Patents by Inventor Yukiko Muramatsu

Yukiko Muramatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10564543
    Abstract: A photosensitive resin composition includes (A) a binder polymer having a structural unit derived from a hydroxyalkyl (meth)acrylate ester having a hydroxyalkyl group having from 1 to 12 carbon atoms, and a structural unit derived from a (meth)acrylic acid; (B) a photopolymerizable compound having an ethylenically unsaturated bond group; (C) a photopolymerization initiator; and (D) a styryl pyridine represented by the Formula (1). In Formula (1), each of R1, R2 and R3 independently represents an alkyl group having from 1 to 20 carbon atoms, an alkoxy group having from 1 to 6 carbon atoms, an alkyl ester group having from 1 to 6 carbon atoms, an amino group, an alkyl amino group having from 1 to 20 carbon atoms, a carboxy group, a ciano group, a nitro group, an acetyl group or a (meth)acryloyl group, each of a, b and c independently represents an integer of from 0 to 5. In a case in which each of a, b and c is independently 2 or more, the plural R1s, R2s, and R3s independently may be the same or different.
    Type: Grant
    Filed: September 14, 2015
    Date of Patent: February 18, 2020
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Shota Okade, Yukiko Muramatsu, Emiko Oota, Ken Sawabe, Sanchoru Ri
  • Publication number: 20190255737
    Abstract: A formed body having a multilayered structure including inner and outer layers of a first ethylene terephthalate type polyester resin, and an oxygen-absorbing intermediate layer containing a non-polymer type organic oxygen absorber. The oxygen-absorbing intermediate layer, further, contains a second ethylene terephthalate type polyester resin that has relatively more copolymerizable units than the first ethylene terephthalate type polyester resin, the non-polymer type organic oxygen absorber being contained therein in an amount of not less than 5 parts by mass per 100 parts by mass of the second ethylene terephthalate type polyester resin.
    Type: Application
    Filed: August 23, 2017
    Publication date: August 22, 2019
    Applicant: TOYO SEIKAN GROUP HOLDINGS, LTD.
    Inventors: Yoshiki SAWA, Toshiki YAMADA, Yukiko HIRAYAMA, Kanna MURAMATSU
  • Publication number: 20190218366
    Abstract: A formed body made from a resin and having a wall portion, the wall portion containing, as an oxygen-absorbing component, a non-polymeric oxygen-absorbing organic component in an amount of 0.5 to 2.5% by mass, and having a ratio of oxygen permeation rates expressed by the following formula that is suppressed to be not more than 42%: Ratio of oxygen permeation rates=(P/P0)×100 wherein P is an oxygen permeation rate (cc) through the wall portion, and P0 is an oxygen permeation rate (cc) through the wall portion of the same thickness but without containing the oxygen-absorbing component.
    Type: Application
    Filed: September 28, 2017
    Publication date: July 18, 2019
    Applicant: TOYO SEIKAN GROUP HOLDINGS, LTD.
    Inventors: Yukiko HIRAYAMA, Toshiki YAMADA, Yoshiki SAWA, Kanna MURAMATSU
  • Publication number: 20190161610
    Abstract: An oxygen-absorbing resin composition containing an ethylene terephthalate type polyester resin and an organic oxygen absorber and, further, containing cobalt in an amount of 5 to 50 ppm and titanium in an amount of 1 to 15 ppm calculated as elements.
    Type: Application
    Filed: August 4, 2017
    Publication date: May 30, 2019
    Applicant: TOYO SEIKAN GROUP HOLDINGS, LTD.
    Inventors: Yoshiki SAWA, Toshiki YAMADA, Yukiko HIRAYAMA, Kanna MURAMATSU
  • Patent number: 10104781
    Abstract: A photosensitive resin composition includes a binder polymer, a photopolymerizable compound, and a photopolymerization initiator. The binder polymer has a structural unit derived from a (meth)acrylic acid, a structural unit derived from styrene or ?-methylstyrene, and a structural unit derived from a hydroxyalkyl (meth)acrylate ester having a hydroxyalkyl group having from 1 to 12 carbon atoms. The photopolymerizable compound include a bisphenolic di(meth)acrylate having from 1 to 20 structural units of an ethyleneoxy group and having from 0 to 7 structural units of a propyleneoxy group.
    Type: Grant
    Filed: December 22, 2014
    Date of Patent: October 16, 2018
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Shota Okade, Masahiro Miyasaka, Yukiko Muramatsu
  • Publication number: 20170261851
    Abstract: A photosensitive res in composition includes (A) a binder polymer having a structural unit derived from a hydroxyalkyl (meth)acrylate ester having a hydroxyalkyl group having from 1 to 12 carbon atoms, and a structural unit derived from a (meth)acrylic acid; (B) a photopolymerizable compound having an ethylenically unsaturated bond group; (C) a photopolymerization initiator; and (D) a styryl pyridine represented by the Formula (1). In Formula (1), each of R1, R2 and R3 independently represents an alkyl group having from 1 to 20 carbon atoms, an alkoxy group having from 1 to 6 carbon atoms, an alkyl ester group having from 1 to 6 carbon atoms, an amino group, an alkyl amino group having from 1 to 20 carbon atoms, a carboxy group, a ciano group, a nitro group, an acetyl group or a (meth)acryloyl group, each of a, b and c independently represents an integer of from 0 to 5. In a case in which each of a, b and c is independently 2 or more, the plural R1s, R2s, and R3s independently may be the same or different.
