Patents by Inventor Yuki Tanaka

Yuki Tanaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11522202
    Abstract: An alloy member includes a base member that includes a plurality of recesses in a surface and is constituted by an alloy material containing chromium, a plurality of embedded portions that are respectively disposed in the plurality of recesses, and a coating layer that covers the base member and is connected to the plurality of embedded portions. An average value of actual lengths of line segments of the plurality of embedded portions is longer than an average value of straight lengths of straight lines of the plurality of embedded portions in a cross-section of the base member along a thickness direction of the base member. The average value of the actual lengths is 1.10 times or more the average value of the lengths of the straight lines.
    Type: Grant
    Filed: December 27, 2019
    Date of Patent: December 6, 2022
    Assignee: NGK INSULATORS, LTD.
    Inventors: Yuki Tanaka, Toshiyuki Nakamura, Makoto Ohmori
  • Publication number: 20220352764
    Abstract: A wireless power transmission system and a wireless power transmission method are provided that, even if a power transmitter does not have a communication functionality, can improve a transmission efficiency of power waves transmitted from the power transmitter. The wireless power transmission system includes a power transmitter that transmits a power wave and one or more power receivers that receive the power wave, wherein the power transmitter includes a controller that measures a strength of a power wave transmitted from the power receivers by adjusting at least one of a position of the power transmitter and an orientation of an antenna receiving the power wave transmitted from the power receivers and transmits a power wave to the power receivers in accordance with at least one of the position of the power transmitter and the orientation of the antenna upon the measured strength of the power wave exceeding a predetermined value.
    Type: Application
    Filed: April 21, 2022
    Publication date: November 3, 2022
    Inventors: Aya KUROKAWA, Hiroyuki TANI, Yuki TANAKA
  • Publication number: 20220306593
    Abstract: An enantiomer preparation method in which one enantiomer of a sulfoxide compound is selectively prepared, the sulfoxide compound having a sulfur atom of a sulfoxide group as an asymmetric center, the method including a step A for optically resolving an enantiomer mixture of a sulfoxide compound into one enantiomer and the other enantiomer; a step B for irradiating with light the other enantiomer obtained in step A or step C to racemize the enantiomer; and step C for optically resolving the enantiomer mixture of the sulfoxide compound obtained in step B into one enantiomer and the other enantiomer. A system for preparing an enantiomer which is used in the enantiomer preparation method.
    Type: Application
    Filed: August 25, 2020
    Publication date: September 29, 2022
    Inventors: Hideyo TAKAHASHI, Kosho MAKINO, Kaya GU, Yuki TANAKA
  • Patent number: 11453098
    Abstract: A carrier for a double-side polishing apparatus configured to double-side polish providing a semiconductor silicon wafer. The carrier being disposed between upper and lower turn tables have a polishing pad attached, and includes a holding hole formed to hold the semiconductor silicon wafer between the upper and lower turn tables during polishing. The carrier for a double-side polishing apparatus is made of a resin. An average contact angle with pure water of front and back surfaces of the carrier, which come into contact with the polishing pads, is 45° or more and 60° or less, and a difference in average contact angles between the front surface and the back surface is 5° or less, which provides a carrier for a double-side polishing apparatus capable of enhancing the polishing rate for a semiconductor silicon wafer by using a resinous carrier; and a double-side polishing apparatus and method which employ the carrier.
    Type: Grant
    Filed: November 10, 2017
    Date of Patent: September 27, 2022
    Assignee: SHIN-ETSU HANDOTAI CO., LTD.
    Inventors: Yuki Tanaka, Daichi Kitazume
  • Publication number: 20220294065
    Abstract: A secondary battery accommodating structure disposed at a humanoid robot includes an accommodating part for a secondary battery module, that is disposed inside cladding of a body of the humanoid robot and opens in a first direction that is a lateral direction, a fixing part that fixes the secondary battery module to the accommodating part, and a drawing space for the secondary battery module, located in the first direction with respect to the accommodating part, within the cladding of the body. The drawing space opens at least either one of upwardly or downwardly to allow in and out of the secondary battery module.
