Abstract: A wafer support device includes a susceptor having a wafer mounting surface provided on one surface and a lift pin through hole arranged in the wafer mounting surface, a lift pin inserted into the lift pin through hole, and an elevating device that raises and lowers the susceptor, the wafer mounting surface of the susceptor is uneven, a ventilation path is formed between the lift pin through hole and the lift pin.

Abstract: A substrate processing apparatus includes a stage provided in a chamber, a shower head in which a plurality of slits are formed and which is opposed to the stage, a first gas supply part which supplies a first gas to a space between the stage and the shower head via the plurality of slits, and a second gas supply part which supplies a second gas which is not a noble gas to a region below the stage, wherein the second gas is the same gas as one of a plurality of kinds of gases constituting the first gas in a case where the first gas is a mixture gas constituted of the plurality of kinds of gases, and the second gas is the same gas as the first gas in a case where the first gas is a single kind of gas.

Abstract: Described herein are reactor chamber configurations in which susceptors are provided with one or more that or heaters equipped with fan-shaped separational temperature control functions. In some embodiments, the heaters, in conjunction with an active cooling mechanism may be configured to compensate for temperature non-uniformity caused by, for example, adjacent structures including heat sources and heat sinks. In some embodiments, separate temperature control may be achieved by multi-zone independent heating or cooling elements within each susceptor.

Abstract: A semiconductor processing system comprises a first, a second, and a third process module assembly. The third process module assembly is between the first and the second process module assemblies, and includes an opening for providing substrates to be processed in the various process module assemblies. The process modules are arranged laterally relative to the opening. The first and second process module assemblies each include an associated transfer chamber, an associated substrate transfer device, and a plurality of associated process modules attached the associated transfer chamber. The third process module assembly may include an associated transfer chamber, an associated substrate transfer device, and a single associated process module attached to the associated transfer chamber.

Abstract: A sheet cassette configured to store a recording sheet and connectable to a printer includes a battery, a storage, a communication terminal, and an electrode terminal. The storage is configured to store information. The sheet cassette is configured to perform communications between the sheet cassette and the printer through the communication terminal. The sheet cassette is configured to supply the electric power of the battery to the printer through the electrode terminal.

Abstract: A communication system includes an information terminal, and a printing apparatus configured to perform intergroup communication with the information terminal belonging to a group. The printing apparatus includes a printing part configured to perform printing, a data receiver configured to receive print data from the information terminal via the intergroup communication, and a print controller configured to control the printing part using the received print data.

Abstract: In accordance with some embodiments herein, apparatuses for deposition of thin films are provided. In some embodiments, a plurality of stations is provided, in which each station provides a different reactant or combination of reactants. The stations can be in gas isolation from each other so as to minimize or prevent undesired chemical vapor deposition (CVD) and/or atomic layer deposition (ALD) reactions between the different reactants or combinations of reactants.

Abstract: Examples of a substrate processing apparatus include a stage, an outer peripheral ring that surrounds the stage while provided with a gap between a side surface of the stage and the outer peripheral ring, a gas supply unit configured to supply gas from a lower side of the gap to an upper side of the gap, and an upper electrode provided above the stage.

Abstract: In accordance with some embodiments herein, apparatuses for deposition of thin films are provided. In some embodiments, a plurality of stations is provided, in which each station provides a different reactant or combination of reactants. The stations can be in gas isolation from each other so as to minimize or prevent undesired chemical vapor deposition (CVD) and/or atomic layer deposition (ALD) reactions between the different reactants or combinations of reactants.

Abstract: In accordance with some embodiments herein, methods and apparatuses for flowable deposition of thin films are described. Some embodiments herein relate to cyclical processes for gap-fill in which deposition is followed by a thermal anneal and repeated. In some embodiments, the deposition and thermal anneal are carried out in separate station. In some embodiments second module is heated to a higher temperature than the first station. In some embodiments, the thermal anneal comprises RTA.

