Patents by Inventor Yukihiko Yamashita
Yukihiko Yamashita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220186089Abstract: Disclosed is the copolymer having a (meth)acrylic monomer unit A having an anionic group, a (meth)acrylic monomer unit B having a cationic group, and a (meth)acrylic monomer unit C other than the (meth)acrylic monomer unit A and the (meth)acrylic monomer unit B.Type: ApplicationFiled: April 7, 2020Publication date: June 16, 2022Applicant: Denka Company LimitedInventors: Ippei TAKASAKI, Kazuyuki IGARASHI, Tomoyuki KANAI, Yukihiko YAMASHITA
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Patent number: 11072730Abstract: A composition having excellent adhesiveness to poorly adhesive materials such as polyolefins is provided. The solution is a composition comprising the following (1) to (2): (1) (meth)acrylates containing the following (1-1) to (1-3): (1-1) a (meth)acrylate having a hydroxyl group, (1-2) an alkyl (meth)acrylate, and (1-3) a (meth)acrylate having a cyclic ether skeleton, and (2) an organoboron compound. The content ratio of (1-1), (1-2), and (1-3) is (1-1):(1-2):(1-3)=(10 to 90):(5 to 80):(5 to 80) in mass ratio in 100 parts by mass of (1) (meth)acrylates.Type: GrantFiled: December 15, 2017Date of Patent: July 27, 2021Assignee: DENKA COMPANY LIMITEDInventors: Takako Hoshino, Masaya Umeyama, Yukihiko Yamashita
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Patent number: 11008486Abstract: A composition having excellent adhesiveness to poorly adhesive materials such as polyolefins is provided. The solution is a composition comprising the following (1) to (2): (1) (meth)acrylates containing the following (1-1) to (1-3): (1-1) a (meth)acrylate having a hydroxyl group, (1-2) an alkyl (meth)acrylate, and (1-3) a (meth)acrylate having a cyclic ether skeleton, and (2) an organoboron compound. The content ratio of (1-1), (1-2), and (1-3) is (1-1):(1-2):(1-3)=(10 to 90):(5 to 80):(5 to 80) in mass ratio in 100 parts by mass of (1) (meth)acrylates.Type: GrantFiled: December 15, 2017Date of Patent: May 18, 2021Assignee: DENKA COMPANY LIMITEDInventors: Takako Hoshino, Masaya Umeyama, Yukihiko Yamashita
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Publication number: 20200102483Abstract: A composition having excellent adhesiveness to poorly adhesive materials such as polyolefins is provided. The solution is a composition comprising the following (1) to (2): (1) (meth)acrylates containing the following (1-1) to (1-3): (1-1) a (meth)acrylate having a hydroxyl group, (1-2) an alkyl (meth)acrylate, and (1-3) a (meth)acrylate having a cyclic ether skeleton, and (2) an organoboron compound. The content ratio of (1-1), (1-2), and (1-3) is (1-1):(1-2):(1-3)=(10 to 90):(5 to 80):(5 to 80) in mass ratio in 100 parts by mass of (1) (meth)acrylates.Type: ApplicationFiled: December 15, 2017Publication date: April 2, 2020Applicant: DENKA COMPANY LIMITEDInventors: Takako HOSHINO, Masaya UMEYAMA, Yukihiko YAMASHITA
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Patent number: 9656353Abstract: The present invention relates to a reflow film containing a thermoplastic resin which is dissolvable in a solvent, and solder particles, wherein the solder particles are dispersed in the film, and also relates to a solder bump formation method which comprises: (A) a step of mounting the reflow film on the electrode surface side of a substrate, (B) a step of mounting and fixing a flat plate, (C) a step of heating, and (D) a step of dissolving and removing the reflow film, and herewith, a reflow film is provided which, by causing localization of the solder component on the electrodes of the substrate by self-assembly, exhibits excellent storage properties, transportability and handling properties during use, and can form solder bumps or solder joints selectively on only the electrodes.Type: GrantFiled: October 26, 2012Date of Patent: May 23, 2017Assignee: HITACHI CHEMICAL COMPANY, LTD.Inventors: Kazuhiro Miyauchi, Naoya Suzuki, Nozomu Takano, Yukihiko Yamashita
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Publication number: 20140252607Abstract: The present invention relates to a reflow film containing a thermoplastic resin which is dissolvable in a solvent, and solder particles, wherein the solder particles are dispersed in the film, and also relates to a solder bump formation method which comprises: (A) a step of mounting the reflow film on the electrode surface side of a substrate, (B) a step of mounting and fixing a flat plate, (C) a step of heating, and (D) a step of dissolving and removing the reflow film, and herewith, a reflow film is provided which, by causing localization of the solder component on the electrodes of the substrate by self-assembly, exhibits excellent storage properties, transportability and handling properties during use, and can form solder bumps or solder joints selectively on only the electrodes.Type: ApplicationFiled: October 26, 2012Publication date: September 11, 2014Applicant: Hitachi Chemical Company, Ltd.Inventors: Kazuhiro Miyauchi, Naoya Suzuki, Nozomu Takano, Yukihiko Yamashita