    Type: Application
    Filed: September 2, 2020
    Publication date: September 15, 2022
    Applicant: KAWASAKI JUKOGYO KABUSHIKI KAISHA
    Inventors: Masayuki KAMON, So YUKIZAKI, Junichi KARASUYAMA, Yuki TANAKA
  • Publication number: 20220294062
    Abstract: A secondary battery unit includes a first secondary battery module disposed at at least either one of a front part or a back part of a body of a humanoid robot, a second secondary battery module disposed around the body in a direction intersecting with a front-and-rear direction of the body, and a base coupling the first secondary battery module to the second secondary battery module. The base is detachably attached to the body, together with the first secondary battery module and the second secondary battery module.
    Type: Application
    Filed: September 2, 2020
    Publication date: September 15, 2022
    Applicant: KAWASAKI JUKOGYO KABUSHIKI KAISHA
    Inventors: Masayuki KAMON, So YUKIZAKI, Junichi KARASUYAMA, Yuki TANAKA
  • Patent number: 11430165
    Abstract: A display control apparatus displays, when a map image is to be displayed on a display unit, together with the map image, information corresponding to a plurality of images associated with position information that indicates positions included in a predetermined range within a display range of the map image, and when a predetermined operation with respect to the image has been accepted through an operation unit, the control unit performs control to display an image corresponding to a relationship between a direction based on a first operation position and a second operation position of the predetermined operation and direction information associated with the plurality of images.
    Type: Grant
    Filed: August 9, 2019
    Date of Patent: August 30, 2022
    Assignee: Canon Kabushiki Kaisha
    Inventors: Shuhei Kawachi, Masahiko Okuzawa, Shigeo Ajiro, Yuki Tanaka
  • Patent number: 11401296
    Abstract: The present invention provides an amidite compound represented by formula (1) which enables a synthesis of RNA with high purity, and the method for preparing a polynucleotide by using the same compound. (In the formula (1), wherein R represents the following formula (wherein Ra and Rb are identical to or different from each other and each represents a methyl group, an ethyl group, or a hydrogen atom, with the proviso that Ra and Rb does not represent a hydrogen atom, n is an integer of 1 to 5), and Ba represents a group containing optionally protected nucleobase structure, and G1 and G2 are identical to or different from each other and each represents a protecting group for a hydroxy group, and G3 are identical to or different from each other and each represents an alkyl group.
    Type: Grant
    Filed: April 23, 2019
    Date of Patent: August 2, 2022
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yuki Tanaka, Tatsuya Saito, Hideki Ihara
  • Patent number: 11394261
    Abstract: Disclosed are: preparing a rotor core having a plurality of magnet holes spaced near a circumferential edge of the rotor core; preparing a plurality of permanent magnet units each including a porous body and a magnet main body disposed in contact with each other; and inserting the permanent magnet units into the magnet holes and securing the permanent magnet units in the magnet holes.
    Type: Grant
    Filed: December 12, 2019
    Date of Patent: July 19, 2022
    Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Masashi Matsumoto, Haruki Kusamaki, Hazuki Kawamura, Kohei Watanabe, Yuki Tanaka
  • Publication number: 20220220327
    Abstract: A colored dispersion that contains (A) C.I. Disperse Orange 25, (B) a specific dye such as C.I. Disperse Orange 49, 62, 71, 73, or 148, and water. When the total (A) C.I. Disperse Orange 25 and (B) specific dye content of the colored dispersion is 100 parts by mass, the (B) specific dye content of the colored dispersion is less than 20 parts by mass. A recording medium to which the colored dispersion has been adhered and a textile printing method for hydrophobic fibers that uses the colored dispersion.
    Type: Application
    Filed: May 19, 2020
    Publication date: July 14, 2022
    Inventors: Takahiro MATSUMOTO, Yuta HAGIWARA, Yoshimasa MIYAZAWA, Yuki TANAKA
  • Patent number: 11373798
    Abstract: An ignition device includes a case having an opening and a bottom wall, a coil bobbin arranged in the case having a through hole, a first end and a second end, an ignition coil wound around the coil bobbin, a core made of magnetic material and projecting from the opening and from the bottom wall, and extending through the coil bobbin, a retainer having a ring portion and multiple leg portions extending from the ring, and a filling resin in the case. The core extends through the ring portion and the leg portions extend in between an inner surface of the coil bobbin and an outer peripheral surface of the core toward the bottom wall, and the case is filled with the filling resin in a manner that at least a part of the ring portion is not covered by the resin.
