Patents by Inventor Yukihiko Yamashita

Yukihiko Yamashita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220186089
    Abstract: Disclosed is the copolymer having a (meth)acrylic monomer unit A having an anionic group, a (meth)acrylic monomer unit B having a cationic group, and a (meth)acrylic monomer unit C other than the (meth)acrylic monomer unit A and the (meth)acrylic monomer unit B.
    Type: Application
    Filed: April 7, 2020
    Publication date: June 16, 2022
    Applicant: Denka Company Limited
    Inventors: Ippei TAKASAKI, Kazuyuki IGARASHI, Tomoyuki KANAI, Yukihiko YAMASHITA
  • Patent number: 11072730
    Abstract: A composition having excellent adhesiveness to poorly adhesive materials such as polyolefins is provided. The solution is a composition comprising the following (1) to (2): (1) (meth)acrylates containing the following (1-1) to (1-3): (1-1) a (meth)acrylate having a hydroxyl group, (1-2) an alkyl (meth)acrylate, and (1-3) a (meth)acrylate having a cyclic ether skeleton, and (2) an organoboron compound. The content ratio of (1-1), (1-2), and (1-3) is (1-1):(1-2):(1-3)=(10 to 90):(5 to 80):(5 to 80) in mass ratio in 100 parts by mass of (1) (meth)acrylates.
    Type: Grant
    Filed: December 15, 2017
    Date of Patent: July 27, 2021
    Assignee: DENKA COMPANY LIMITED
    Inventors: Takako Hoshino, Masaya Umeyama, Yukihiko Yamashita
  • Patent number: 11008486
    Abstract: A composition having excellent adhesiveness to poorly adhesive materials such as polyolefins is provided. The solution is a composition comprising the following (1) to (2): (1) (meth)acrylates containing the following (1-1) to (1-3): (1-1) a (meth)acrylate having a hydroxyl group, (1-2) an alkyl (meth)acrylate, and (1-3) a (meth)acrylate having a cyclic ether skeleton, and (2) an organoboron compound. The content ratio of (1-1), (1-2), and (1-3) is (1-1):(1-2):(1-3)=(10 to 90):(5 to 80):(5 to 80) in mass ratio in 100 parts by mass of (1) (meth)acrylates.
    Type: Grant
    Filed: December 15, 2017
    Date of Patent: May 18, 2021
    Assignee: DENKA COMPANY LIMITED
    Inventors: Takako Hoshino, Masaya Umeyama, Yukihiko Yamashita
  • Publication number: 20200102483
    Abstract: A composition having excellent adhesiveness to poorly adhesive materials such as polyolefins is provided. The solution is a composition comprising the following (1) to (2): (1) (meth)acrylates containing the following (1-1) to (1-3): (1-1) a (meth)acrylate having a hydroxyl group, (1-2) an alkyl (meth)acrylate, and (1-3) a (meth)acrylate having a cyclic ether skeleton, and (2) an organoboron compound. The content ratio of (1-1), (1-2), and (1-3) is (1-1):(1-2):(1-3)=(10 to 90):(5 to 80):(5 to 80) in mass ratio in 100 parts by mass of (1) (meth)acrylates.
    Type: Application
    Filed: December 15, 2017
    Publication date: April 2, 2020
    Applicant: DENKA COMPANY LIMITED
    Inventors: Takako HOSHINO, Masaya UMEYAMA, Yukihiko YAMASHITA
  • Patent number: 9656353
    Abstract: The present invention relates to a reflow film containing a thermoplastic resin which is dissolvable in a solvent, and solder particles, wherein the solder particles are dispersed in the film, and also relates to a solder bump formation method which comprises: (A) a step of mounting the reflow film on the electrode surface side of a substrate, (B) a step of mounting and fixing a flat plate, (C) a step of heating, and (D) a step of dissolving and removing the reflow film, and herewith, a reflow film is provided which, by causing localization of the solder component on the electrodes of the substrate by self-assembly, exhibits excellent storage properties, transportability and handling properties during use, and can form solder bumps or solder joints selectively on only the electrodes.
