Abstract: A backpack working machine may be configured to eject liquid. The backpack working machine may include: a body unit; and a shoulder harness unit attached to the body unit and configured to be worn on shoulders of a user. The body unit may include: a battery unit comprising a battery attaching part to which a battery is attached; a fan unit comprising a fan configured to operate on electrical power of the battery; and a liquid tank configured to store the liquid. When the backpack working machine is placed on a placement surface, a direction perpendicular to the placement surface may be defined as an up-down direction. When the backpack working machine placed on the placement surface is viewed from above, 50% or more of the battery unit, 50% or more of the fan unit, and 50% or more of the liquid tank may overlap each other.

Abstract: A mist blower may include: a liquid nozzle configured to inject liquid stored in a liquid tank into an ejection tube. The liquid nozzle may include: an end surface disposed on a distal end of the liquid nozzle, an ejection opening being defined in the end surface; a side surface constituting at least a part of an outer shape of the liquid nozzle; and a corner part connecting the end surface and the side surface and constituting a corner of the liquid nozzle. At the corner part, a virtual end surface defined by extending the end surface and a virtual side surface defined by extending the side surface may intersect at a first point. Each of a distance from the first point to the end surface and a distance from the first point to the side surface may be equal to or less than 0.3 mm.

Abstract: A blower may include: a volute case defining a suction port, a volute chamber, and a discharge port; an impeller rotatably supported within the volute chamber; a motor connected to the impeller and configured to drive the impeller; and an outer case accommodating the suction port of the volute case and the motor. The outer case may include an external suction port and define an air passage extending from the external suction port to the suction port of the volute case. When the blower is held or worn in a predetermined posture by a user, the external suction port of the outer ease may be configured to be located so as to be open vertically downward.

Abstract: A mist blower in one aspect of the present disclosure includes an air blower, an air feed pipe, a tank, a liquid feed pipe, a nozzle, a first electromagnetic valve, a controller, and a first manual switch. The first electromagnetic valve (i) opens the liquid feed pipe in response to the first electromagnetic valve being activated and (ii) closes the liquid feed pipe in response to the first electromagnetic valve being deactivated. The controller activates or deactivates the air blower and the first electromagnetic valve. The first manual switch (i) is manually moved by a user of the mist blower and (ii) commands the controller to activate or deactivate the air blower based on a movement of the first manual switch.

Abstract: A blower may include: a volute case defining a suction port, a volute chamber, and a discharge port; an impeller rotatably supported within the volute chamber; a motor connected to the impeller and configured to drive the impeller; and an outer case accommodating the suction port of the volute case and the motor. The outer case may include an external suction port, and define an air passage extending from the external suction port to the suction port of the volute case. When the blower is held or worn in a predetermined posture by a user, the external suction port of the outer ease may be configured to be located so as to be open vertically downward.

Abstract: A power-operated air propelling work apparatus includes: an air flow pipe including an air inlet opening, an air outlet opening and a pipe wall formed between the air inlet opening and the air outlet opening to define an air flow passageway inside the pipe wall; an electric air propelling fan disposed within the air flow passageway for sucking in air from the air inlet opening and blowing out air from the air outlet opening; an apparatus housing surrounding and supporting the air flow pipe and forming a housing space between the apparatus housing and the air flow pipe; and a control circuit unit disposed within the housing space for controlling an operation of the electric air propelling fan, wherein the pipe wall is formed with an air passage hole by which the air flow passageway and the housing space communicate with each other.

Abstract: An electrically powered gardening tool of the type which includes a speed-reduction gear mounted in place to be driven by operation of an electric motor, a crank-cam in the form of overlapped eccentric disk plates fixed to a bottom surface of the speed-reduction gear by means of connecting pins for rotation therewith, and a pair of relatively reciprocating shear blades assembled with the eccentric disk plates. In the gardening tool, an elastic bushing is disposed in a mounting hole formed in the speed-reduction gear or each eccentric disk plate of the crank-cam for engagement with the connecting pins fixed to the eccentric disk plate or the speed-reduction gear, and a stopper is provided to restrict deformation of the elastic bushing caused by load applied to the crank-cam.