Abstract: A printer includes a printer body (110) including a recording-paper holder (111) that holds rolled recording paper (100) and includes a holder guide (112) for guiding the recording paper (100), a platen roller (140), a print head (130) attached to the printer body (110), and a lower guide (160) that is disposed to face the holder guide (112) such that a conveying path for guiding the recording paper (100) is formed between the lower guide (160) and the holder guide (112).

Abstract: A vacuum process module has a pre-shaped ceiling and/or bottom that is shaped to bulge outwards. The shape of the ceiling and/or process modules counteracts deformation caused by vacuum pressures and/or high temperatures when processing substrates in the process module. The process module may have a side openable to a transfer chamber and an opposite side opposite the openable side. The bulge may be asymmetric, with the peak of the bulge off-center on the ceiling and closer to the opposite side than to the openable side. A rigid structure may be mounted on the ceiling to adjust the magnitude of the bulge in the ceiling. The beam may be, e.g., a rigid beam having an adjustable lift mechanism for lifting up an attached part of the ceiling. The process module may accommodate a plurality of substrates for processing, with each substrate occupying a dedicated stage in the process module.

Abstract: An apparatus for processing a substrate may comprise a reaction chamber, a substrate support disposed within the reaction chamber and provided with a support surface to support the substrate, and a motor to provide a rotary movement, wherein the motor is controlled and configured to create a bidirectional rotary movement between the reaction chamber and the substrate support around an axis perpendicular to the support surface.

Abstract: A semiconductor processing system comprises a first, a second, and a third process module assembly. The third process module assembly is between the first and the second process module assemblies, and includes an opening for providing substrates to be processed in the various process module assemblies. The process modules are arranged laterally relative to the opening. The first and second process module assemblies each include an associated transfer chamber, an associated substrate transfer device, and a plurality of associated process modules attached the associated transfer chamber. The third process module assembly may include an associated transfer chamber, an associated substrate transfer device, and a single associated process module attached to the associated transfer chamber.

Abstract: A communication system includes an information terminal, and a printing apparatus configured to perform intergroup communication with the information terminal belonging to a group. The printing apparatus includes a printing part configured to perform printing, a data receiver configured to receive print data from the information terminal via the intergroup communication, and a print controller configured to control the printing part using the received print data.

Abstract: Examples of a system dedicated for parts cleaning includes a gas supply apparatus configured to supply a cleaning gas, a first adapter connected to a gas supply port of the gas supply apparatus, an exhaust system configured to exhaust the gas supplied from the gas supply apparatus, and a second adapter connected to a gas inlet of the exhaust system.

Abstract: A gas distribution assembly and methods for adjusting the gas flow through a gas supply unit into a reaction chamber are disclosed. The gas distribution assembly and methods can be used to increase or decrease gas flow uniformly through the gas supply unit. The gas distribution assembly and methods can also be used to increase gas flow into one area of the reaction chamber, while decreasing gas flow into another area.

Abstract: A reactor system may comprise a plurality of reaction chambers; a plurality of transfer chambers; and/or at least two gate valves coupled to each reaction chamber of the plurality of reaction chambers. A first gate valve of the at least two gate valves may fluidly couple a first respective reaction chamber of the plurality of reaction chambers to a first transfer chamber of the plurality of transfer chambers, and a second gate valve of the at least two gate valves may fluidly couple the first respective reaction chamber to a second transfer chamber of the plurality of transfer chambers. In various embodiments, each of the plurality of transfer chambers may comprise a transfer tool, wherein each transfer tool may be configured to transfer a substrate into and/or out of multiple reaction chambers.

Abstract: A communication system includes an information terminal, and a printing apparatus configured to perform intergroup communication with the information terminal belonging to a group. The printing apparatus includes a printing part configured to perform printing, a data receiver configured to receive print data from the information terminal via the intergroup communication, and a print controller configured to control the printing part using the received print data.

Abstract: A printing apparatus includes a printer function part configured to print on a recording sheet, a power supply including a rechargeable battery, a charger configured to charge the rechargeable battery, and an input part configured to input information. The printer function part, the input part, the power supply, and the charger are arranged from a first end of the printing apparatus towards a second end opposite to the first end, in an order of the printer function part, the input part, the power supply, and the charger.