a substrate (1) comprising a medium (10), said medium (10) comprising, on at least one of its main faces, a functional layer (11) that has low-E or antisolar properties or is electrically conductive, characterized in that said functional layer (11) comprises, on its extreme surface opposite the medium (10), at least one sulphurous compound, in particular a sulphate, a sulphonate and/or a thiosulphate.

Abstract: A plasma source for a plasma CVD apparatus that includes an electrode group including four electrodes, which are a first electrode, a second electrode, a third electrode and a fourth electrode arranged in a row. The electrode group is connected to at least one AC power supply. A voltage supplied to two of the four electrodes is shifted in phase from a voltage supplied to the remaining two electrodes. A space to which a source gas is supplied is provided between the adjacent electrodes, and voltages applied to at least one set among the adjacent two electrodes are in the same phase.

Abstract: A method of producing a glass substrate having a first layer formed on a surface of the substrate by low-temperature CVD includes preparing the glass substrate and forming the first layer on the glass substrate by the low-temperature CVD. In the glass substrate after forming the first layer, an integrated value after a baseline correction in a wavenumber range of 2600 cm?1 to 3800 cm?1 in a peak due to OH groups obtained by an FTIR measurement on the first layer is 9.0 or less, and the C content of the first layer is 1.64 at % or less.

Abstract: The invention relates to a substrate (1) comprising a medium (10), said medium (10) comprising, on at least one of its main faces, a functional layer (11) that has low-E or antisolar properties or is electrically conductive, characterized in that said functional layer (11) comprises, on its extreme surface opposite the medium (10), at least one sulphurous compound, in particular a sulphate, a sulphonate and/or a thiosulphate.