Abstract: A power-operated air propelling work apparatus includes: an air flow pipe including an air inlet opening, an air outlet opening and a pipe wall formed between the air inlet opening and the air outlet opening to define an air flow passageway inside the pipe wall; an electric air propelling fan disposed within the air flow passageway for sucking in air from the air inlet opening and blowing out air from the air outlet opening; an apparatus housing surrounding and supporting the air flow pipe and forming a housing space between the apparatus housing and the air flow pipe; and a control circuit unit disposed within the housing space for controlling an operation of the electric air propelling fan, wherein the pipe wall is formed with an air passage hole by which the air flow passageway and the housing space communicate with each other.

Abstract: An electrically powered garden tool includes an electric motor mounted upright within an outer shell housing, a pair of relatively reciprocating shear blades assembled to be driven by operation of the motor through a crank mechanism provided within a lower portion of the outer shell housing, and a cooling fan assembled to be driven by operation of the motor for introducing outside air into an upper portion of the outer shell housing to exhaust the introduced air from a lower portion of the outer shell housing. In the garden tool, a downward exhaust opening is formed within a lower end peripheral wall of the outer shell housing enclosing the crank mechanism such that the air spouted by rotation of the cooling fan blows out downward from the downward exhaust opening to restrain the occurrence of blowing noise of the air.

Abstract: To provide a technique capable of improving the reliability of a semiconductor device even if the downsizing thereof is advanced. The technical idea of the present invention lies in the configuration in which in a first to a third silicon nitride film to be formed by lamination, the respective film thicknesses thereof are not constant but become smaller in order from the third silicon nitride film in the upper layer to the first silicon nitride film in the lower layer while the total film thickness thereof is kept constant. Due to this it is possible to improve the embedding characteristic of the third silicon nitride film in the uppermost layer in particular, while ensuring the tensile stress of the first to third silicon nitride films, which makes effective the strained silicon technique.

Abstract: An electrically powered gardening tool of the type which includes a speed-reduction gear mounted in place to be driven by operation of an electric motor, a crank-cam in the form of overlapped eccentric disk plates fixed to a bottom surface of the speed-reduction gear by means of connecting pins for rotation therewith, and a pair of relatively reciprocating shear blades assembled with the eccentric disk plates. In the gardening tool, an elastic bushing is disposed in a mounting hole formed in the speed-reduction gear or each eccentric disk plate of the crank-cam for engagement with the connecting pins fixed to the eccentric disk plate or the speed-reduction gear, and a stopper is provided to restrict deformation of the elastic bushing caused by load applied to the crank-cam.

Abstract: An electrically powered garden tool includes an electric motor mounted upright within an outer shell housing, a pair of relatively reciprocating shear blades assembled to be driven by operation of the motor through a crank mechanism provided within a lower portion of the outer shell housing, and a cooling fan assembled to be driven by operation of the motor for introducing outside air into an upper portion of the outer shell housing to exhaust the introduced air from a lower portion of the outer shell housing. In the garden tool, a downward exhaust opening is formed within a lower end peripheral wall of the outer shell housing enclosing the crank mechanism such that the air spouted by rotation of the cooling fan blows out downward from the downward exhaust opening to restrain the occurrence of blowing noise of the air.

Abstract: A semiconductor device having redistribution interconnects in the WPP technology and improved reliability, wherein the redistribution interconnects have first patterns and second patterns which are electrically separated from each other within the plane of the semiconductor substrate, the first patterns electrically coupled to the multi-layer interconnects and the floating second patterns are coexistent within the plane of the semiconductor substrate, and the occupation ratio of the total of the first patterns and the second patterns within the plane of the semiconductor substrate, that is, the occupation ratio of the redistribution interconnects is 35 to 60%.

