Patents by Inventor Yukio Kenbou
Yukio Kenbou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9551670Abstract: A defect inspection apparatus including: a first illumination optical system which is configured to illuminate the inspection area on a sample surface from a normal line direction or a direction near thereof with respect to said sample surface; a second illumination optical system which is configured to illuminate said inspection area from a slant direction with respect to said sample surface; a detection optical system having a plurality of first detectors which are located, in front of, on the sides of, and behind said inspection area, respectively, with respect to the illumination direction of said second illumination optical system, and where the regular reflected light component, from said sample surface, by illumination light of said second illumination optical system, is not converged; and a signal processing system which is configured to inspect a defect, upon basis of signals obtained from said plurality of first detectors.Type: GrantFiled: April 10, 2014Date of Patent: January 24, 2017Assignees: HITACHI, LTD., HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Ichiro Ishimaru, Minori Noguchi, Ichiro Moriyama, Yoshikazu Tanabe, Yasuo Yatsugake, Yukio Kenbou, Kenji Watanabe, Hirofumi Tsuchiyama
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Publication number: 20140218723Abstract: A defect inspection apparatus including: a first illumination optical system which is configured to illuminate the inspection area on a sample surface from a normal line direction or a direction near thereof with respect to said sample surface; a second illumination optical system which is configured to illuminate said inspection area from a slant direction with respect to said sample surface; a detection optical system having a plurality of first detectors which are located, in front of, on the sides of, and behind said inspection area, respectively, with respect to the illumination direction of said second illumination optical system, and where the regular reflected light component, from said sample surface, by illumination light of said second illumination optical system, is not converged; and a signal processing system which is configured to inspect a defect, upon basis of signals obtained from said plurality of first detectors.Type: ApplicationFiled: April 10, 2014Publication date: August 7, 2014Applicant: Hitachi High-Technologies CorporationInventors: Ichiro ISHIMARU, Minori NOGUCHI, Ichiro MORIYAMA, Yoshikazu TANABE, Yasuo YATSUGAKE, Yukio KENBOU, Kenji WATANABE, Hirofumi TSUCHIYAMA
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Patent number: 8729514Abstract: A defect inspection apparatus including: a first illumination optical system which is configured to illuminate the inspection area on a sample surface from a normal line direction or a direction near thereof with respect to said sample surface; a second illumination optical system which is configured to illuminate said inspection area from a slant direction with respect to said sample surface; a detection optical system having a plurality of first detectors which are located, in front of, on the sides of, and behind said inspection area, respectively, with respect to the illumination direction of said second illumination optical system, and where the regular reflected light component, from said sample surface, by illumination light of said second illumination optical system, is not converged; and a signal processing system which is configured to inspect a defect, upon basis of signals obtained from said plurality of first detectors.Type: GrantFiled: May 24, 2011Date of Patent: May 20, 2014Assignee: Hitachi High-Technologies CorporaationInventors: Ichiro Ishimaru, Minori Noguchi, Ichiro Moriyama, Yoshikazu Tanabe, Yasuo Yatsugake, Yukio Kenbou, Kenji Watanabe, Hirofumi Tsuchiyama
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Publication number: 20120069329Abstract: A defect inspection apparatus including: a first illumination optical system which is configured to illuminate the inspection area on a sample surface from a normal line direction or a direction near thereof with respect to said sample surface; a second illumination optical system which is configured to illuminate said inspection area from a slant direction with respect to said sample surface; a detection optical system having a plurality of first detectors which are located, in front of, on the sides of, and behind said inspection area, respectively, with respect to the illumination direction of said second illumination optical system, and where the regular reflected light component, from said sample surface, by illumination light of said second illumination optical system, is not converged; and a signal processing system which is configured to inspect a defect, upon basis of signals obtained from said plurality of first detectors.Type: ApplicationFiled: May 24, 2011Publication date: March 22, 2012Inventors: Ichiro ISHIMARU, Minori Noguchi, Ichiro Moriyama, Yoshikazu Tanabe, Yasuo Yatsugake, Yukio Kenbou, Kenji Watanabe, Hirofumi Tsuchiyama
