Patents by Inventor Yukihiro Miyazawa

Yukihiro Miyazawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200348557
    Abstract: An optical film for a display device includes: a base layer; a pattern layer disposed on the base layer and having a repeating pattern of valleys and peaks; a plurality of first elongated scattering members disposed on upper surfaces of the valleys; and a cover layer having a shape that is complementary to and coupled with the repeating pattern of valleys and peaks, with the elongated scattering members being disposed between the pattern layer and the cover layer.
    Type: Application
    Filed: April 1, 2020
    Publication date: November 5, 2020
    Inventors: Dae Won KIM, Yukihiro MIYAZAWA, Seung Hee LEE, Kyung Hwan JEON
  • Patent number: 10752719
    Abstract: A composition for a soft mold according to an embodiment of the inventive concept may manufacture a soft mold having good durability and release properties by including at least one multifunctional acrylate monomer, at least one photoinitiator, and a siloxane compound, and may improve productivity in the manufacture of an optical member by using the soft mold.
    Type: Grant
    Filed: November 6, 2017
    Date of Patent: August 25, 2020
    Assignee: Samsung Display Co., Ltd.
    Inventors: Minhyuck Kang, Yukihiro Miyazawa, Myeonghee Kim, Jungwoo Park, Atsushi Takakuwa, Gugrae Jo, Kangsoo Han
  • Publication number: 20190232531
    Abstract: A mold for a wire grid polarizer includes a hard mold and a soft mold, in which the hard mold includes a main body, an oxidization layer provided on the main body, and a SAM layer provided on the oxidization layer and including an additive, the soft mold includes a substrate, and a protrusions and depressions portion including a polymerized releasing agent, and a region that is hydrophobic in the polymerized releasing agent is arranged on a surface of the protrusions and depressions portion.
    Type: Application
    Filed: September 12, 2018
    Publication date: August 1, 2019
    Inventors: MIN HYUCK KANG, Yukihiro Miyazawa, Myeong Hee Kim, Jung Woo Park, Han Su Kim, Dong Eon Lee, Gug Rae Jo, Seung-Yeon Chae, Atsushi Takakuwa
  • Publication number: 20190144589
    Abstract: A photo-curable resin composition is provided that is capable of forming a resin layer having solvent resistance and capable of easily forming a releasing layer on the resin layer. According to the present invention, a photo-curable resin composition comprising a silicone oligomer having an alkoxy group bonded to a silicon atom and a (meth)acrylate compound is provided.
    Type: Application
    Filed: May 15, 2017
    Publication date: May 16, 2019
    Applicant: SOKEN CHEMICAL & ENGINEERING CO., LTD.
    Inventors: Yukihiro MIYAZAWA, Ai TAKEDA
  • Patent number: 10203597
    Abstract: A method of manufacturing a structure for suppressing in-mask curing corrosion while minimizing influence on shape stability of a fine pattern to be transferred to a resin layer. A method of manufacturing a structure is provided including: lamination forming, forming a lamination including, on a transparent substrate, a resin layer of an imprinting photo curable resin composition containing a photopolymerizable monomer and 0.1 parts or more respectively of a photo initiator and a polymerization inhibitor based on 100 parts of the monomer; covering, pressing a fine pattern of a mold on the resin layer and covering the lamination with a shading mask to cause a part of a region where the mold is pressed on to be exposed; curing the resin layer in the exposed region by radiating curing light to the resin layer; and repeating steps by moving the mold to an uncured area.
    Type: Grant
    Filed: November 11, 2014
    Date of Patent: February 12, 2019
    Assignee: SOKEN CHEMICAL & ENGINEERING Co., Ltd.
    Inventor: Yukihiro Miyazawa
  • Publication number: 20180364573
    Abstract: An imprinting photo curable resin composition is provided that is excellent in both transferability in imprinting and solvent resistance of the pattern transferred to a structure. According to the present invention, an imprinting photo curable resin composition is provided that at least includes a photopolymerizable (meth)acrylic monomer (A) and a photo initiator (B), wherein the (meth)acrylic monomer (A) is composed at ratios of: (a-1) from 60 to 97 mass % of a trifunctional (meth)acrylate compound; (a-2) from 3 to 40 mass % of a tetrafunctional or higher functional (meth)acrylate compound; and (a-3) from 0 to 37 mass % of a bifunctional or lower functional (meth)acrylate compound (where a sum from (a-1) to (a-3) is 100 mass %).
