Patents by Inventor Yukihiro Oka

Yukihiro Oka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Surface treatment method, etching method, and method for manufacturing electronic device
    Patent number: 8021565
    Abstract: A surface treatment method includes: removing a fluorocarbon-containing reaction product from a surface of a workpiece by oxygen gas plasma processing. The workpiece includes a plurality of layers. The fluorocarbon-containing reaction product is deposited by successively etching the layers of the workpiece. The method further includes after removing the reaction product, removing an oxide-containing reaction product from the surface of the workpiece using hydrogen fluoride gas.
    Type: Grant
    Filed: March 24, 2008
    Date of Patent: September 20, 2011
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Katsuaki Aoki, Naoya Hayamizu, Kei Hattori, Yukihiro Oka, Hidemi Kanetaka, Makoto Hasegawa
  • SURFACE TREATMENT METHOD, ETCHING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
    Publication number: 20090000640
    Abstract: A surface treatment method includes: removing a fluorocarbon-containing reaction product from a surface of a workpiece by oxygen gas plasma processing. The workpiece includes a plurality of layers. The fluorocarbon-containing reaction product is deposited by successively etching the layers of the workpiece. The method further includes after removing the reaction product, removing an oxide-containing reaction product from the surface of the workpiece using hydrogen fluoride gas.
    Type: Application
    Filed: March 24, 2008
    Publication date: January 1, 2009
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Katsuaki Aoki, Naoya Hayamizu, Kei Hattori, Yukihiro Oka, Hidemi Kanetaka, Makoto Hasegawa