Patents by Inventor Yukio Asami

Yukio Asami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220008489
    Abstract: The present invention provides a mitochondrial function-improving agent containing a lactic acid bacterium belonging to Lactobacillus farciminis or Pediococcus acidilactici, a culture of the lactic acid bacterium, or a culture supernatant of the lactic acid bacterium.
    Type: Application
    Filed: September 26, 2019
    Publication date: January 13, 2022
    Applicants: MEIJI CO., LTD., NATIONAL UNIVERSITY CORPORATION HAMAMATSU UNIVERSITY SCHOOL OF MEDICINE
    Inventors: Takashi ITO, Mitsutoshi SETOU, Satoru OZAKI, Chinami MIZOGUCHI, Yukio ASAMI
  • Publication number: 20210290699
    Abstract: Object of the invention is to provide a novel, safe, and side effect-free ghrelin secretion promoter which is capable of exhibit secreting effect of ghrelin present in human body in a form of food that is familiar and easy to be taken in. Hypophagia (loss of appetite) can be remarkably improved by a familiar, easy and safe mean by taking a given lactic acid bacteria per se or fermented milk prepared using the same as a ghrelin secretion promoter.
    Type: Application
    Filed: July 13, 2017
    Publication date: September 23, 2021
    Applicant: Meiji Co., Ltd.
    Inventors: Akira Tamura, Satomi Koyama, Yukio Asami
  • Patent number: 10195271
    Abstract: The present invention addresses the problem of providing an antibody titer-increasing agent, such as an adjuvant, capable of sustaining an effect achieved by, for example, vaccination, which is an antibody titer-increasing agent such as an adjuvant that is safe, convenient and economical and can be easily taken irrespective of age, and a method for manufacturing the same. A method for increasing an antibody titer and a method for enhancing the effect of a vaccine, each method comprising using Lactobacillus delbrueckii subspecies bulgaricus OLL1073R-1 or a culture thereof; and an antibody titer-increasing agent such as an adjuvant that comprises Lactobacillus delbrueckii subspecies bulgaricus OLL1073R-1 or a culture thereof.
    Type: Grant
    Filed: August 26, 2014
    Date of Patent: February 5, 2019
    Assignee: Meiji Co., Ltd.
    Inventors: Seiya Makino, Jun Henmi, Hiroshi Kano, Yukio Asami, Shuji Ikegami, Hiroyuki Itou, Yoshio Suzuki, Sachio Kawai, Keisuke Sawaki, Ko Okumura, Isao Nagaoka, Kazuyoshi Takeda
  • Publication number: 20160206733
    Abstract: The present invention addresses the problem of providing an antibody titer-increasing agent, such as an adjuvant, capable of sustaining an effect achieved by, for example, vaccination, which is an antibody titer-increasing agent such as an adjuvant that is safe, convenient and economical and can be easily taken irrespective of age, and a method for manufacturing the same. A method for increasing an antibody titer and a method for enhancing the effect of a vaccine, each method comprising using Lactobacillus delbrueckii subspecies bulgaricus OLL1073R-1 or a culture thereof; and an antibody titer-increasing agent such as an adjuvant that comprises Lactobacillus delbrueckii subspecies bulgaricus OLL1073R-1 or a culture thereof.
    Type: Application
    Filed: August 26, 2014
    Publication date: July 21, 2016
    Applicant: Meiji Co., Ltd.
    Inventors: Seiya Makino, Jun Henmi, Hiroshi Kano, Yukio Asami, Shuji Ikegami, Hiroyuki Itou, Yoshio Suzuki, Sachio Kawai, Keisuke Sawaki, Yasushi Okumura, Isao Nagaoka, Kazuyoshi Takeda
  • Publication number: 20080146657
    Abstract: The present inventors produced lotus leaf extracts, and discovered that quercetin is one of the active ingredients. As a result of treating ?3-adrenergic receptor-expressing cells and feeding diabetes model mice with quercetin and evaluating its effects, the present inventors discovered specifically that quercetin produces obesity-improving effects and antidiabetic effects by acting as a ?3-adrenergic receptor agonist.