    Type: Application
    Filed: August 17, 2018
    Publication date: December 20, 2018
    Applicant: SOKEN CHEMICAL & ENGINEERING Co., Ltd.
    Inventor: Yukihiro MIYAZAWA
  • Publication number: 20180298134
    Abstract: A composition for a soft mold according to an embodiment of the inventive concept may manufacture a soft mold having good durability and release properties by including at least one multifunctional acrylate monomer, at least one photoinitiator, and a siloxane compound, and may improve productivity in the manufacture of an optical member by using the soft mold.
    Type: Application
    Filed: November 6, 2017
    Publication date: October 18, 2018
    Inventors: Minhyuck KANG, Yukihiro MIYAZAWA, Myeonghee KIM, Jungwoo PARK, Atsushi TAKAKUWA, Gugrae JO, Kangsoo HAN
  • Patent number: 10052798
    Abstract: An imprint method including the steps of: an exposing step to irradiate a photo curing resin, coated on a large-area substrate, with a curing light while the light-transmitting imprint mold is pressed against the photo curing resin, an amount of the curing light applied onto the photo curing resin in a light shielding region provided with the light shielding member made less than an amount of the curing light applied onto the photo curing resin in a light transmitting region of the mold so that a portion of the photo curing resin in the light shielding region is semi-cured by the use of the light shielding member provided so as to reproduce the concave-convex pattern of the transparent substrate.
    Type: Grant
    Filed: January 21, 2014
    Date of Patent: August 21, 2018
    Assignee: SOKEN CHEMICAL & ENGINEERING CO., LTD.
    Inventor: Yukihiro Miyazawa
  • Publication number: 20170205708
    Abstract: A step-and-repeat imprinting apparatus that is capable of restraining failures and mold breakage during imprinting. A step-and-repeat imprinting apparatus is provided that includes: a stage to place a stage base; a positioning mechanism configured to be relatively movable to the stage and to keep a flexible base to face the stage base; and a pressurizing mechanism to press, while deflecting the flexible base, the flexible base toward the stage base, wherein one of the stage base and the flexible base has a convex and concave pattern, and another of the stage base and the flexible base includes a transferred resin layer to have the convex and concave pattern transferred thereto, and the apparatus is so configured that the pressurizing mechanism presses, while deflecting, the flexible base toward the stage base, thereby transferring the convex and concave pattern to the transferred resin layer.
    Type: Application
    Filed: July 16, 2015
    Publication date: July 20, 2017
    Applicant: SOKEN CHEMICAL & ENGINEERING Co., Ltd.
    Inventor: Yukihiro MIYAZAWA
  • Publication number: 20170203330
    Abstract: A method of manufacturing a microstructure. While pressing a first pattern of a first mold against a first transferred resin layer obtained by applying a first photocurable resin composition on a transparent base having a light shielding pattern, a first cured resin layer with the first pattern transferred thereto is formed by irradiating the first transferred resin layer with an activation energy line through the first mold; While pressing a second pattern of a second mold against a second transferred resin layer obtained by applying a second photocurable resin composition on the first cured resin layer, a second cured resin layer is formed having a level difference shape including a lower level area and a higher level area by irradiating the second transferred resin layer with an activation energy line using the light shielding pattern as a mask to cure the second transferred resin layer in a partial region.
    Type: Application
    Filed: July 24, 2015
    Publication date: July 20, 2017
    Applicant: SOKEN CHEMICAL & ENGINEERING Co., Ltd.
    Inventor: Yukihiro MIYAZAWA
  • Publication number: 20170157836
    Abstract: A step-and-repeat imprinting mold is provided that is capable of restraining deformation of an end of a convex and concave pattern formed in a cured resin layer when the mold is removed. According to embodiments of the present invention, a step-and-repeat imprinting mold includes: a transparent base; a transparent resin layer formed thereon and having a pattern region formed with a convex and concave pattern; and a light shielding member provided between the transparent base and the transparent resin layer so as to overlap the pattern region in part of the pattern region.
    Type: Application
    Filed: July 7, 2015
    Publication date: June 8, 2017
    Applicant: SOKEN CHEMICAL & ENGINEERING Co., Ltd.