    Type: Grant
    Filed: May 11, 2018
    Date of Patent: June 28, 2022
    Assignee: Walbro LLC
    Inventors: Shunya Nakamura, Yuki Tanaka, Kazunori Tsubakino
  • Patent number: 11371909
    Abstract: A lifespan diagnosis device for a motion guidance device including: a stress calculating means which calculates stresses during movement for each of virtual segments, the stresses during movement being stresses that occur in each segment during a movement of the moving member; a counting means which counts, for each of the segments, on the basis of the amount of displacement, the number of occurrences of the stresses during movement which repetitively occur with waving during a movement of the moving member along the track; and a diagnostic means which calculates, for each of the segments, a lifespan exhaustion ratio on the basis of magnitudes of the stresses during movement and the number of occurrences of the stresses during movement, and which diagnoses the lifespan of the motion guidance device on the basis of the calculated lifespan exhaustion ratios of the respective segments.
    Type: Grant
    Filed: December 21, 2017
    Date of Patent: June 28, 2022
    Assignee: THK CO., LTD.
    Inventors: Akihiro Unno, Yuki Hayashi, Yuki Tanaka, Tomofumi Ohashi, Yusuke Asano, Katsunori Kogure
  • Patent number: 11362344
    Abstract: A cell stack device includes a manifold and a fuel cell. The manifold includes a gas supply chamber and a gas collection chamber. The fuel cell includes a support substrate and a power generation element portion. The support substrate includes first and second gas channels. The first gas channel is connected to the gas supply chamber, and the second gas channel is connected to the gas collection chamber. The first gas channel is open in the gas supply chamber at a proximal end portion. The second gas channel is open in the gas collection chamber at a proximal end portion. The first and second gas channels are connected to each other on the distal end portion side. The first and second gas channels are configured such that a pressure loss of gas in the first gas channel is smaller than a pressure loss of gas in the second gas channel.
    Type: Grant
    Filed: September 4, 2019
    Date of Patent: June 14, 2022
    Assignee: NGK INSULATORS, LTD.
    Inventors: Risako Ito, Makoto Ohmori, Hirofumi Kan, Yuki Tanaka, Masayuki Shinkai
  • Patent number: 11359111
    Abstract: Provided is a thermally conductive thin-film cured product constituted by a cured product of a handleable silicone composition, the cured product having good transferability to a member and good post-debonding handling properties, and exhibiting good bond strength to a heat-generating element, even at elevated temperatures. The thermally conductive thin-film cured product is obtained by curing a silicone composition containing: (a) 100 parts by mass of an organopolysiloxane comprising two or more alkenyl groups per molecule; 200-2,000 parts by mass, inclusive, of a thermally conductive filler; (c) an amount of an organohydrodiene polysiloxane comprising two or more hydrogen atoms directly bonded to a silicon atom per molecule such that Si—H/alkenyl groups is 0.5-50.0, inclusive; (d) an amount of a platinum group metal compound equal to 0.
    Type: Grant
    Filed: January 8, 2019
    Date of Patent: June 14, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takanori Ito, Akihiro Endo, Yuki Tanaka
  • Publication number: 20220168865
    Abstract: A double-side polishing method including: disposing a wafer between a polishing pad attached to an upper surface of a lower turn table and a polishing pad attached to a lower surface of an upper turn table provided above the lower turn table; and polishing both sides of the wafer. An absolute value of a difference between a gap at inner circumferential portions of the two polishing pads and a gap at outer circumferential portions thereof is defined as a pad gap. The pad gap is larger when the both sides of the wafer are polished than when the two polishing pads are dressed. This provides a double-side polishing method that simultaneously achieves enhancement of quality level (processing precision) and extension of cloth life.
    Type: Application
    Filed: February 27, 2020
    Publication date: June 2, 2022
    Applicant: SHIN-ETSU HANDOTAI CO., LTD.