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Publication number: 20140248504Abstract: The present invention provides a resin composition, including: a filler that includes alumina particles and boron nitride particles; an elastomer having a weight-average molecular weight of from 10,000 to 100,000; and a curable resin. The present invention also provides a resin sheet, a cured resin sheet, a resin-adhered metal foil and a heat dissipation device, which are formed by using the resin composition.Type: ApplicationFiled: February 17, 2012Publication date: September 4, 2014Inventors: Shihui Song, Yukihiko Yamashita, Yoshitaka Takezawa, Hideyuki Katagi
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Patent number: 8461699Abstract: The positive tone photosensitive composition of the invention comprises an alkali-soluble resin having a phenolic hydroxyl group, a compound producing an acid by light, a thermal crosslinking agent and an acrylic resin. It is possible to provide a positive tone photosensitive composition that can be developed with an aqueous alkali solution, has sufficiently high sensitivity and resolution, and can form a resist pattern with excellent adhesiveness and thermal shock resistance.Type: GrantFiled: December 16, 2009Date of Patent: June 11, 2013Assignee: Hitachi Chemical Company, Ltd.Inventors: Hiroshi Matsutani, Takumi Ueno, Alexandre Nicolas, Yukihiko Yamashita, Ken Nanaumi, Akitoshi Tanimoto
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Publication number: 20110254178Abstract: The positive tone photosensitive composition of the invention comprises an alkali-soluble resin having a phenolic hydroxyl group, a compound producing an acid by light, a thermal crosslinking agent and an acrylic resin. It is possible to provide a positive tone photosensitive composition that can be developed with an aqueous alkali solution, has sufficiently high sensitivity and resolution, and can form a resist pattern with excellent adhesiveness and thermal shock resistance.Type: ApplicationFiled: December 16, 2009Publication date: October 20, 2011Inventors: Hiroshi Matsutani, Takumi Ueno, Alexandre Nicolas, Yukihiko Yamashita, Ken Nanaumi, Akitoshi Tanimoto
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Patent number: 7295376Abstract: A pseudo cross-link type resin composition made of one of resins or a mixture of the resins; wherein the resin is obtained by mixing a polymer molecule that has an atomic group capable of forming an intermolecular hydrogen bond at least in a molecular side chain or at a molecular tail end of the polymer molecule, and a polymer molecule that has an atomic group capable of forming an intermolecular hydrogen bond at lest in a molecular side chain or in a molecular skeleton of the polymer molecule; wherein the polymer molecule having an atomic group capable of forming an intermolecular hydrogen bond at least in a molecular side chain or at a molecular tail end is a vinylic polymer or a copolymer thereof that has a carboxyl group or a hydroxyl group at least in a molecular side chain or at a molecular tail end, and the polymer molecule that has an atomic group capable of forming an intermolecular hydrogen bond at least in a molecular side chain or in a molecular skeleton is a vinylic polymer or a copolymer thereofType: GrantFiled: January 22, 2004Date of Patent: November 13, 2007Assignee: Hitachi Chemical Company, Ltd.Inventors: Tetsuro Yamanaka, Yukihiko Yamashita, Kenji Kanemaru
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Publication number: 20060104188Abstract: A film for optical parts exhibiting high transmittance of short-wavelength light on the order of 400 nm, low birefringence, and excellent flexibility in which warping can be prevented after use for a long term, and a coiled film laminate using the film for optical parts, and an optical parts and an optical discs. The film for optical parts is characterized by comprising a light transmitting layer principally comprising thermosetting resin where an integrated value of the ratio of loss modulus to storage modulus in a temperature range of 30° C. to 80° C. as determined by a dynamic viscoelasticity measurement under a tensile stress mode at a frequency of 10 Hz with a heating rate of 3° C./min is 2 or more.Type: ApplicationFiled: December 5, 2002Publication date: May 18, 2006Inventors: Yukihiko Yamashita, Tetsuo Yamanaka, Kenji Kanemaru, Koichi Saito
