Patents by Inventor Yuki MITSUTAKE

Yuki MITSUTAKE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240201592
    Abstract: A resist underlayer film-forming composition comprising a polymer having at least one repeating unit of Formula (1), (2), (3), or (4) (omitted), and a solvent, the composition exhibiting a high etching resistance, favorable dry etching rate ratio and optical constant, further forming a film exhibiting a good coatability even to an uneven substrate, providing a small difference in film thickness after embedding and having a planarity and superior hardness, thereby enabling finer substrate processing.
    Type: Application
    Filed: March 9, 2022
    Publication date: June 20, 2024
    Applicant: NISSAN CHEMICAL CORPORATION
    Inventors: Hayato HATTORI, Masahisa ENDO, Yuki MITSUTAKE, Hirokazu NISHIMAKI
  • Publication number: 20240103369
    Abstract: A resist underlayer film-forming composition that exhibits a high etching resistance, a favorable dry etching rate ratio and optical constant, and can form a film exhibiting a good coatability even to a so-called uneven substrate, providing a small difference in film thickness after embedding, and having planarity and a superior hardness; a resist underlayer film formed from the resist underlayer film-forming composition; and a method of producing a semiconductor device.
    Type: Application
    Filed: December 16, 2021
    Publication date: March 28, 2024
    Applicant: NISSAN CHEMICAL CORPORATION
    Inventors: Masahisa ENDO, Hayato HATTORI, Yuki MITSUTAKE, Hirokazu NISHIMAKI
  • Publication number: 20230350299
    Abstract: A step substrate coating composition for efficiently forming a coating that is capable of filling and flattening a pattern. A step substrate coating composition comprising a compound (A) of a main agent, a crosslinking agent, and a solvent, the compound (A) including a partial structure expressed by formula (A-1) (where the broken line represents bonding with an aromatic ring, the aromatic ring forming a polymer skeleton or a monomer, and n represents an integer of 1-4).
    Type: Application
    Filed: September 2, 2021
    Publication date: November 2, 2023
    Applicant: NISSAN CHEMICAL CORPORATION
    Inventors: Yuki MITSUTAKE, Hayato HATTORI, Tomotada HIROHARA
  • Publication number: 20220283501
    Abstract: A resist underlayer film forming composition contains a reaction product of an aromatic compound (A) having 6 to 60 carbon atoms and a compound represented by formula (B), and a solvent. (In the formula, X represent an oxygen atom or a nitrogen atom; Y represents a single bond, an oxygen atom or a nitrogen atom; X and Y may combine with each other to form a ring; and each of R1, R2, R3 and R4 independently represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, a cyclic alkyl group having 3 to 8 carbon atoms or an aromatic group having 6 to 10 carbon atoms; provided that R2 is present only in cases where X is a nitrogen atom, and R4 is present only in cases where Y is a nitrogen atom.
    Type: Application
    Filed: July 20, 2020
    Publication date: September 8, 2022
    Applicant: NISSAN CHEMICAL CORPORATION
    Inventors: Hiroto OGATA, Hirokazu NISHIMAKI, Makoto NAKAJIMA, Yuki MITSUTAKE, Hayato HATTORI