    Type: Application
    Filed: September 14, 2015
    Publication date: September 14, 2017
    Inventors: Shota OKADE, Yukiko MURAMATSU, Emiko OOTA, Ken SAWABE, Sanchoru RI
  • Publication number: 20160330845
    Abstract: A photosensitive resin composition includes a binder polymer, a photopolymerizable compound, and a photopolymerization initiator. The binder polymer has a structural unit derived from a (meth)acrylic acid, a structural unit derived from styrene or ?-methylstyrene, and a structural unit derived from a hydroxyalkyl (meth)acrylate ester having a hydroxyalkyl group having from 1 to 12 carbon atoms. The photopolymerizable compound include a bisphenolic di(meth)acrylate having from 1 to 20 structural units of an ethyleneoxy group and having from 0 to 7 structural units of a propyleneoxy group.
    Type: Application
    Filed: December 22, 2014
    Publication date: November 10, 2016
    Inventors: Shota OKADE, Masahiro MIYASAKA, Yukiko MURAMATSU
  • Publication number: 20150293443
    Abstract: The invention provides a photosensitive resin that includes: a binder polymer that has a structural unit derived from (meth)acrylic acid, a structural unit derived from styrene or ?-methyl styrene, and a structural unit derived from benzyl (meth)acrylate; a photopolymerizable compound including a first bisphenol di(meth)acrylate that has an ethyleneoxy group and a propyleneoxy group, in which a number of structural units of the ethyleneoxy group is from 1 to 20 and a number of structural units of the propyleneoxy group is from 2 to 7, and in which a total number of structural units of the ethyleneoxy group and the propyleneoxy group is more than 10; and a photopolymerization initiator.
    Type: Application
    Filed: November 14, 2013
    Publication date: October 15, 2015
    Applicant: Hitachi Chemical Company, Ltd.
    Inventors: Shota Okade, Masahiro Miyasaka, Yukiko Muramatsu
  • Patent number: 8592130
    Abstract: A photosensitive resin composition comprising: (A) a binder polymer having a divalent group represented by formula (I), (II) and (III); (B) a photopolymerizing compound; and (C) a photopolymerization initiator. [In formulas (I), (II) and (III), R1, R2, R4 each independently represents a hydrogen atom or a methyl group, R3 is C1-C3 alkyl group, etc., m is an integer of 0-5, R5, R6 and R7 each independently represents a hydrogen atom or a C1-C5 alkyl group, and at least two among R5, R6 and R7 are C1-C5 alkyl groups.
    Type: Grant
    Filed: May 22, 2009
    Date of Patent: November 26, 2013
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Masahiro Miyasaka, Yukiko Muramatsu
  • Patent number: 8586284
    Abstract: The invention provides a photosensitive resin composition comprising (A) 100 parts by weight of a binder polymer having 10-65 parts by weight of a divalent group obtained from a specific styrene compound and its derivative, 5-55 parts by weight of a divalent group obtained from a specific (meth)acrylic acid ester and its derivative and 15-50 parts by weight of a divalent group obtained from (meth)acrylic acid, (B) a photopolymerizing compound and (C) a photopolymerization initiator.
    Type: Grant
    Filed: June 10, 2008
    Date of Patent: November 19, 2013
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Hanako Nankawa, Masahiro Miyasaka, Yukiko Muramatsu
  • Publication number: 20130298398
    Abstract: The invention relates to a photosensitive resin composition comprising a binder polymer having a (meth)acrylic acid-based structural unit, with a dispersity (weight-average molecular weight/number-average molecular weight) of no greater than 1.6, a photopolymerizable compound, a photopolymerization initiator and a sensitizing dye.
    Type: Application
    Filed: November 15, 2011
    Publication date: November 14, 2013
    Inventors: Masahiro Miyasaka, Masaki Endou, Masataka Kushida, Yukiko Muramatsu, Makoto Kaji
  • Publication number: 20110159430
    Abstract: A photosensitive resin composition comprising: (A) a binder polymer having a divalent group represented by formula (I), (II) and (III); (B) a photopolymerizing compound; and (C) a photopolymerization initiator. [In formulas (I), (II) and (III), R1, R2, R4 each independently represents a hydrogen atom or a methyl group, R3 is C1-C3 alkyl group, etc., m is an integer of 0-5, R5, R6 and R7 each independently represents a hydrogen atom or a C1-C5 alkyl group, and at least two among R5, R6 and R7 are C1-C5 alkyl groups.
    Type: Application
    Filed: May 22, 2009
    Publication date: June 30, 2011
    Applicant: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Masahiro Miyasaka, Yukiko Muramatsu
  • Publication number: 20110086309
    Abstract: The invention provides a photosensitive resin composition comprising (A) 100 parts by weight of a binder polymer having 10-65 parts by weight of a divalent group obtained from a specific styrene compound and its derivative, 5-55 parts by weight of a divalent group obtained from a specific (meth)acrylic acid ester and its derivative and 15-50 parts by weight of a divalent group obtained from (meth)acrylic acid, (B) a photopolymerizing compound and (C) a photopolymerization initiator.
    Type: Application
    Filed: June 10, 2008
    Publication date: April 14, 2011
    Applicant: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Hanako Nankawa, Masahiro Miyasaka, Yukiko Muramatsu