Abstract: Provided is a liquid-repellent agent which enables the production of partition walls that are less susceptible to reduction in liquid repellency even when subjected to oxygen plasma treatment or UV-ozone treatment. A liquid-repellent agent (A) of the present invention contains a polymer containing: a polymerization unit (a1) derived from a hydrocarbon having an alkyl group in which at least one hydrogen atom is replaced with a fluorine atom and which may contain an ether-oxygen atom; and one or two or more types of polymerization units (a2) other than the polymerization unit (a1), wherein the number of ethylenically unsaturated double bonds in the polymerization units (a1) and (a2) is 3 or greater.

Abstract: The present disclosure aims to provide a photosensitive resin composition that can improve the surface roughness of a fluororesin suitable for use as a partition wall material. The present disclosure relates to a photosensitive resin composition containing: a fluororesin having a fluorine atom content of 20 to 60 mass %; a fluorine-containing surface modifier including a fluorine compound having a weight average molecular weight (Mw) of 1,000 to 15,000; a base resin; a solvent; and a photopolymerization initiator.

Abstract: The present disclosure aims to provide a novel surface modifier that can be introduced into a photosensitive resin composition to improve the surface roughness of a fluororesin suitable for use as a partition wall material. The present disclosure relates to a surface modifier containing a fluororesin (A) having a structure represented by the following formula (1): wherein each Ra independently represents a C1-C6 linear, C3-C6 branched, or C3-C6 cyclic alkyl group or a fluorine atom, and any number of hydrogen atoms in the alkyl group are replaced with fluorine atoms.

Abstract: The near-infrared absorbing glass includes four or more kinds of the prescribed main cations, and includes P ions, Ba ions and Cu ions as essential cations, wherein, in a glass composition expressed in anion %, the content of O ions is 90.0 anion % or more, in a glass composition expressed in atomic %, the ratio of the content of O ions to the content of P ions is 3.15 or less, in a glass composition expressed in mol % based on oxides, the total content of B2O3 and SiO2 is 3.0 mol % or less, the total content of MgO and Al2O3 is 8.0 mol % or less, and the total content of Li2O, Na2O and K2O is 15 mol % or less.

Abstract: In a lid assembly structure 1 which includes a base member 2, a lid 3, and an opening/closing mechanism 5 and in which the opening/closing mechanism 5 includes a biasing member 8, during assembling of the base member 2 and the opening/closing mechanism 5, the biasing member 8 is guided by a guide portion 90 which is a part of the opening/closing mechanism 5, and a state of the biasing member 8 is changed from a temporary assembled state where a second engagement end 82 of the biasing member 8 and a temporary engagement portion 93 engage with each other to a main assembled state where the second engagement end 82 and a main engagement portion 91 of a mating member engage with each other, thereby accumulating at least a part of a biasing force in the biasing member 8.

Abstract: A method and a system for cleaning a work, the sum A of the areas (mm2), the sum B of the areas (mm2) and the determined supply flow rate Q (L/min) or the supply flow rate Q (L/min) and one or both of the determined sum A of the areas (mm2) and the determined sum B of the areas (mm2) satisfy the predetermined relations.

Abstract: An information processing system according to an embodiment includes a storage, a plurality of conversationers, and a selector. The storage stores a regulation rule indicating a generation rule of a speech in a conversation. Each of the plurality of conversationers makes conversation with a user on the basis of the regulation rule. The selector selects some or all of the plurality of conversationers to cause a conversation to be performed.

Abstract: A technique enabling smooth data transfer in a system for accumulating and transferring data is provided. The invention is directed to a data storage device including a plurality of storage devices; and a data control unit configured to receive data, store the data in the storage devices, receive a data acquisition request, acquire data from the storage device, and transmit the data, wherein the data control unit selects a target storage device to search for data related to the data acquisition request based on storage status information regarding the data stored in the plurality of data storage devices.

Abstract: A technique enabling smooth data transfer in a system for accumulating and transferring data is provided. The invention is directed to a data storage device including a plurality of storage devices; and a data control unit configured to receive data, store the data in the storage devices, receive a data acquisition request, acquire data from the storage device, and transmit the data, wherein the data control unit selects a target storage device to search for data related to the data acquisition request based on storage status information regarding the data stored in the plurality of data storage devices.

Abstract: An information processing system according to an embodiment includes a conversationer, a storage, and a system-user conversationer. The conversationer performs conversation with a user by generating a speech. The storage stores conversation information indicating a conversation rule of the speech. The system-user conversationer converts the speech generated by the conversationer into a mode according to the user by using the conversion information stored in the storage.

Abstract: Disclosed is a method for etching a first region including a multi-layer film formed by providing silicon oxide films and silicon nitride films alternately, and a second region having a single silicon oxide film. The etching method includes: providing a processing target object including a mask provided on the first region and the second region within a processing container of a plasma processing apparatus; generating plasma of a first processing gas including a hydrofluorocarbon gas within the processing container that accommodates the processing target object; and generating plasma of a second processing gas including a fluorocarbon gas within the processing container that accommodates the processing target object. The step of generating the plasma of the first processing gas and the step of generating the plasma of the second processing gas are alternately repeated.

Abstract: A method of etching a first region including a multilayered film, in which first dielectric films and second dielectric films serving as silicon nitride films are alternately stacked, and a second region including a single-layered silicon oxide film is provided. The etching method includes a first plasma process of generating plasma of a first processing gas containing a fluorocarbon gas and an oxygen gas within a processing vessel of a plasma processing apparatus; and a second plasma process of generating plasma of a second processing gas containing a hydrogen gas, nitrogen trifluoride gas and a carbon-containing gas within the processing vessel. A temperature of an electrostatic chuck is set to a first temperature in the first plasma process, and the temperature of the electrostatic chuck is set to a second temperature lower than the first temperature in the second plasma process.

