Abstract: A monolithic three dimensional memory device includes a semiconductor substrate having a major surface and a doped well region of a first conductivity type extending substantially parallel to the major surface of the semiconductor substrate, a plurality of NAND memory strings extending substantially perpendicular to the major surface of the semiconductor substrate, and a plurality of substantially pillar-shaped support members extending substantially perpendicular to the major surface of the semiconductor substrate, each support member including an electrically insulating outer material surrounding an electrically conductive core material that extends substantially perpendicular to the major surface of the semiconductor substrate and electrically contacting the doped well region.

Abstract: A structure is formed on a substrate, which includes a stack of alternating layers comprising insulating layers and electrically conductive layers and a plurality of memory stack structures extending through the stack. At least one bridge line structure is formed on top surfaces of a respective subset of the plurality of memory stack structures to provide local lateral electrical connection. At least one dielectric material layer is formed over the at least one bridge line structure and the plurality of memory stack structures. A plurality contact via structures is formed through the dielectric material layer. The plurality of contact via structures includes at least one first contact via structure contacting a top surface of a respective bridge line structure, and second contact via structures contacting a top surface of a respective memory stack structure.

Abstract: A monolithic three dimensional memory device includes a semiconductor substrate having a major surface and a doped well region of a first conductivity type extending substantially parallel to the major surface of the semiconductor substrate, a plurality of NAND memory strings extending substantially perpendicular to the major surface of the semiconductor substrate, and a plurality of substantially pillar-shaped support members extending substantially perpendicular to the major surface of the semiconductor substrate, each support member including an electrically insulating outer material surrounding an electrically conductive core material that extends substantially perpendicular to the major surface of the semiconductor substrate and electrically contacting the doped well region.

Abstract: In NAND Flash memory, bit line precharge/discharge times can be a main component in determining program, erase and read performance. In a conventional arrangement bit line levels are set by the sense amps and bit lines are discharged to a source line level is through the sense amplifier path. Under this arrangement, precharge/discharge times are dominated by the far-side (relative to the sense amps) based on the bit lines' RC constant. Reduction of bit line precharge/discharge times, therefore, improves NAND Flash performance and subsequently the overall system performance. To addresses this, an additional path is introduced between bit lines to the common source level through the use of dummy NAND strings. In an exemplary 3D-NAND (BiCS) based embodiment, the dummy NAND strings are taken from dummy blocks, where the dummy blocks can be placed throughout the array to evenly distribute the discharging current.

Abstract: A monolithic three dimensional memory device includes a semiconductor substrate having a major surface and a doped well region of a first conductivity type extending substantially parallel to the major surface of the semiconductor substrate, a plurality of NAND memory strings extending substantially perpendicular to the major surface of the semiconductor substrate, and a plurality of substantially pillar-shaped support members extending substantially perpendicular to the major surface of the semiconductor substrate, each support member including an electrically insulating outer material surrounding an electrically conductive core material that extends substantially perpendicular to the major surface of the semiconductor substrate and electrically contacting the doped well region.

Abstract: A memory device includes a memory cell array having a first side and a second side and a stepped word line contact region located between the first side and the second side of the memory array. A first word line stair pattern is located in the stepped word line contact region adjacent to the first side of the memory array and a second word line stair pattern located in the stepped word line contact region adjacent to the second side of the memory array. A peripheral device region located in the stepped word line contact region between the first and the second word line stair patterns.

Abstract: A memory device includes a memory cell array having a first side and a second side and a stepped word line contact region located between the first side and the second side of the memory array. A first word line stair pattern is located in the stepped word line contact region adjacent to the first side of the memory array and a second word line stair pattern located in the stepped word line contact region adjacent to the second side of the memory array. A peripheral device region located in the stepped word line contact region between the first and the second word line stair patterns.