Patents by Inventor Yukio Hagita

Yukio Hagita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100019148
    Abstract: In a circuit pattern inspection apparatus, while an electron beam is irradiated onto a surface of a substrate having a plurality of chips where circuit patterns have been formed, a signal produced from the irradiated substrate is detected so as to form an image, and then, the formed image is compared with another image in order to detect a defect on the circuit patterns. Before the electron beam is irradiated onto either the chip or the plurality of chips so as to acquire the image for an inspection purpose, an electron beam is previously irradiated onto the region to be irradiated, so that charging conditions of the substrate to be inspected are arbitrarily controlled.
    Type: Application
    Filed: October 8, 2009
    Publication date: January 28, 2010
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Yasuhiko NARA, Masaaki Nojiri, Kouichi Hayakawa, Hiroyuki Shinada, Yukio Hagita
  • Publication number: 20070284526
    Abstract: In a circuit pattern inspection apparatus, while an electron beam is irradiated onto a surface of a substrate having a plurality of chips where circuit patterns have been formed, a signal produced from the irradiated substrate is detected so as to form an image, and then, the formed image is compared with another image in order to detect a defect on the circuit patterns. Before the electron beam is irradiated onto either the chip or the plurality of chips so as to acquire the image for an inspection purpose, an electron beam is previously irradiated onto the region to be irradiated, so that charging conditions of the substrate to be inspected are arbitrarily controlled.
    Type: Application
    Filed: April 25, 2007
    Publication date: December 13, 2007
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Yasuhiko Nara, Masaaki Nojiri, Kouichi Hayakawa, Hiroyuki Shinada, Yukio Hagita
  • Patent number: 7223975
    Abstract: In a circuit pattern inspection apparatus, while an electron beam is irradiated onto a surface of a substrate having a plurality of chips where circuit patterns have been formed, a signal produced from the irradiated substrate is detected so as to form an image, and then, the formed image is compared with another image in order to detect a defect on the circuit patterns. Before the electron beam is irradiated onto either the chip or the plurality of chips so as to acquire the image for an inspection purpose, an electron beam is previously irradiated onto the region to be irradiated, so that charging conditions of the substrate to be inspected are arbitrarily controlled.
    Type: Grant
    Filed: May 12, 2004
    Date of Patent: May 29, 2007
    Assignee: Hitachi, Ltd.
    Inventors: Yasuhiko Nara, Masaaki Nojiri, Kouichi Hayakawa, Hiroyuki Shinada, Yukio Hagita
  • Publication number: 20040227079
    Abstract: In a circuit pattern inspection apparatus, while an electron beam is irradiated onto a surface of a substrate having a plurality of chips where circuit patterns have been formed, a signal produced from the irradiated substrate is detected so as to form an image, and then, the formed image is compared with another image in order to detect a defect on the circuit patterns. Before the electron beam is irradiated onto either the chip or the plurality of chips so as to acquire the image for an inspection purpose, an electron beam is previously irradiated onto the region to be irradiated, so that charging conditions of the substrate to be inspected are arbitrarily controlled.
    Type: Application
    Filed: May 12, 2004
    Publication date: November 18, 2004
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Yasuhiko Nara, Masaaki Nojiri, Kouichi Hayakawa, Hiroyuki Shinada, Yukio Hagita