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Patent number: 7952085Abstract: The invention provides a surface inspection apparatus and a method for inspecting the surface of a sample that are capable of inspecting discriminatingly between the scratch of various configuration and the adhered foreign object that occur on the surface of a work target when the work target (for example, an insulating film on a semiconductor substrate) is subjected to polishing process such as CMP or grinding process in semiconductor manufacturing process or magnetic head manufacturing process.Type: GrantFiled: August 22, 2008Date of Patent: May 31, 2011Assignees: Hitachi, Ltd., Hitachi High-Technologies CorporationInventors: Ichiro Ishimaru, Minori Noguchi, Ichiro Moriyama, Yoshikazu Tanabe, Yasuo Yatsugake, Yukio Kenbou, Kenji Watanabe, Hirofumi Tsuchiyama
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Publication number: 20090103078Abstract: An apparatus for detecting defects, including: a table unit which mounts a specimen to be inspected having a linearly moving stage and a rotationally moving stage; a first illumination optical unit which illuminates an inspection region of a surface of the specimen from a normal direction or in the vicinity of the normal direction while the specimen is rotating by the rotationally moving stage and moving in one direction by the linearly moving stage; a second illumination optical unit which illuminates the inspection region from a first elevation angle toward the inspection region while the specimen is rotating and moving; a first detection optical unit which detects light reflected from the inspection region by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors arranged in plural portions of a second elevation angle toward the inspection region; a second detection optical unit which detects light reflected from the inspection region by the ilType: ApplicationFiled: August 22, 2008Publication date: April 23, 2009Inventors: Ichiro ISHIMARU, Minori Noguchi, Ichiro Moriyama, Yoshikazu Tanabe, Yasuo Yatsugake, Yukio Kenbou, Kenji Watanabe, Hirofumi Tsuchiyama
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Publication number: 20080236259Abstract: A scanning probe microscope provided with a cantilever 21 having a probe 20 facing a sample 12, a measurement unit 24 measuring a physical quantity occurring between the probe and sample, and movement mechanisms 11, 29 changing a positional relationship between the probe and sample to cause a scanning operation and making the probe scan the surface of the sample by the movement mechanism and measure the surface of the sample by the measurement unit.Type: ApplicationFiled: August 18, 2005Publication date: October 2, 2008Inventors: Tooru Kurenuma, Yukio Kenbou, Hiroaki Yanagimoto, Hiroshi Kuroda, Takafumi Morimoto
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Patent number: 7417244Abstract: An apparatus for detecting defects, including: a first illumination optical unit which illuminates from a normal direction or in the vicinity of the normal direction; a second illumination optical unit which illuminates from a first elevation angle; a first detection optical unit which detects light reflected by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors; a second detection optical unit which detects light reflected by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors; wherein the plural detectors of the first detection optical unit and the plural detectors of the second detection optical unit are photomultipliers, and the signal processor processes the signals outputted from the photomultipliers and are adjusted to balance in sensitivities.Type: GrantFiled: January 25, 2007Date of Patent: August 26, 2008Assignees: Hitachi, Ltd., Hitachi High-Technologies CorporationInventors: Ichiro Ishimaru, Minori Noguchi, Ichiro Moriyama, Yoshikazu Tanabe, Yasuo Yatsugake, Yukio Kenbou, Kenji Watanabe, Hirofumi Tsuchiyama
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Patent number: 7388199Abstract: A probe is made by attaching a carbon nanotube 12 to a mounting base end 13, which eliminates the effects of a carbon contamination film, to increase the bonding strength, increase the conductivity of the probe, and strengthen the bonding performance thereof by coating the entire circumference of the nanotube and the base with a coating film, rather than coating just one side. The work of mounting the carbon nanotube and mounting base end are performed under observation by a microscope. Further, the carbon contamination film 14 formed by an electron microscope is stripped off at a stage before bonding by the coating film.Type: GrantFiled: September 3, 2004Date of Patent: June 17, 2008Assignee: Hitachi Kenki Fine Tech Co., Ltd.Inventors: Takafumi Morimoto, Tooru Shinaki, Yoshiyuki Nag'No, Yukio Kenbou, Yuuichi Kunitomo, Takenori Hiroki, Tooru Kurenuma, Hiroaki Yanagimoto, Hiroshi Kuroda, Shigeru Miwa, Ken Murayama, Mitsuo Hayashibara, Kishio Hidaka, Tadashi Fujieda
