Patents by Inventor Yukimichi Kanetaki

Yukimichi Kanetaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of forming a trench capacitor on a semiconductor substrate
    Patent number: 4906590
    Abstract: The disclosed method of forming a capacitor on a semiconductor substrate includes the steps of filling a trench in the semiconductor substrate with a photoresist, a step of exposing the photoresist in situ to a standing wave of light intensity which is created by interference between incident light directed to the bottom of the trench and reflected light from the bottom of the trench, developing and exposed photoresist in situ to leave periodic photoresist regions along the side wall of the trench in the direction of its depth, and etching the side wall using the residual periodic photoresist as a mask to create periodic hollows along the side wall of the trench.
    Type: Grant
    Filed: April 24, 1989
    Date of Patent: March 6, 1990
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Yukimichi Kanetaki, Yasuo Kinoshita