Abstract: A semiconductor device is provided with an oxide semiconductor thin-film transistor (TFT); a calibration electrode that is positioned so as to face an oxide semiconductor layer with an insulating layer therebetween, and, when viewed from the direction of the substrate normal line, overlaps at least part of a gate electrode with the oxide semiconductor layer interposed therebetween; and a calibration voltage setting circuit that determines the voltage to be applied to the calibration electrode. The calibration voltage setting circuit is provided with: a monitor TFT that is configured using a second oxide semiconductor layer, which is substantially the same as the oxide semiconductor layer of the oxide semiconductor TFT; a detection circuit that is configured so as to be able to measure the device characteristics of the monitor TFT; and a voltage determination circuit that determines the voltage to be applied to the calibration electrode on the basis of the measured device characteristics.

Abstract: This semiconductor device (101) includes: a substrate (1); a thin-film transistor (10) which includes an oxide semiconductor layer (6) as its active layer; a protective layer (11) covering the thin-film transistor; a metal layer (9d, 9t) interposed between the protective layer (11) and the substrate (1); a transparent conductive layer (13, 13t) formed on the protective layer (11); and a connecting portion (20, 30) to electrically connect the metal layer (9d, 9t) and the transparent conductive layer (13, 13t) together. The connecting portion (20, 30) includes an oxide connecting layer (6a, 6t) which is formed out of a same oxide film as a oxide semiconductor layer (6) and which has a lower electrical resistance than the oxide semiconductor layer (6). The metal layer (9d, 9t) is electrically connected to the transparent conductive layer (13, 13t) via the oxide connecting layer (6a, 6t).

Abstract: Provided is a liquid crystal display panel, including: a circuit substrate and an opposite substrate disposed to face each other; a liquid crystal layer sandwiched between the circuit substrate and the opposite substrate; a display region provided on a surface of the circuit substrate facing the liquid crystal layer and having at least a plurality of pixel electrodes; a peripheral region provided in a periphery of the display region and having at least a plurality of thin film transistors; a first light-shielding layer provided on a side of the opposite substrate so as to shield at least a region corresponding to the peripheral region from light; and a second light-shielding layer provided on a surface of the first substrate on a side opposite to the surface facing the liquid crystal layer so as to shield at least a region corresponding to the peripheral region from light.

Abstract: A semiconductor device is provided with an oxide semiconductor thin-film transistor (TFT); a calibration electrode that is positioned so as to face an oxide semiconductor layer with an insulating layer therebetween, and, when viewed from the direction of the substrate normal line, overlaps at least part of a gate electrode with the oxide semiconductor layer interposed therebetween; and a calibration voltage setting circuit that determines the voltage to be applied to the calibration electrode. The calibration voltage setting circuit is provided with: a monitor TFT that is configured using a second oxide semiconductor layer, which is substantially the same as the oxide semiconductor layer of the oxide semiconductor TFT; a detection circuit that is configured so as to be able to measure the device characteristics of the monitor TFT; and a voltage determination circuit that determines the voltage to be applied to the calibration electrode on the basis of the measured device characteristics.

Abstract: This semiconductor device (101) includes: a substrate (1); a thin-film transistor (10) which includes an oxide semiconductor layer (6) as its active layer; a protective layer (11) covering the thin-film transistor; a metal layer (9d, 9t) interposed between the protective layer (11) and the substrate (1); a transparent conductive layer (13, 13t) formed on the protective layer (11); and a connecting portion (20, 30) to electrically connect the metal layer (9d, 9t) and the transparent conductive layer (13, 13t) together. The connecting portion (20, 30) includes an oxide connecting layer (6a, 6t) which is formed out of a same oxide film as a oxide semiconductor layer (6) and which has a lower electrical resistance than the oxide semiconductor layer (6). The metal layer (9d, 9t) is electrically connected to the transparent conductive layer (13, 13t) via the oxide connecting layer (6a, 6t).

Abstract: An active matrix substrate (30) of the present invention includes a substrate, a gate line (50) formed on the substrate, and an interlayer insulating layer (90) for insulating a layer formed on the gate line (50) from the gate line (50). In a region of the substrate, the interlayer insulating layer (90) is not provided on an upper surface of the gate line (50), and therefore, the upper surface is exposed. On the other hand, the insulating layer (90) is provided on the substrate so as to have contact with at least an edge face of the gate line (50) which edge face is on an extension of a longitudinal direction of the gate line (50).

Abstract: An active matrix substrate (30) of the present invention includes a substrate, a gate line (50) formed on the substrate, and an interlayer insulating layer (90) for insulating a layer formed on the gate line (50) from the gate line (50). In a region of the substrate, the interlayer insulating layer (90) is not provided on an upper surface of the gate line (50), and therefore, the upper surface is exposed. On the other hand, the insulating layer (90) is provided on the substrate so as to have contact with at least an edge face of the gate line (50) which edge face is on an extension of a longitudinal direction of the gate line (50).

Abstract: A semiconductor memory device according to the present invention includes: a memory cell array including (2.sup.n +m) memory cells, wherein n and m are integers satisfying the relationship 2.sup.n <2.sup.n +m<2.sup.n+1 ; an address decoder for receiving an address signal of (n+l) bits and for specifying one of the (2.sup.