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Patent number: 7350404Abstract: The probe tip movement control method of the scanning probe microscope is used for a scanning probe microscope provided with a cantilever 21 having a probe tip 20 facing a sample 12. The atomic force occurring between the probe tip and sample is measured when the probe tip scans the surface of the sample. X-, Y-, and Z-fine movement mechanisms 23, 29, and 30 are used to relatively change the positions of the probe tip and sample. It is possible to maintain a high measurement accuracy and enable scan movement of a probe tip on a sample surface by simple control when measuring a part having a gradient in measurement of an uneven shape on a sample surface.Type: GrantFiled: August 27, 2004Date of Patent: April 1, 2008Assignee: Hitachi Kenki Fine Tech Co., Ltd.Inventors: Tooru Kurenuma, Hiroaki Yanagimoto, Hiroshi Kuroda, Yasushi Minomoto, Shigeru Miwa, Ken Murayama, Yukio Kenbou, Yuuichi Kunitomo, Takenori Hiroki, Yoshiyuki Nagano, Takafumi Morimoto
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Patent number: 7333191Abstract: A scanning probe microscope has a cantilever with a probe facing a sample and a measurement section for measuring a physical quantity occurring between the probe and the sample when the probe scans a surface of the sample, holding the physical quantity constant to measure the surface of the sample. The above microscope further has a probe tilt mechanism, an optical microscope etc. for detecting a position of the probe when the probe is tilted, and a control section for setting the probe in a first tilt posture and second tilt posture, measuring a surface of the sample by the measurement section at each tilt posture, detecting the position of the probe at least at the second tilt posture by the optical microscope etc., and making a measurement location at the second tilt posture match with a measurement location at the first tilt posture for measurement.Type: GrantFiled: July 19, 2004Date of Patent: February 19, 2008Assignee: Hitachi Kenki Finetech Co., Ltd.Inventors: Ken Murayama, Yukio Kenbou, Yuuichi Kunitomo, Takenori Hiroki, Yoshiyuki Nagano, Takafumi Morimoto, Tooru Kurenuma, Hiroaki Yanagimoto, Hiroshi Kuroda, Shigeru Miwa
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Patent number: 7242016Abstract: A surface inspection apparatus and a method for inspecting the surface of a sample are capable of inspecting discriminatingly between scratches of various configuration and adhered foreign objects that occur on the surface of a work target when the work target (for example, an insulating film on a semiconductor substrate) is subjected to a polishing process such as CMP or a grinding process, in semiconductor manufacturing process or magnetic head manufacturing process. In the invention, the scratch and foreign object that occur on the polished or ground surface of the sample is epi-illuminated and slant-illuminated by use of approximately same light flux, the difference between the scattered light intensity from the shallow scratch and from the foreign object is applied to thereby discriminate between the shallow scratch and the foreign object, and the directionality of the scattered light is detected to discriminate between the linear scratch and the foreign object.Type: GrantFiled: April 13, 2005Date of Patent: July 10, 2007Assignees: Hitachi, Ltd., Hitachi High-Technologies CorporationInventors: Ichiro Ishimaru, Minori Noguchi, Ichiro Moriyama, Yoshikazu Tanabe, Yasuo Yatsugake, Yukio Kenbou, Kenji Watanabe, Hirofumi Tsuchiyama
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Publication number: 20070121108Abstract: An apparatus for detecting defects, including: a first illumination optical unit which illuminates from a normal direction or in the vicinity of the normal direction; a second illumination optical unit which illuminates from a first elevation angle; a first detection optical unit which detects light reflected by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors; a second detection optical unit which detects light reflected by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors; wherein the plural detectors of the first detection optical unit and the plural detectors of the second detection optical unit are photomultipliers, and the signal processor processes the signals outputted from the photomultipliers and are adjusted to balance in sensitivities.Type: ApplicationFiled: January 25, 2007Publication date: May 31, 2007Inventors: Ichiro Ishimaru, Minori Noguchi, Ichiro Moriyama, Yoshikazu Tanabe, Yasuo Yatsugake, Yukio Kenbou, Kenji Watanabe, Hirofumi Tsuchiyama
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Publication number: 20060284083Abstract: The probe tip movement control method of the scanning probe microscope is used for a scanning probe microscope provided with a cantilever 21 having a probe tip 20 facing a sample 12. The atomic force occurring between the probe tip and sample is measured when the probe tip scans the surface of the sample. X-, Y-, and Z-fine movement mechanisms 23, 29, and 30 are used to relatively change the positions of the probe tip and sample. It is possible to maintain a high measurement accuracy and enable scan movement of a probe tip on a sample surface by simple control when measuring a part having a gradient in measurement of an uneven shape on a sample surface.Type: ApplicationFiled: August 27, 2004Publication date: December 21, 2006Inventors: Tooru Kurenuma, Hiroaki Yanagimoto, Hiroshi Kuroda, Yasushi Minomoto, Shigeru Miwa, Ken Murayama, Yukio Kenbou, Yuuichi Yuuichi, Takenori Hiroki, Yoshiyuki Nagano, Takafumi Morimoto
