Abstract: In plating on an Si substrate, it has been strongly demanded to apply a treatment for providing an excellent adhesion so as to resist a post-processing such as polishing and for facilitating plating. Then, provided is a plated substrate adapted for hard disk medium comprising an Si single crystal; an amorphous layer on the substrate, the amorphous layer having thickness of 2 to 200 nm and containing Si and one or more metals selected from a group consisting of Ni, Cu and Ag; a multicrystal layer on the amorphous layer, the multicrystal layer having thickness of 5 to 1000 nm and containing Si and one or more metals selected from a group consisting of Ni, Cu and Ag.

Abstract: In plating on an Si substrate, it has been strongly demanded to apply a treatment for providing an excellent adhesion so as to resist a post-processing such as polishing and for facilitating plating. Then, provided is a plated substrate adapted for hard disk medium comprising an Si single crystal; an amorphous layer on the substrate, the amorphous layer having thickness of 2 to 200 nm and containing Si and one or more metals selected from a group consisting of Ni, Cu and Ag; a multicrystal layer on the amorphous layer, the multicrystal layer having thickness of 5 to 1000 nm and containing Si and one or more metals selected from a group consisting of Ni, Cu and Ag.

Abstract: The present invention provides a surface-treated substrate for a magnetic recording medium, and a magnetic recording medium comprising a recording layer, wherein the surface-treated substrate can contain thick film which has adhesion strong enough to withstand leveling process such as polishing in the formation of film on the Si substrate. More specifically, the present invention provides a surface-treated substrate for a magnetic recording medium, comprising a Si substrate and a primer plating layer on the Si substrate, wherein the primer plating layer is film which comprises a metal and a Si oxide. Furthermore, the present invention provides a surface-treated substrate for a magnetic recording medium, comprising a Si substrate and a primer plating layer on the Si substrate, wherein at least 5 and at most 50 protrusions of a height of at least 100 nm per 100 &mgr;m2 are present on a surface of the primer plating layer.

Abstract: In plating on an Si substrate, it has been strongly demanded to apply a treatment for providing an excellent adhesion so as to resist a post-processing such as polishing and for facilitating plating. Then, provided is a plated substrate adapted for hard disk medium comprising an Si single crystal; an amorphous layer on the substrate, the amorphous layer having thickness of 2 to 200 nm and containing Si and one or more metals selected from a group consisting of Ni, Cu and Ag; a multicrystal layer on the amorphous layer, the multicrystal layer having thickness of 5 to 1000 nm and containing Si and one or more metals selected from a group consisting of Ni, Cu and Ag.