Patents by Inventor Yuki Oomasa

Yuki Oomasa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cleaning process for photomasks
    Patent number: 7001470
    Abstract: A photomask provided with a light-shielding coating on a surface of a glass substrate is cleaned with O3 gas solved water to eliminate organic substances adhered on a surface of the photomask (S120). Using an alkaline chemical such as alkaline ionized water or hydrogenated water, the photomask is then cleaned to eliminate contamination (S122). After completion of these cleaning steps, the photomask is dried (S124).
    Type: Grant
    Filed: April 10, 2002
    Date of Patent: February 21, 2006
    Assignee: Renesas Technology Corp.
    Inventors: Koji Tange, Yoshikazu Nagamura, Kunihiro Hosono, Yasutaka Kikuchi, Yuki Oomasa, Koichi Kido
  • Cleaning process for photomasks
    Publication number: 20050274392
    Abstract: A photomask provided with a light-shielding coating on a surface of a glass substrate is cleaned with O3 gas solved water to eliminate organic substances adhered on a surface of the photomask (S120). Using an alkaline chemical such as alkaline ionized water or hydrogenated water, the photomask is then cleaned to eliminate contamination (S122). After completion of these cleaning steps, the photomask is dried (S124).
    Type: Application
    Filed: August 24, 2005
    Publication date: December 15, 2005
    Applicant: Renesas Technology Corp.
    Inventors: Koji Tange, Yoshikazu Nagamura, Kunihiro Hosono, Yasutaka Kikuchi, Yuki Oomasa, Koichi Kido
  • Cleaning process for photomasks
    Publication number: 20020155360
    Abstract: A photomask provided with a light-shielding coating on a surface of a glass substrate is cleaned with O3 gas solved water to eliminate organic substances adhered on a surface of the photomask (S120). Using an alkaline chemical such as alkaline ionized water or hydrogenated water, the photomask is then cleaned to eliminate contamination (S122). After completion of these cleaning steps, the photomask is dried (S124).
    Type: Application
    Filed: April 10, 2002
    Publication date: October 24, 2002
    Applicant: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Koji Tange, Yoshikazu Nagamura, Kunihiro Hosono, Yasutaka Kikuchi, Yuki Oomasa, Koichi Kido