Abstract: A vapor deposition apparatus for a minute-structure includes a surface acoustic wave device 10 that has at least a pair of electrodes 12 and 13 arranged at an interval on a surface of a piezoelectric body 11, a vacuum vapor deposition device 20 that vacuum-deposits at least two substances A and B on a surface of the surface acoustic wave device, and a high-frequency application device 30 that applies a high-frequency voltage between the electrodes of the surface acoustic wave device. In the state where a standing wave of surface acoustic waves is generated on the surface of the surface acoustic wave device by applying the high-frequency voltage, a plurality of thin film layers are formed, and a minute-structure is vapor-deposited at a specific position of the standing wave.