Patents by Inventor Yukie Ueno
Yukie Ueno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6491808Abstract: An electrolytic etching method for etching treating an object to be etched by an electrochemical reaction through an electrolyte between the object to be etched and an etching electrode, where the contact angle of the electrolyte to the object to be etched is not more than 70°. This electrolytic etching method can etch the object in a non-contact manner, can reduce the cost, number of steps, and processing time, and can enhance the patterning accuracy.Type: GrantFiled: September 9, 1998Date of Patent: December 10, 2002Assignee: Canon Kabushiki KaishaInventors: Hirofumi Ichinose, Ippei Sawayama, Tsutomu Murakami, Masaya Hisamatsu, Yukie Ueno
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Patent number: 6472594Abstract: A photovoltaic element comprising an electrode comprising an electrically conductive core member which is coated with a conductive adhesive fixed on the light incident surface of a photoactive semiconductor layer, via the conductive adhesive, is disclosed. The conductive adhesive is composed of at least two layers. The softening point of the conductive adhesive layer nearer to the core member is higher than the highest temperature encountered in the manufacture of the photovoltaic element.Type: GrantFiled: July 11, 1997Date of Patent: October 29, 2002Assignee: Canon Kabushiki KaishaInventors: Hirofumi Ichinose, Akio Hasebe, Tsutomu Murakami, Satoshi Shinkura, Yukie Ueno
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Publication number: 20010007306Abstract: Provided is an electrolytic etching method for etching treating an object to be etched by an electrochemical reaction through an electrolyte between the object to be etched and an etching electrode, wherein the contact angle of the electrolyte to the object to be etched is not more than 70°. Thus provided is an electrolytic etching method that can etch the object in a non-contact manner, that can reduce the cost, the number of steps, and the processing time, and that can enhance the patterning accuracy.Type: ApplicationFiled: September 9, 1998Publication date: July 12, 2001Inventors: HIROFUMI ICHINOSE, IPPEI SAWAYAMA, TSUTOMU MURAKAMI, MASAYA HISAMATSU, YUKIE UENO
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Patent number: 6221685Abstract: The present invention provides a method of producing a photovoltaic element, which comprises a step of immersing a photovoltaic element having at least a first electrode layer, a semiconductor layer and a second electrode layer formed on a substrate into an electrolytic solution, and removing a short circuit current path caused by a defect in the photovoltaic element under the effect of an electric field, wherein the amount of a first ingredient and the amount of a second ingredient contained in the electrolytic solution are adjusted to control the concentration of hydrogen ions in the electrolytic solution, wherein the constituent substance of the second electrode layer is electrically dissolved by the first ingredient, and thereby it also provides a method of producing photovoltaic elements which is capable of reducing a leakage current caused by defect portions such as pin-holes existing in the photovoltaic elements with a large area to obtain photovoltaic elements with excellent photovoltage generation chType: GrantFiled: December 2, 1998Date of Patent: April 24, 2001Assignee: Canon Kabushiki KaishaInventors: Hirofumi Ichinose, Tsutomu Murakami, Yukie Ueno
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Patent number: 6051116Abstract: An etching apparatus is described comprising a substrate holding segment for holding a substrate with a portion to be etched, an electrolytic bath for maintaining an electrolyte solution therein, a locomotive mechanism for moving the substrate holding segment in order to immerse the substrate held on the substrate holding segment in the electrolyte solution maintained in the electrolytic bath, and a counter electrode holding segment for holding a counter electrode having a pattern corresponding a desired etching pattern to be formed at the portion to be etched of the substrate. The counter electrode is positioned to oppose the substrate held on the substrate holding segment.Type: GrantFiled: September 30, 1998Date of Patent: April 18, 2000Assignee: Canon Kabushiki KaishaInventors: Hirofumi Ichinose, Ippei Sawayama, Akio Hasebe, Tsutomu Murakami, Masaya Hisamatsu, Satoshi Shinkura, Yukie Ueno
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Patent number: 6051778Abstract: An electrode structure is formed by superposing a bar-shaped or linear metal member on an electroconductive layer comprising a polymeric resin and an electroconductive filler dispersed therein. The electroconductive layer may be formed as an electroconductive sheet in advance and patterned before it is superposed with the metal member, followed by heat and pressure application to provide an electrode structure showing a low resistivity, a large adhesion even to an elevation and a high reliability. The electrode structure is suitably used for providing a collector electrode structure on a photo-electricity generating device.Type: GrantFiled: December 11, 1997Date of Patent: April 18, 2000Assignee: Canon Kabushiki KaishaInventors: Hirofumi Ichinose, Akio Hasebe, Tsutomu Murakami, Satoshi Shinkura, Yukie Ueno