    Type: Grant
    Filed: October 26, 2012
    Date of Patent: May 23, 2017
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Kazuhiro Miyauchi, Naoya Suzuki, Nozomu Takano, Yukihiko Yamashita
  • Publication number: 20140252607
    Abstract: The present invention relates to a reflow film containing a thermoplastic resin which is dissolvable in a solvent, and solder particles, wherein the solder particles are dispersed in the film, and also relates to a solder bump formation method which comprises: (A) a step of mounting the reflow film on the electrode surface side of a substrate, (B) a step of mounting and fixing a flat plate, (C) a step of heating, and (D) a step of dissolving and removing the reflow film, and herewith, a reflow film is provided which, by causing localization of the solder component on the electrodes of the substrate by self-assembly, exhibits excellent storage properties, transportability and handling properties during use, and can form solder bumps or solder joints selectively on only the electrodes.
    Type: Application
    Filed: October 26, 2012
    Publication date: September 11, 2014
    Applicant: Hitachi Chemical Company, Ltd.
    Inventors: Kazuhiro Miyauchi, Naoya Suzuki, Nozomu Takano, Yukihiko Yamashita
  • Publication number: 20140248504
    Abstract: The present invention provides a resin composition, including: a filler that includes alumina particles and boron nitride particles; an elastomer having a weight-average molecular weight of from 10,000 to 100,000; and a curable resin. The present invention also provides a resin sheet, a cured resin sheet, a resin-adhered metal foil and a heat dissipation device, which are formed by using the resin composition.
    Type: Application
    Filed: February 17, 2012
    Publication date: September 4, 2014
    Inventors: Shihui Song, Yukihiko Yamashita, Yoshitaka Takezawa, Hideyuki Katagi
  • Patent number: 8461699
    Abstract: The positive tone photosensitive composition of the invention comprises an alkali-soluble resin having a phenolic hydroxyl group, a compound producing an acid by light, a thermal crosslinking agent and an acrylic resin. It is possible to provide a positive tone photosensitive composition that can be developed with an aqueous alkali solution, has sufficiently high sensitivity and resolution, and can form a resist pattern with excellent adhesiveness and thermal shock resistance.
    Type: Grant
    Filed: December 16, 2009
    Date of Patent: June 11, 2013
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Hiroshi Matsutani, Takumi Ueno, Alexandre Nicolas, Yukihiko Yamashita, Ken Nanaumi, Akitoshi Tanimoto
  • Publication number: 20110254178
    Abstract: The positive tone photosensitive composition of the invention comprises an alkali-soluble resin having a phenolic hydroxyl group, a compound producing an acid by light, a thermal crosslinking agent and an acrylic resin. It is possible to provide a positive tone photosensitive composition that can be developed with an aqueous alkali solution, has sufficiently high sensitivity and resolution, and can form a resist pattern with excellent adhesiveness and thermal shock resistance.
    Type: Application
    Filed: December 16, 2009
    Publication date: October 20, 2011
    Inventors: Hiroshi Matsutani, Takumi Ueno, Alexandre Nicolas, Yukihiko Yamashita, Ken Nanaumi, Akitoshi Tanimoto
  • Patent number: 7295376
    Abstract: A pseudo cross-link type resin composition made of one of resins or a mixture of the resins; wherein the resin is obtained by mixing a polymer molecule that has an atomic group capable of forming an intermolecular hydrogen bond at least in a molecular side chain or at a molecular tail end of the polymer molecule, and a polymer molecule that has an atomic group capable of forming an intermolecular hydrogen bond at lest in a molecular side chain or in a molecular skeleton of the polymer molecule; wherein the polymer molecule having an atomic group capable of forming an intermolecular hydrogen bond at least in a molecular side chain or at a molecular tail end is a vinylic polymer or a copolymer thereof that has a carboxyl group or a hydroxyl group at least in a molecular side chain or at a molecular tail end, and the polymer molecule that has an atomic group capable of forming an intermolecular hydrogen bond at least in a molecular side chain or in a molecular skeleton is a vinylic polymer or a copolymer thereof
    Type: Grant
    Filed: January 22, 2004
    Date of Patent: November 13, 2007
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Tetsuro Yamanaka, Yukihiko Yamashita, Kenji Kanemaru
  • Publication number: 20060104188
    Abstract: A film for optical parts exhibiting high transmittance of short-wavelength light on the order of 400 nm, low birefringence, and excellent flexibility in which warping can be prevented after use for a long term, and a coiled film laminate using the film for optical parts, and an optical parts and an optical discs. The film for optical parts is characterized by comprising a light transmitting layer principally comprising thermosetting resin where an integrated value of the ratio of loss modulus to storage modulus in a temperature range of 30° C. to 80° C. as determined by a dynamic viscoelasticity measurement under a tensile stress mode at a frequency of 10 Hz with a heating rate of 3° C./min is 2 or more.