    Type: Application
    Filed: November 4, 2004
    Publication date: June 19, 2008
    Inventors: Hiroshi Tsuboi, Shuji Ikegami, Tomonori Kamiyama, Zai-si Ji, Yukio Asami, Hiroyuki Itou, Munehiro Oda, Kazuo Shin
  • Patent number: 6867037
    Abstract: Under the regulation of a methanol-inducible alcohol oxidase gene (AOX1) promoter and a transcription termination sequence originating from Pichia pastoris, Pichia yeast, which has been transformed with an expression vector containing an MK family protein gene ligated to an a1 factor signal sequence originating from Saccharomyces cerevisiae, is cultured and an intact MK family protein is thus expressed and secreted in a large amount into the culture supernatant.
    Type: Grant
    Filed: August 10, 1999
    Date of Patent: March 15, 2005
    Assignee: Meiji Dairies Corp.
    Inventors: Akira Murasugi, Yukio Asami, Isao Kido, Hideshi Kumai
  • Patent number: 6803304
    Abstract: A method for producing an electrode enabling fabrication of small electrodes at a high dimensional accuracy without being affected by the number of connections between chips, comprising the steps of forming an insulating film on an interconnection pattern of a semiconductor chip, forming a mask layer having an opening on the insulating film at a position where an electrode is to be formed, removing the insulating film within the opening by using the mask layer as a mask to expose a portion of the interconnection pattern, forming a conductor layer on the exposed interconnection pattern and the mask layer, removing the conductor layer formed on the mask layer while leaving the conductor layer formed on the exposed interconnection pattern, and removing the mask layer, and a method for producing a semiconductor device provided with such electrode.
    Type: Grant
    Filed: September 10, 2001
    Date of Patent: October 12, 2004
    Assignee: Sony Corporation
    Inventor: Yukio Asami
  • Publication number: 20020086518
    Abstract: A method for producing an electrode enabling fabrication of small electrodes at a high dimensional accuracy without being affected by the number of connections between chips, comprising the steps of forming an insulating film on an interconnection pattern of a semiconductor chip, forming a mask layer having an opening on the insulating film at a position where an electrode is to be formed, removing the insulating film within the opening by using the mask layer as a mask to expose a portion of the interconnection pattern, forming a conductor layer on the exposed interconnection pattern and the mask layer, removing the conductor layer formed on the mask layer while leaving the conductor layer formed on the exposed interconnection pattern, and removing the mask layer, and a method for producing a semiconductor device provided with such electrode.
    Type: Application
    Filed: September 10, 2001
    Publication date: July 4, 2002
    Inventor: Yukio Asami
  • Patent number: 6368943
    Abstract: On the scribe line area formed between a plurality of semiconductor clip areas on a semiconductor wafer, there is provided a chipping prevention portion constituted by a double groove consisting of the first and second grooves. Thus, the entry of chipping into the semiconductor chip area is prevented when dicing the semiconductor wafer along the scribe line area provided between each of the semiconductor chip areas. In this respect, an insulating film may be formed on the surface of the semiconductor wafer on the side of an element forming area.
    Type: Grant
    Filed: May 12, 2000
    Date of Patent: April 9, 2002
    Assignee: Sony Corporation
    Inventors: Tomoshi Ohde, Yukio Asami, Hirotaka Kobayashi
  • Patent number: 6326676
    Abstract: On the scribe line area formed between a plurality of semiconductor chip areas on a semiconductor wafer, there is provided a chipping preventing portion constituted by a double groove consisting of the first and second grooves. Thus, the entry of chipping into the semiconductor chip area is prevented when dicing the semiconductor wafer along the scribe line area provided between each of the semiconductor chip areas. In this respect, an insulating film may be formed on the surface of the semiconductor wafer on the side of an element forming area.
    Type: Grant
    Filed: May 12, 1997
    Date of Patent: December 4, 2001
    Assignee: Sony Corporation
    Inventors: Tomoshi Ohde, Yukio Asami, Hirotaka Kobayashi
  • Patent number: 5332779
    Abstract: This invention provides polymerizable silica sols in which at least one monomer containing double bond is used as its dispersion medium, especially a silica sol in which the monomer containing double bond is a monomer containing double bond and OH group or is a monomer having an adamantane structure. This invention also provides compositions which comprise these silica sols as composing elements, cured resins that are obtained by polymerizing these silica sols alone or together with other copolymerizable components, and new adamantane derivatives for use in these silica sols.