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Publication number: 20060284084Abstract: A method of producing a probe by attaching a carbon nanotube etc. to a mounting base end and bonding it there using a carbon film etc., which method of producing a probe eliminates the effects of a carbon contamination film to increase the bonding strength, increases the conductivity of the probe, and strengthens the bonding performance by coating the entire circumference rather than coating one side, the probe, and a scanning probe microscope are provided. The method of producing a probe is a method of producing a probe comprised of a carbon nanotube 12, a mounting base ends 13 holding this carbon nanotube, and a coating film 17 bonding the carbon nanotube to a mounting base, comprising performing the mounting work of the carbon nanotube and mounting base end under observation by a microscope and stripping off the carbon contamination film 14 formed by an electron microscope at a stage before bonding by the coating film.Type: ApplicationFiled: September 3, 2004Publication date: December 21, 2006Inventors: Takafumi Morimoto, Tooru Seinaki, Yoshiyuki Nag-No, Yukio Kenbou, Yuuichi Xunitomo, Takenori Hiroki, Tooru Kurenuma, Hiroaki Yanagimoto, Hiroshi Kuroda, Shigeru Miwa, Ken Murayama, Mitsuo Hayashirara, Kishio Hidaka, Tadashi Fujieda
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Publication number: 20050185172Abstract: A surface inspection apparatus and a method for inspecting the surface of a sample are capable of inspecting discriminatingly between scratches of various configuration and adhered foreign objects that occur on the surface of a work target when the work target (for example, an insulating film on a semiconductor substrate) is subjected to a polishing process such as CMP or a grinding process, in semiconductor manufacturing process or magnetic head manufacturing process. In the invention, the scratch and foreign object that occur on the polished or ground surface of the sample is epi-illuminated and slant-illuminated by use of approximately same light flux, the difference between the scattered light intensity from the shallow scratch and from the foreign object is applied to thereby discriminate between the shallow scratch and the foreign object, and the directionality of the scattered light is detected to discriminate between the linear scratch and the foreign object.Type: ApplicationFiled: April 13, 2005Publication date: August 25, 2005Inventors: Ichiro Ishimaru, Minori Noguchi, Ichiro Moriyama, Yoshikazu Tanabe, Yasuo Yatsugake, Yukio Kenbou, Kenji Watanabe, Hirofumi Tsuchiyama
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Patent number: 6894302Abstract: The invention provides a surface inspection apparatus and a method for inspecting the surface of a sample that are capable of inspecting discriminatingly between the scratch of various configuration and the adhered foreign object that occur on the surface of a work target when the work target (for example, an insulating film on a semiconductor substrate) is subjected to polishing process such as CMP or grinding process in semiconductor manufacturing process or magnetic head manufacturing process.Type: GrantFiled: February 26, 2001Date of Patent: May 17, 2005Assignees: Hitachi, Ltd., Hitachi High-Tech Electronics Engineering Co., Ltd.Inventors: Ichiro Ishimaru, Minori Noguchi, Ichiro Moriyama, Yoshikazu Tanabe, Yasuo Yatsugake, Yukio Kenbou, Kenji Watanabe, Hirofumi Tsuchiyama
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Publication number: 20050012936Abstract: A scanning probe microscope has a cantilever with a probe facing a sample and a measurement section for measuring a physical quantity occurring between the probe and the sample when the probe scans a surface of the sample, holding the physical quantity constant to measure the surface of the sample. The above microscope further has a probe tilt mechanism, an optical microscope etc. for detecting a position of the probe when the probe is tilted, and a control section for setting the probe in a first tilt posture and second tilt posture, measuring a surface of the sample by the measurement section at each tilt posture, detecting the position of the probe at least at the second tilt posture by the optical microscope etc., and making a measurement location at the second tilt posture match with a measurement location at the first tilt posture for measurement.Type: ApplicationFiled: July 19, 2004Publication date: January 20, 2005Inventors: Ken Murayama, Yukio Kenbou, Yuuichi Kunitomo, Takenori Hiroki, Yoshiyuki Nagano, Takafumi Morimoto, Tooru Kurenuma, Hiroaki Yanagimoto, Hiroshi Kuroda, Shigeru Miwa
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Publication number: 20010030296Abstract: The invention provides a surface inspection apparatus and a method for inspecting the surface of a sample that are capable of inspecting discriminatingly between the scratch of various configuration and the adhered foreign object that occur on the surface of a work target when the work target (for example, an insulating film on a semiconductor substrate) is subjected to polishing process such as CMP or grinding process in semiconductor manufacturing process or magnetic head manufacturing process.Type: ApplicationFiled: February 26, 2001Publication date: October 18, 2001Inventors: Ichiro Ishimaru, Minori Noguchi, Ichiro Moriyama, Yoshikazu Tanabe, Yasuo Yatsugake, Yukio Kenbou, Kenji Watanabe, Hirofumi Tsuchiyama