Abstract: Over a semiconductor substrate, a silicon nitride film is formed so as to cover n-channel MISFETs. The silicon nitride film is a laminate film which may be made of first, second, and third silicon nitride films. The total film thickness of the first and second silicon nitride films is smaller than half a spacing between a first sidewall spacer and a second sidewall spacer. After being deposited, the first and second silicon nitride films are subjected to treatments to have increased tensile stresses. The total film thickness of the first, second, and third silicon nitride films is not less than half the spacing between the first and second sidewall spacers. The third silicon nitride film is not subjected to any tensile-stress-increasing treatment, or may be subjected to a lesser amount of such treatment.

Abstract: A semiconductor device having redistribution interconnects in the WPP technology and improved reliability, wherein the redistribution interconnects have first patterns and second patterns which are electrically separated from each other within the plane of the semiconductor substrate, the first patterns electrically coupled to the multi-layer interconnects and the floating second patterns are coexistent within the plane of the semiconductor substrate, and the occupation ratio of the total of the first patterns and the second patterns within the plane of the semiconductor substrate, that is, the occupation ratio of the redistribution interconnects is 35 to 60%.

Abstract: A semiconductor device having redistribution interconnects in the WPP technology and improved reliability, wherein the redistribution interconnects have first patterns and second patterns which are electrically separated from each other within the plane of the semiconductor substrate, the first patterns electrically coupled to the multi-layer interconnects and the floating second patterns are coexistent within the plane of the semiconductor substrate, and the occupation ratio of the total of the first patterns and the second patterns within the plane of the semiconductor substrate, that is, the occupation ratio of the redistribution interconnects is 35 to 60%.

Abstract: Over a semiconductor substrate, a silicon nitride film is formed so as to cover n-channel MISFETs. The silicon nitride film is a laminate film which may be made of first, second, and third silicon nitride films. The total film thickness of the first and second silicon nitride films is smaller than half a spacing between a first sidewall spacer and a second sidewall spacer. After being deposited, the first and second silicon nitride films are subjected to treatments to have increased tensile stresses. The total film thickness of the first, second, and third silicon nitride films is not less than half the spacing between the first and second sidewall spacers. The third silicon nitride film is not subjected to any tensile-stress-increasing treatment, or may be subjected to a lesser amount of such treatment.

Abstract: To provide a technique capable of improving the reliability of a semiconductor device even if the downsizing thereof is advanced. The technical idea of the present invention lies in the configuration in which in a first to a third silicon nitride film to be formed by lamination, the respective film thicknesses thereof are not constant but become smaller in order from the third silicon nitride film in the upper layer to the first silicon nitride film in the lower layer while the total film thickness thereof is kept constant. Due to this it is possible to improve the embedding characteristic of the third silicon nitride film in the uppermost layer in particular, while ensuring the tensile stress of the first to third silicon nitride films, which makes effective the strained silicon technique.

Abstract: To provide a technique capable of improving the reliability of a semiconductor device even if the downsizing thereof is advanced. The technical idea of the present invention lies in the configuration in which in a first to a third silicon nitride film to be formed by lamination, the respective film thicknesses thereof are not constant but become smaller in order from the third silicon nitride film in the upper layer to the first silicon nitride film in the lower layer while the total film thickness thereof is kept constant. Due to this it is possible to improve the embedding characteristic of the third silicon nitride film in the uppermost layer in particular, while ensuring the tensile stress of the first to third silicon nitride films, which makes effective the strained silicon technique.

Abstract: A semiconductor package having a molding unit that seals bonding wires connected to electrode pads of a semiconductor chip is provided with through electrode units comprising bonding wires embedded therein and penetrating the molding unit. A leading end of the respective through electrode units is exposed from an upper surface of the molding unit and a lower surface of the molding unit.