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Publication number: 20050283588Abstract: The invention relates to an instruction control apparatus, a function unit, a program conversion apparatus, and a language processing apparatus. An object of the invention is to alter and add functions to the above apparatuses inexpensively and freely. To this end, in an instruction control apparatus according to the invention creates a sequence of summation values of numbers of input operands and a sequence of summation values of the numbers of output operands, and correlates, with input operands and output operands without overlap, input registers and output registers that are lower in rank than corresponding summation values included in the sequences of summation values. Physical registers are assigned to each set of input registers and output registers.Type: ApplicationFiled: January 28, 2005Publication date: December 22, 2005Inventor: Yukihiko Yamashita
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Patent number: 6903160Abstract: The invention provides a pseudo cross-link resin composition comprises at least tow polymer molecules; wherein the resin is obtained by mixing a vinylic polymer molecule A that has an atomic group capable of forming an intermolecular hydrogen bond in a molecular side chain and/or at a molecular tail end of the polymer molecule, and a vinylic polymer molecule B that has an atomic group capable of forming an intermolecular hydrogen bond in a molecular side chain and/or in a molecular skeleton of the polymer molecule; wherein the vinylic polymer molecule A is a polymer and/or copolymer that has a carboxyl group or a hydroxyl group in a molecular side chain and/or at a molecular tail end, and the vinylic polymer molecule B is a polymer and/or copolymer having at least one or more nitrogen atom in a molecular side chain and/or a molecular skeleton; wherein the vinylic polymer molecule A and the vinylic polymer molecule B are mixed together, the intermolecular hydrogen bond is formed therebetween, and adding a siliType: GrantFiled: June 5, 2002Date of Patent: June 7, 2005Assignee: Hitachi Chemical Co., Ltd.Inventors: Yukihiko Yamashita, Kenji Kanemaru, Koichi Saito
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Patent number: 6900273Abstract: Low-hygroscopicity low-birefringence resin compositions. One of the compositions is a resin composition (a) comprising the following polymers (A), and (B) and/or (C). Another is a resin composition (b) comprising the following polymers (A), (B) and (H). Still another is a polymer comprising the following polymers (I) and (J), diphenylsilicone (D), and a phenolic antioxidant (E). (A) A polymer comprising one or more kinds of indene and indene derivatives represented by the following general formula (I). (B) A polymer comprising polystyrene or a polystyrene derivative. (C) A polymer comprising a monomer copolymerizable with styrene or a styrene derivative. (H) A graft polymer having a structure wherein a polymer comprising at least one kind of indene and an indene derivative represented by the general formula (I) bonds to a side chain of a polymer comprising a monomer copolymerizable with styrene or a styrene derivative.Type: GrantFiled: June 27, 2000Date of Patent: May 31, 2005Assignee: Hitachi Chemical Co., Ltd.Inventors: Yukihiko Yamashita, Shuichi Iwata, Tetsuo Yamanaka, Akihiro Yoshida, Keiko Ushikubo
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Publication number: 20050038194Abstract: A pseudo cross-link type resin composition made of one of resins or a mixture of the resins; wherein the resin is obtained by mixing a polymer molecule that has an atomic group capable of forming an intermolecular hydrogen bond at least in a molecular side chain or at a molecular tail end of the polymer molecule, and a polymer molecule that has an atomic group capable of forming an intermolecular hydrogen bond at lest in a molecular side chain or in a molecular skeleton of the polymer molecule; wherein the polymer molecule having an atomic group capable of forming an intermolecular hydrogen bond at least in a molecular side chain or at a molecular tail end is a vinylic polymer or a copolymer thereof that has a carboxyl group or a hydroxyl group at least in a molecular side chain or at a molecular tail end, and the polymer molecule that has an atomic group capable of forming an intermolecular hydrogen bond at least in a molecular side chain or in a molecular skeleton is a vinylic polymer or a copolymer thereofType: ApplicationFiled: January 22, 2004Publication date: February 17, 2005Inventors: Tetsuro Yamanaka, Yukihiko Yamashita, Kenji Kanemaru