    Inventor: Yuki TANAKA
  • Patent number: 11349127
    Abstract: In a cell stack, each of the plurality of the electrochemical cells includes an alloy member, a first electrode layer, a second electrode layer, and an electrolyte layer. The alloy member includes a base member constituted by an alloy material containing chromium, a coating film that covers at least a part of a surface of the base member, and a separation inhibiting portion that inhibits the coating film from separating from the base member. The number of the separation inhibiting portions included in the alloy member of the central electrochemical cell is larger than the number of the separation inhibiting portions included in the alloy member of the end electrochemical cell.
    Type: Grant
    Filed: November 18, 2020
    Date of Patent: May 31, 2022
    Assignee: NGK INSULATORS, LTD.
    Inventors: Yuki Tanaka, Toshiyuki Nakamura, Makoto Ohmori
  • Publication number: 20220158496
    Abstract: A wireless power transmitter includes an antenna that transmits a radio wave, a phase shift circuit that changes a phase of the radio wave transmitted from the antenna, a control device that controls the phase shift circuit, and a backscatter signal receiver that receives a backscatter signal. The control device executes phase optimization processing of controlling the phase shift circuit so that a strength of the backscatter signal received by the wireless power transmitter is maximized.
    Type: Application
    Filed: February 7, 2022
    Publication date: May 19, 2022
    Inventors: Yuki TANAKA, Ryosuke HASABA, Yoshio KOYANAGI, Kazuki KANAI
  • Publication number: 20220154313
    Abstract: A door beam of a motor vehicle includes a 7000 series aluminum alloy extruded material, the 7000 series aluminum alloy extruded material including Zn: 7.5 mass % to 9.0 mass %, Mg: 1.3 mass % to 2.0 mass %, Cu: 0.1 mass % to 0.7 mass %, Si: 0.15 mass % or less, Fe: 0.3 mass % or less, Ti: 0.005 mass % to 0.2 mass %, and at least one of Mn, Cr, and Zr: 0.1 mass % to 0.5 mass %, in which contents of Mn, Cr and Zr satisfy Mn: 0.3 mass % or less, Cr: 0.25 mass % or less, and Zr: 0.25 mass %, respectively, with the remainder being Al and impurities. A Fe-based crystallized product is contained, and an average Cu content of the Fe-based crystallized product is 5.0 mass % or less.
    Type: Application
    Filed: March 5, 2020
    Publication date: May 19, 2022
    Applicant: Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.)
    Inventors: Takahiro SHIKAMA, Shinji YOSHIHARA, Misuzu YAMAMOTO, Yuki TANAKA, Ryo UNOKI, Takahiro OZAWA
  • Patent number: 11327719
    Abstract: A generation means 11 generates a uniform random number between 0 and a first probability, which is a probability of a stochastic variable becoming a value within a predetermined interval in a positive range in the first discrete distribution. When a uniform random number less than or equal to a second probability is generated, the second probability being a probability of the stochastic variable becoming a value within a predetermined interval in a second discrete distribution, which is a discrete Gaussian distribution on a one-dimensional lattice the center of which is the origin, the selection means 12 selects, as a random number generation method, an accumulation method in which a functional value defining the second discrete distribution is used. When a uniform random number greater than the second probability is generated, the selection means 12 selects a rejection sampling method as the random number generation method.
    Type: Grant
    Filed: August 7, 2017
    Date of Patent: May 10, 2022
    Assignee: NEC CORPORATION
    Inventors: Yuki Tanaka, Kazuhiko Minematsu
  • Patent number: 11325220
    Abstract: A double-side polishing method, including: simultaneously polishing both surfaces of a semiconductor wafer by holding the semiconductor wafer in a carrier, interposing the held semiconductor wafer between an upper turn table and a lower turn table each having a polishing pad attached thereto, and bringing both surfaces of the semiconductor wafer into sliding contact with the polishing pads, wherein the semiconductor wafer is polished under a condition that a thickness A (mm) of the polishing pad attached to the upper turn table and a thickness B (mm) of the polishing pad attached to the lower turn table satisfy relations of 1.0?A+B?2.0 and A/B>1.0. This provides a double-side polishing method capable of obtaining a semiconductor wafer in which F-ZDD<0 while controlling the GBIR value to be equal to or smaller than a required value.
    Type: Grant
    Filed: February 1, 2017
    Date of Patent: May 10, 2022
    Assignee: SHIN-ETSU HANDOTAI CO., LTD.
    Inventors: Yuki Tanaka, Shiro Amagai