    Inventor: Yukihiro MIYAZAWA
  • Publication number: 20160299425
    Abstract: A method of manufacturing a structure for suppressing in-mask curing corrosion while minimizing influence on shape stability of a fine pattern to be transferred to a resin layer. A method of manufacturing a structure is provided including: lamination forming, forming a lamination including, on a transparent substrate, a resin layer of an imprinting photo curable resin composition containing a photopolymerizable monomer and 0.1 parts or more respectively of a photo initiator and a polymerization inhibitor based on 100 parts of the monomer; covering, pressing a fine pattern of a mold on the resin layer and covering the lamination with a shading mask to cause a part of a region where the mold is pressed on to be exposed; curing the resin layer in the exposed region by radiating curing light to the resin layer; and repeating steps by moving the mold to an uncured area.
    Type: Application
    Filed: November 11, 2014
    Publication date: October 13, 2016
    Applicant: SOKEN CHEMICAL & ENGINEERING Co., Ltd.
    Inventor: Yukihiro MIYAZAWA
  • Publication number: 20160291463
    Abstract: An imprinting photo curable resin composition is provided that is excellent in both transferability in imprinting and solvent resistance of the pattern transferred to a structure. According to the present invention, an imprinting photo curable resin composition is provided that at least includes a photopolymerizable (meth)acrylic monomer (A) and a photo initiator (B), wherein the (meth)acrylic monomer (A) is composed at ratios of: (a-1) from 60 to 97 mass % of a trifunctional (meth)acrylate compound; (a-2) from 3 to 40 mass % of a tetrafunctional or higher functional (meth)acrylate compound; and (a-3) from 0 to 37 mass % of a bifunctional or lower functional (meth)acrylate compound (where a sum from (a-1) to (a-3) is 100 mass %).
    Type: Application
    Filed: November 11, 2014
    Publication date: October 6, 2016
    Applicant: SOKEN CHEMICAL & ENGINEERING Co., Ltd.
    Inventor: Yukihiro MIYAZAWA
  • Publication number: 20150306792
    Abstract: An imprint method including the steps of: an exposing step to irradiate a photo curing resin, coated on a large-area substrate, with a curing light while the light-transmitting imprint mold is pressed against the photo curing resin, an amount of the curing light applied onto the photo curing resin in a light shielding region provided with the light shielding member made less than an amount of the curing light applied onto the photo curing resin in a light transmitting region of the mold so that a portion of the photo curing resin in the light shielding region is semi-cured by the use of the light shielding member provided so as to reproduce the concave-convex pattern of the transparent substrate.
    Type: Application
    Filed: January 21, 2014
    Publication date: October 29, 2015
    Applicant: SOKEN CHEMICAL & ENGINEERING CO., LTD.
    Inventor: Yukihiro MIYAZAWA
  • Publication number: 20150147533
    Abstract: Provided is a photocurable resin composition in which curing shrinkage in photo-imprinting is suppressed, and capable of producing by photo-imprinting a structure which has high surface hardness and in which the occurrence of yellowing is suppressed even when irradiated with e.g., ultraviolet ray. The photocurable resin composition includes a (meth)acrylic monomer (A) and a photoinitiator (B), wherein the photoinitiator (B) has a combination of an alkylphenone-based photoinitiator (B1) and an acylphosphine oxide-based photoinitiator (B2), wherein a blending weight ratio (B1:B2) of the alkylphenone-based photoinitiator (B1) to the acylphosphine oxide-based photoinitiator (B2) is in the range of 1:99 to 90:10.
    Type: Application
    Filed: May 15, 2013
    Publication date: May 28, 2015
    Applicant: Soken Chemical & Engineering Co., Ltd.
    Inventors: Hiroko Yamada, Yasuo Suto, Yukihiro Miyazawa
  • Publication number: 20140093692
    Abstract: Provided is a resin mold which is free from separation from another resin mold at the joined portions and does not impair appearance or function. Thus provided is a resin mold which is preferable for forming a large-area mold, a production process therefor, and uses thereof. The resin mold has a mold constituent to constitute one half of the resin mold having a fine depression-protrusion pattern formed on the surface by transferring, a mold constituent to constitute the other half thereof, and a connecting section between the mold constituent to constitute one half of the resin mold and the mold constituent to constitute the other half thereof, wherein the connecting section comprises an inclined plane, a production process for this resin mold, and uses of the resin mold.
    Type: Application
    Filed: August 30, 2013
    Publication date: April 3, 2014
    Applicant: Soken Chemical & Engineering Co., Ltd.
    Inventors: Yukihiro Miyazawa, Takahide Mizawa