Patents by Inventor Yukino Hagino

Yukino Hagino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Post-dry etching cleaning liquid composition and process for fabricating semiconductor device
    Patent number: 8513140
    Abstract: A post-dry etching cleaning liquid composition for cleaning a substrate after dry etching is provided, the cleaning liquid composition containing at least one type of fluorine compound, glyoxylic acid, at least one type of organic acid salt, and water. With regard to the fluorine compound, ammonium fluoride may be used. With regard to the organic acid salt, at least one of ammonium oxalate, ammonium tartarate, ammonium citrate, and ammonium acetate may be used.
    Type: Grant
    Filed: September 23, 2010
    Date of Patent: August 20, 2013
    Assignees: Sony Corporation, Kabushiki Kaisha Toshiba, Kanto Kagaku Kabushiki Kaisha
    Inventors: Masafumi Muramatsu, Kazumi Asada, Yukino Hagino, Atsushi Okuyama, Takahito Nakajima, Kazuhiko Takase, Yoshihiro Uozumi, Tsuyoshi Matsumura, Takuo Ohwada, Norio Ishikawa
  • Post-dry etching cleaning liquid composition and process for fabricating semiconductor device
    Publication number: 20110014793
    Abstract: A post-dry etching cleaning liquid composition for cleaning a substrate after dry etching is provided, the cleaning liquid composition containing at least one type of fluorine compound, glyoxylic acid, at least one type of organic acid salt, and water. With regard to the fluorine compound, ammonium fluoride may be used. With regard to the organic acid salt, at least one of ammonium oxalate, ammonium tartarate, ammonium citrate, and ammonium acetate may be used.
    Type: Application
    Filed: September 23, 2010
    Publication date: January 20, 2011
    Inventors: Masafumi Muramatsu, Kazumi Asada, Yukino Hagino, Atsushi Okuyama, Takahito Nakajima, Kazuhiko Takase, Yoshihiro Uozumi, Tsuyoshi Matsumura, Takuo Ohwada, Norio Ishikawa
  • Post-dry etching cleaning liquid composition and process for fabricating semiconductor device
    Publication number: 20080188085
    Abstract: A post-dry etching cleaning liquid composition for cleaning a substrate after dry etching is provided, the cleaning liquid composition containing at least one type of fluorine compound, glyoxylic acid, at least one type of organic acid salt, and water. With regard to the fluorine compound, ammonium fluoride may be used. With regard to the organic acid salt, at least one of ammonium oxalate, ammonium tartarate, ammonium citrate, and ammonium acetate may be used.
    Type: Application
    Filed: March 11, 2008
    Publication date: August 7, 2008
    Inventors: Masafumi Muramatsu, Kazumi Asada, Yukino Hagino, Atsushi Okuyama, Takahito Nakajima, Kazuhiko Takase, Yoshihiro Uozumi, Tsuyoshi Matsumura, Takuo Ohwada, Norio Ishikawa
  • Post-dry etching cleaning liquid composition and process for fabricating semiconductor device
    Publication number: 20060019201
    Abstract: A post-dry etching cleaning liquid composition for cleaning a substrate after dry etching is provided, the cleaning liquid composition containing at least one type of fluorine compound, glyoxylic acid, at least one type of organic acid salt, and water. With regard to the fluorine compound, ammonium fluoride may be used. With regard to the organic acid salt, at least one of ammonium oxalate, ammonium tartarate, ammonium citrate, and ammonium acetate may be used.
    Type: Application
    Filed: June 6, 2005
    Publication date: January 26, 2006
    Inventors: Masafumi Muramatsu, Kazumi Asada, Yukino Hagino, Atsushi Okuyama, Takahito Nakajima, Kazuhiko Takase, Yoshihiro Uozumi, Tsuyoshi Matsumura, Takuo Ohwada, Norio Ishikawa