    Type: Application
    Filed: December 5, 2002
    Publication date: May 18, 2006
    Inventors: Yukihiko Yamashita, Tetsuo Yamanaka, Kenji Kanemaru, Koichi Saito
  • Publication number: 20050283588
    Abstract: The invention relates to an instruction control apparatus, a function unit, a program conversion apparatus, and a language processing apparatus. An object of the invention is to alter and add functions to the above apparatuses inexpensively and freely. To this end, in an instruction control apparatus according to the invention creates a sequence of summation values of numbers of input operands and a sequence of summation values of the numbers of output operands, and correlates, with input operands and output operands without overlap, input registers and output registers that are lower in rank than corresponding summation values included in the sequences of summation values. Physical registers are assigned to each set of input registers and output registers.
    Type: Application
    Filed: January 28, 2005
    Publication date: December 22, 2005
    Inventor: Yukihiko Yamashita
  • Patent number: 6903160
    Abstract: The invention provides a pseudo cross-link resin composition comprises at least tow polymer molecules; wherein the resin is obtained by mixing a vinylic polymer molecule A that has an atomic group capable of forming an intermolecular hydrogen bond in a molecular side chain and/or at a molecular tail end of the polymer molecule, and a vinylic polymer molecule B that has an atomic group capable of forming an intermolecular hydrogen bond in a molecular side chain and/or in a molecular skeleton of the polymer molecule; wherein the vinylic polymer molecule A is a polymer and/or copolymer that has a carboxyl group or a hydroxyl group in a molecular side chain and/or at a molecular tail end, and the vinylic polymer molecule B is a polymer and/or copolymer having at least one or more nitrogen atom in a molecular side chain and/or a molecular skeleton; wherein the vinylic polymer molecule A and the vinylic polymer molecule B are mixed together, the intermolecular hydrogen bond is formed therebetween, and adding a sili
    Type: Grant
    Filed: June 5, 2002
    Date of Patent: June 7, 2005
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Yukihiko Yamashita, Kenji Kanemaru, Koichi Saito
  • Patent number: 6900273
    Abstract: Low-hygroscopicity low-birefringence resin compositions. One of the compositions is a resin composition (a) comprising the following polymers (A), and (B) and/or (C). Another is a resin composition (b) comprising the following polymers (A), (B) and (H). Still another is a polymer comprising the following polymers (I) and (J), diphenylsilicone (D), and a phenolic antioxidant (E). (A) A polymer comprising one or more kinds of indene and indene derivatives represented by the following general formula (I). (B) A polymer comprising polystyrene or a polystyrene derivative. (C) A polymer comprising a monomer copolymerizable with styrene or a styrene derivative. (H) A graft polymer having a structure wherein a polymer comprising at least one kind of indene and an indene derivative represented by the general formula (I) bonds to a side chain of a polymer comprising a monomer copolymerizable with styrene or a styrene derivative.
    Type: Grant
    Filed: June 27, 2000
    Date of Patent: May 31, 2005
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Yukihiko Yamashita, Shuichi Iwata, Tetsuo Yamanaka, Akihiro Yoshida, Keiko Ushikubo
  • Publication number: 20050038194
    Abstract: A pseudo cross-link type resin composition made of one of resins or a mixture of the resins; wherein the resin is obtained by mixing a polymer molecule that has an atomic group capable of forming an intermolecular hydrogen bond at least in a molecular side chain or at a molecular tail end of the polymer molecule, and a polymer molecule that has an atomic group capable of forming an intermolecular hydrogen bond at lest in a molecular side chain or in a molecular skeleton of the polymer molecule; wherein the polymer molecule having an atomic group capable of forming an intermolecular hydrogen bond at least in a molecular side chain or at a molecular tail end is a vinylic polymer or a copolymer thereof that has a carboxyl group or a hydroxyl group at least in a molecular side chain or at a molecular tail end, and the polymer molecule that has an atomic group capable of forming an intermolecular hydrogen bond at least in a molecular side chain or in a molecular skeleton is a vinylic polymer or a copolymer thereof
    Type: Application
    Filed: January 22, 2004
    Publication date: February 17, 2005
    Inventors: Tetsuro Yamanaka, Yukihiko Yamashita, Kenji Kanemaru
  • Publication number: 20040220342
    Abstract: Low-hygroscopicity low-birefringence resin compositions. One of the compositions is a resin composition (a) comprising the following polymers (A), and (B) and/or (C). Another is a resin composition (b) comprising the following polymers (A), (B) and (H). Still another is a polymer comprising the following polymers (I) and (J), diphenylsilicone (D), and a phenolic antioxidant (E). (A) A polymer comprising one or more kinds of indene and indene derivatives represented by the following general formula (I). (B) A polymer comprising polystyrene or a polystyrene derivative. (C) A polymer comprising a monomer copolymerizable with styrene or a styrene derivative. (H) A graft polymer having a structure wherein a polymer comprising at least one kind of indene and an indene derivative represented by the general formula (I) bonds to a side chain of a polymer comprising a monomer copolymerizable with styrene or a styrene derivative.