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Patent number: 6008451Abstract: A photovoltaic device is provided which comprises a semiconductor layer, and an electrode comprising an electrode member and an conductive resin layer, wherein the electrode member has a constitution of a complex of a core and a periphery, and the periphery contains no particle with a particle size larger than 2 .mu.m. The electrode of this photovoltaic device exhibits high current collecting efficiency and is reliable in long use term.Type: GrantFiled: August 6, 1997Date of Patent: December 28, 1999Assignee: Canon Kabushiki KaishaInventors: Hirofumi Ichinose, Akio Hasebe, Tsutomu Murakami, Satoshi Shinkura, Yukie Ueno
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Patent number: 5993637Abstract: An electrode structure is constituted by a first electrode, and at least one second electrode providing a pair of opposite portions with a prescribed spacing therebetween at which the first electrode is disposed. The electrode structure is suitably used for electrolytic etching and is effective in providing an accurate etching pattern without damaging the surface of an etching object.Type: GrantFiled: December 3, 1997Date of Patent: November 30, 1999Assignee: Canon Kabushiki KaishaInventors: Masaya Hisamatsu, Akio Hasebe, Tsutomu Murakami, Hirofumi Ichinose, Satoshi Shinkura, Yukie Ueno
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Patent number: 5863412Abstract: A method for etching an object having a portion to be etched on the surface thereof, comprising a step of immersing said object in an electrolyte solution such that said object serves as a negative electrode; a step of arranging a counter electrode having a pattern corresponding to a desired etching pattern to be formed at said portion to be etched of said object in said electrolyte solution so as to maintain a predetermined interval between said counter electrode and said object, and a step of applying a direct current or a pulse current between said object and said counter electrode to etch said portion to be etched of said object into a pattern corresponding to said pattern of said counter electrode.Type: GrantFiled: October 17, 1996Date of Patent: January 26, 1999Assignee: Canon Kabushiki KaishaInventors: Hirofumi Ichinose, Ippei Sawayama, Akio Hasebe, Tsutomu Murakami, Masaya Hisamatsu, Satoshi Shinkura, Yukie Ueno
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Patent number: 5861324Abstract: A photovoltaic element comprising an electrode comprising an electrically conductive core member which is coated with a conductive adhesive fixed on the light incident surface of a photoactive semiconductor layer, via the conductive adhesive, is disclosed.The conductive adhesive is composed of at least two layers. The softening point of the conductive adhesive layer nearer to the core member is higher than the highest temperature encountered in the manufacture of the photovoltaic element.Type: GrantFiled: December 12, 1996Date of Patent: January 19, 1999Assignee: Canon Kabushiki KaishaInventors: Hirofumi Ichinose, Akio Hasebe, Tsutomu Murakami, Satoshi Shinkura, Yukie Ueno
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Patent number: 5859397Abstract: A process for producing a photovoltaic element, said process comprising the steps of: providing a photovoltaic element comprising a lower electrode layer comprising a metallic layer comprising aluminum or an aluminum compound and a transparent and electrically conductive layer, a photoelectric conversion semiconductor layer, and a transparent electrode layer stacked in the named order on an electrically conductive surface of a substrate, and immersing said photovoltaic element in an electrolyte solution to passivate an short-circuited current path defect present in said photovoltaic element by the action of an electric field, wherein said electrolyte solution has a chlorine ion content of 0.03 mol/l or less.Type: GrantFiled: May 16, 1997Date of Patent: January 12, 1999Assignee: Canon Kabushiki KaishaInventors: Hirofumi Ichinose, Akio Hasebe, Tsutomu Murakami, Satoshi Shinkura, Yukie Ueno
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Patent number: 5759291Abstract: A photovoltaic device comprising a semiconductor layer, a current collecting electrode on said semiconductor layer, and a bus bar electrically connected to the current collecting electrode. The current collecting electrode comprises a metal wire. A part of the current collecting electrode is positioned between the bus bar and the semiconductor layer.Type: GrantFiled: June 27, 1996Date of Patent: June 2, 1998Assignee: Canon Kabushiki KaishaInventors: Hirofumi Ichinose, Akio Hasebe, Tsutomu Murakami, Satoshi Shinkura, Yukie Ueno
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Patent number: 5681402Abstract: A photovoltaic element comprising an electrode comprising an electrically conductive core member which is coated with a conductive adhesive fixed on the light incident surface of a photoactive semiconductor layer, via the conductive adhesive, is disclosed.The conductive adhesive is composed of at least two layers. The softening point of the conductive adhesive layer nearer to the core member is higher than the highest temperature encountered in the manufacture of the photovoltaic element.Type: GrantFiled: October 30, 1995Date of Patent: October 28, 1997Assignee: Canon Kabushiki KaishaInventors: Hirofumi Ichinose, Akio Hasebe, Tsutomu Murakami, Satoshi Shinkura, Yukie Ueno