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Publication number: 20040220342Abstract: Low-hygroscopicity low-birefringence resin compositions. One of the compositions is a resin composition (a) comprising the following polymers (A), and (B) and/or (C). Another is a resin composition (b) comprising the following polymers (A), (B) and (H). Still another is a polymer comprising the following polymers (I) and (J), diphenylsilicone (D), and a phenolic antioxidant (E). (A) A polymer comprising one or more kinds of indene and indene derivatives represented by the following general formula (I). (B) A polymer comprising polystyrene or a polystyrene derivative. (C) A polymer comprising a monomer copolymerizable with styrene or a styrene derivative. (H) A graft polymer having a structure wherein a polymer comprising at least one kind of indene and an indene derivative represented by the general formula (I) bonds to a side chain of a polymer comprising a monomer copolymerizable with styrene or a styrene derivative.Type: ApplicationFiled: May 17, 2004Publication date: November 4, 2004Inventors: Yukihiko Yamashita, Shuichi Iwata, Tetsuo Yamanaka, Akihiro Yoshida, Keiko Ushikubo
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Publication number: 20040152839Abstract: The invention provides a pseudo cross-link resin composition comprises at least tow polymer molecules; wherein the resin is obtained by mixing a vinylic polymer molecule A that has an atomic group capable of forming an intermolecular hydrogen bond in a molecular side chain and/or at a molecular tail end of the polymer molecule, and a vinylic polymer molecule B that has an atomic group capable of forming an intermolecular hydrogen bond in a molecular side chain and/or in a molecular skeleton of the polymer molecule; wherein the vinylic polymer molecule A is a polymer and/or copolymer that has a carboxyl group or a hydroxyl group in a molecular side chain and/or at a molecular tail end, and the vinylic polymer molecule B is a polymer and/or copolymer having at least one or more nitrogen atom in a molecular side chain and/or a molecular skeleton; wherein the vinylic polymer molecule A and the vinylic polymer molecule B are mixed together, the intermolecular hydrogen bond is formed therebetween, and adding a siliType: ApplicationFiled: December 5, 2003Publication date: August 5, 2004Inventors: Yukihiko Yamashita, Kenji Kanemaru, Koichi Saito
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Patent number: 6767967Abstract: A pseudo cross-link type resin composition made of one of resins or a mixture of the resins; wherein the resin is obtained by mixing a polymer molecule that has an atomic group capable of forming an intermolecular hydrogen bond at least in a molecular side chain or at a molecular tail end of the polymer molecule, and a polymer molecule that has an atomic group capable of forming an intermolecular hydrogen bond at lest in a molecular side chain or in a molecular skeleton of the polymer molecule; wherein the polymer molecule having an atomic group capable of forming an intermolecular hydrogen bond at least in a molecular side chain or at a molecular tail end is a vinylic polymer or a copolymer thereof that has a carboxyl group or a hydroxyl group at least in a molecular side chain or at a molecular tail end, and the polymer molecule that has an atomic group capable of forming an intermolecular hydrogen bond at least in a molecular side chain or in a molecular skeleton is a vinylic polymer or a copolymer thereType: GrantFiled: June 17, 2002Date of Patent: July 27, 2004Assignee: Hitachi Chemical Co., Ltd.Inventors: Tetsuro Yamanaka, Yukihiko Yamashita, Kenji Kanemaru
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Publication number: 20030232923Abstract: A pseudo cross-link type resin composition made of one of resins or a mixture of the resins;Type: ApplicationFiled: June 17, 2002Publication date: December 18, 2003Inventors: Tetsuro Yamanaka, Yukihiko Yamashita, Kenji Kanemaru
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Patent number: 5238730Abstract: A thermosetting resin composition comprising (A) a dibasic acid modified epoxy (meth)acrylate resin obtained by reacting a bromine-containing epoxy resin with a dibasic acid of 4 or more carbon atoms followed by further reacting with acrylic acid or methacrylic acid, (B) a thermosetting resin having an unsaturated group, the unsaturated group being copolymerizable with the resin (A), and (C) a polymerizable monomer; and an electrical laminate produced by using the thermosetting resin composition are disclosed.Type: GrantFiled: June 19, 1991Date of Patent: August 24, 1993Assignee: Hitachi Chemical Company, Ltd.Inventors: Akinori Hanawa, Mitsuo Yokota, Akira Shimizu, Kazuyuki Tanaka, Yukihiko Yamashita