Abstract: A tomato ketchup containing the following components (A) to (C): (A) saccharide from 12 to 31 mass %, (B) potassium from 0.6 to 1.9 mass %, and (C) sodium from 0.1 to 1.55 mass %.

Abstract: The retardation film contains a cellulose ester, has a film thickness of 15 to less than 40 ?m, has a film thickness variation both in the widthwise direction and lengthwise direction of 0 to 4 ?m, and satisfies an Rt humidity fluctuation of 1% to 12%: (a difference of retardation Rt (590) values in the thickness direction represented by the following formula (ii) measured at a wavelength of 590 nm after the film has been left to stand for 5 hours in each of a 23° C., 20% relative humidity environment and a 23° C., 80% relative humidity environment)/(Rt (590) value measured after the film has been left to stand for 5 hours in a 23° C., 55% relative humidity environment)×100 Rt(590)={(nx+ny)/2?nz}×d??Formula (ii) wherein nx: a refractive index in the slow axis direction in the film plane, ny: a refractive index in the direction perpendicular to the slow axis in the film plane, nz: a refractive index in the thickness direction of the film, and d: a film thickness.

Abstract: The optical film contains cellulose ester and cellulose ether. The cellulose ester satisfies formulae 2.0?X+Y?3.0 and 0?Y?1.6. X is an acetyl group, and Y is a propionyl group and/or a butyryl group. The mass ratio of the cellulose ester to the cellulose ether is 99.0:1.0 to 55.0:45.0. Retardations Ro and Rt of the film are 20 to 130 nm and 100 to 300 nm, respectively, and expressed as Ro=(nx?ny)×d and Rt={(nx+ny)/(2?nz)}×d. nx is an in-plane refractive index of a film in a slow axis direction, ny is an in-plane refractive index of a film in a fast axis direction, nz is a refractive index of a film in a thickness direction, and d is a thickness of a film.

Abstract: A method of etching a first region including a multilayered film, in which first dielectric films and second dielectric films serving as silicon nitride films are alternately stacked, and a second region including a single-layered silicon oxide film is provided. The etching method includes a first plasma process of generating plasma of a first processing gas containing a fluorocarbon gas and an oxygen gas within a processing vessel of a plasma processing apparatus; and a second plasma process of generating plasma of a second processing gas containing a hydrogen gas, nitrogen trifluoride gas and a carbon-containing gas within the processing vessel. A temperature of an electrostatic chuck is set to a first temperature in the first plasma process, and the temperature of the electrostatic chuck is set to a second temperature lower than the first temperature in the second plasma process.

Abstract: Disclosed is a method for etching a first region including a multi-layer film formed by providing silicon oxide films and silicon nitride films alternately, and a second region having a single silicon oxide film. The etching method includes: providing a processing target object including a mask provided on the first region and the second region within a processing container of a plasma processing apparatus; generating plasma of a first processing gas including a hydrofluorocarbon gas within the processing container that accommodates the processing target object; and generating plasma of a second processing gas including a fluorocarbon gas within the processing container that accommodates the processing target object. The step of generating the plasma of the first processing gas and the step of generating the plasma of the second processing gas are alternately repeated.

Abstract: An optical film that can achieve an intended retardation value suitable for a VA type liquid crystal display while decreasing the Rt fluctuation due to humidity is provided. An optical film, containing cellulose ester and cellulose ether, in which the cellulose ester satisfies formulae (1), and (2): 2.0?X+Y?3.0??(1) 0?Y?1.6??(2) (in which X is an acetyl group, and Y is a propionyl group and/or a butyryl group); a mixing ratio of the cellulose ester and the cellulose ether (cellulose ester:cellulose ether) is 99.0:1.0 to 55.0:45.0 (mass ratio); and retardations Ro, and Rt expressed in formulae (3), and (4): Ro=(nx?ny)×d??(3) Rt={(nx+ny)/(2?nz)}×d??(4) (in which nx is an in-plane refractive index of a film in a slow axis direction, ny is an in-plane refractive index of a film in a fast axis direction, nz is a refractive index of a film in a thickness direction, and d is a thickness (nm) of a film) are 20 to 130 nm, and 100 to 300 nm, respectively.

Abstract: To provide a retardation film that, while maintaining a high retardation value, has increased durability such as moist heat resistance and can prevent the occurrence of color unevenness even if made in a size having a large area. The retardation film contains a cellulose ester as the primary component, has a film thickness of 15 ?m or more and less than 40 ?m, has a film thickness variation both in the widthwise direction and lengthwise direction of 0 to 4 ?m, and satisfies an Rt humidity fluctuation represented by the formula (1) described below of 1% to 12%. Formula (1): Rt humidity fluctuation=(?Rt value, a difference of retardation Rt(590) values in the thickness direction represented by the following formula (ii) measured at a wavelength of 590 nm after the film has been left to stand for 5 hours in each of a 23° C., 20% relative humidity environment and a 23° C., 80% relative humidity environment)/(Rt(590) value measured after the film has been left to stand for 5 hours in a 23° C.

Abstract: The present invention provides the packed soy sauce-containing liquid seasoning, containing the following (A), (B), (C), and (D): (A) sodium ?2.7 to 5.1% by mass (B) potassium ?0.8 to 4% by mass (C) proline 0.28 to 1% by mass (D) isoleucine ?0.2 to 1% by mass.