    Type: Grant
    Filed: May 31, 1991
    Date of Patent: July 26, 1994
    Assignee: Kawasaki Steel Corporation
    Inventors: Taizo Mohri, Katsuhiko Takagi, Yoshihiro Naruse, Yukio Asami
  • Patent number: 5289033
    Abstract: A semiconductor device is fabricated by placing a semiconductor chip in a lead frame which has no die pad. Electrodes of the chip are connected by bonding wires to respective lead fingers. Additionally, the lead frame has movement restricting fingers which limit horizontal movement of the chip within the lead frame during injection of resin into a mold surrounding the chip. Furthermore, the mold has horizontal movement restricting projections to limit vertical movement of the chip within the mold cavity. The restriction on horizontal and vertical movement of the chip reduces the risk of the bonding wires being broken or short circuited during the resin injection process.
    Type: Grant
    Filed: April 24, 1991
    Date of Patent: February 22, 1994
    Assignee: Sony Corporation
    Inventors: Yukio Asami, Hiroyuki Fukasawa, Akira Kojima
  • Patent number: 5252752
    Abstract: A process for the production of carboxylic anhydrides from aromatic hydrocarbons in gas phase oxidation by using a high activity and high selectivity fluid catalyst, comprising 50 to 95% by weight calculated as TiO.sub.2 +SiO.sub.2 +B.sub.2 O.sub.3 of component (A) which comprises titanium oxide, silicon dioxide and boron oxide and5 to 50% by weight calculated as V.sub.2 O.sub.5 +M.sub.2 O (M represents an alkali metal) +SO.sub.3 of component (B) comprising vanadium oxide, an alkali metal oxide and sulfuric anhydride, wherein weight ratios of B.sub.2 O.sub.3 to TiO.sub.2 and SiO.sub.2 to TiO.sub.2 in said component (A) are in the range of 0.02 to 0.5 and 0.25 to 1.0, respectively, is provided.
    Type: Grant
    Filed: October 16, 1992
    Date of Patent: October 12, 1993
    Assignee: Kawasaki Steel Corporation
    Inventors: Toshinao Aono, Yukio Asami, Noboru Hirooka, Yusaku Arima, Susumu Fujii
  • Patent number: 5214846
    Abstract: A semiconductor device is fabricated by placing a semiconductor chip in a lead frame which has no die pad. Electrodes of the chip are connected by bonding wires to respective lead fingers. Additionally, the lead frame has movement restricting fingers which limit horizontal movement of the chip within the lead frame during injection of resin into a mold surrounding the chip. Furthermore, the mold has horizontal movement restricting projections to limit vertical movement of the chip within the mold cavity. The restriction on horizontal and vertical movement of the chip reduces the risk of the bonding wires being broken or short circuited during the resin injection process.
    Type: Grant
    Filed: August 30, 1991
    Date of Patent: June 1, 1993
    Assignee: Sony Corporation
    Inventors: Yukio Asami, Hiroyuki Fukasawa, Akira Kojima
  • Patent number: 5185309
    Abstract: A high activity and high selectivity fluid catalyst for use in gas phase oxidation of aromatic hydrocarbons, comprising 50 to 95% by weight (calculated by TiO.sub.2 +SiO.sub.2 +B.sub.2 O.sub.3) of component (A) which comprises titanium oxide, silicon dioxide and boron oxide and 5 to 50% by weight [calculated by V.sub.2 O.sub.5 +M.sub.2 O (M represents an alkali metal)+SO.sub.3 ] of component (B) comprising vanadium oxide, an alkali metal oxide and sulfuric anhydride, wherein weight ratios of B.sub.2 O.sub.3 to TiO.sub.2 and SiO.sub.2 to TiO.sub.2 in said component (A) are in the range of from 0.02 to 0.5 and from 0.25 to 1.0, respectively, is provided.
    Type: Grant
    Filed: March 22, 1991
    Date of Patent: February 9, 1993
    Assignee: Kawasaki Steel Corp.