    Type: Application
    Filed: May 17, 2004
    Publication date: November 4, 2004
    Inventors: Yukihiko Yamashita, Shuichi Iwata, Tetsuo Yamanaka, Akihiro Yoshida, Keiko Ushikubo
  • Publication number: 20040152839
    Abstract: The invention provides a pseudo cross-link resin composition comprises at least tow polymer molecules; wherein the resin is obtained by mixing a vinylic polymer molecule A that has an atomic group capable of forming an intermolecular hydrogen bond in a molecular side chain and/or at a molecular tail end of the polymer molecule, and a vinylic polymer molecule B that has an atomic group capable of forming an intermolecular hydrogen bond in a molecular side chain and/or in a molecular skeleton of the polymer molecule; wherein the vinylic polymer molecule A is a polymer and/or copolymer that has a carboxyl group or a hydroxyl group in a molecular side chain and/or at a molecular tail end, and the vinylic polymer molecule B is a polymer and/or copolymer having at least one or more nitrogen atom in a molecular side chain and/or a molecular skeleton; wherein the vinylic polymer molecule A and the vinylic polymer molecule B are mixed together, the intermolecular hydrogen bond is formed therebetween, and adding a sili
    Type: Application
    Filed: December 5, 2003
    Publication date: August 5, 2004
    Inventors: Yukihiko Yamashita, Kenji Kanemaru, Koichi Saito
  • Patent number: 6767967
    Abstract: A pseudo cross-link type resin composition made of one of resins or a mixture of the resins; wherein the resin is obtained by mixing a polymer molecule that has an atomic group capable of forming an intermolecular hydrogen bond at least in a molecular side chain or at a molecular tail end of the polymer molecule, and a polymer molecule that has an atomic group capable of forming an intermolecular hydrogen bond at lest in a molecular side chain or in a molecular skeleton of the polymer molecule; wherein the polymer molecule having an atomic group capable of forming an intermolecular hydrogen bond at least in a molecular side chain or at a molecular tail end is a vinylic polymer or a copolymer thereof that has a carboxyl group or a hydroxyl group at least in a molecular side chain or at a molecular tail end, and the polymer molecule that has an atomic group capable of forming an intermolecular hydrogen bond at least in a molecular side chain or in a molecular skeleton is a vinylic polymer or a copolymer there
    Type: Grant
    Filed: June 17, 2002
    Date of Patent: July 27, 2004
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Tetsuro Yamanaka, Yukihiko Yamashita, Kenji Kanemaru
  • Publication number: 20030232923
    Abstract: A pseudo cross-link type resin composition made of one of resins or a mixture of the resins;
    Type: Application
    Filed: June 17, 2002
    Publication date: December 18, 2003
    Inventors: Tetsuro Yamanaka, Yukihiko Yamashita, Kenji Kanemaru
  • Patent number: 5238730
    Abstract: A thermosetting resin composition comprising (A) a dibasic acid modified epoxy (meth)acrylate resin obtained by reacting a bromine-containing epoxy resin with a dibasic acid of 4 or more carbon atoms followed by further reacting with acrylic acid or methacrylic acid, (B) a thermosetting resin having an unsaturated group, the unsaturated group being copolymerizable with the resin (A), and (C) a polymerizable monomer; and an electrical laminate produced by using the thermosetting resin composition are disclosed.
    Type: Grant
    Filed: June 19, 1991
    Date of Patent: August 24, 1993
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Akinori Hanawa, Mitsuo Yokota, Akira Shimizu, Kazuyuki Tanaka, Yukihiko Yamashita