    Inventors: Toshinao Aono, Yukio Asami, Noboru Hirooka, Yusaku Arima, Susumu Fujii
  • Patent number: 4598078
    Abstract: A succinimide derivative of the formula: ##STR1## wherein A is straight or branched C.sub.2 -C.sub.6 alkylene or alkenylene, B is straight or branched C.sub.3 -C.sub.5 alkylene, D is straight or branched C.sub.2 -C.sub.3 alkylene, E is straight or branched C.sub.2 -C.sub.3 alkylene, R.sup.1 and R.sup.2 are each hydrogen or C.sub.1 -C.sub.4 alkyl, or they may form a single bond and R.sup.3 is a phenyl group optionally substituted with C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy, halogen and/or trifluoromethyl, a 2-pyridyl group optionally substituted with halogen, a 2-pyrimidyl group optionally substituted with halogen, a group of the formula: ##STR2## (in which R.sup.4 is hydrogen or phenyl), a group of the formula: CO--R.sup.5 (in which R.sup.5 is adamantyl or furyl) or hydroxy (C.sub.2 -C.sub.4) alkyl, and an acid addition salt thereof, which are useful as anti-anxiety drugs and/or anti-allergic drugs.
    Type: Grant
    Filed: October 19, 1983
    Date of Patent: July 1, 1986
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Kikuo Ishizumi, Fujio Antoku, Yukio Asami
  • Patent number: 4543355
    Abstract: Succinimide derivatives representable by the following formula: ##STR1## wherein X and Y are combined to form a group of the formula: ##STR2## (wherein A is an oxygen atom, a methylene group or an ethylene group and a full line accompanying a broken line is a single bond or a double bond) and Z is a hydrogen atom or, X and Z are combined to form a group of the formula: ##STR3## (wherein A and a full line are each as defined above) and Y is a hydrogen atom, R is a phenyl group, optionally substituted with halogen, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy or trifluoromethyl, a 2-pyridyl group or a 2-pyrimidinyl group and n is an integer of 3 or 4, and pharmaceutically acceptable acid addition salts thereof, which are useful as antianxious substances.
    Type: Grant
    Filed: January 8, 1985
    Date of Patent: September 24, 1985
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Kikuo Ishizumi, Fujio Antoku, Yukio Asami
  • Patent number: 4507303
    Abstract: Succinimide derivatives representable by the following formula: ##STR1## wherein X and Y are combined to form a group of the formula: ##STR2## (wherein A is an oxygen atom, a methylene group or an ethylene group and a full line accompanying a broken line ( ) is a single bond or a double bond) and Z is a hydrogen atom or, X and Z are combined to form a group of the formula: ##STR3## (wherein A and a full line are each as defined above) and Y is a hydrogen atom, R is a phenyl group, optionally substituted with halogen, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy or trifluoromethyl, a 2-pyridyl group or a 2-pyrimidinyl group and n is an integer of 3 or 4, and pharmaceutically acceptable acid addition salts thereof, which are useful as antianxious substances.
    Type: Grant
    Filed: December 1, 1982
    Date of Patent: March 26, 1985
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Kikuo Ishizumi, Fujio Antoku, Yukio Asami
  • Patent number: 4302357
    Abstract: An activated alumina catalyst containing alkali metal, sulfur, iron and silicon in an amount of 0.05 wt. % or less respectively, calculated as Na.sub.2 O, SO.sub.3, Fe.sub.2 O.sub.3 and SiO.sub.2 and having a purity of 99.6 wt. % or more exhibits superior activity and selectivity when used in the dehydration reaction of ethanol to ethylene. By adding to the above mentioned high purity activated alumina catalyst a phosphate of one member selected from the metals of Group IIa, Group IIb, Group IIIa and Group IVb of the Periodic Table in an amount of from 0.05 to 5 wt. % of said catalyst there can be obtained a catalyst having more improved activity and selectivity as well as more increased mechanical strength.
    Type: Grant
    Filed: April 23, 1980
    Date of Patent: November 24, 1981
    Assignee: Nikki Chemical Co., Ltd.
    Inventors: Mitsuo Kojima, Takahiro Aida, Yukio Asami