Abstract: A top-blowing lance nozzle is configured to freely switch an adequate expansion condition so as to control an oxygen-blowing amount and a jetting velocity independently of each other without requiring a plurality of lance nozzles or a mechanically movable part. A lance nozzle is configured to blow refining oxygen to molten iron charged in a reaction vessel while a gas is blown from a top-blowing lance to the molten iron. One or more blowing holes for blowing a working gas are on an inner wall side surface of the nozzle, at a site where the lance nozzle has a minimum cross-sectional area in a nozzle axis direction or at a neighboring site of the site.

Abstract: A processing method includes processing a metal wire rod using an emulsion lubricant that includes an oil and a nonionic surfactant at an oil-to-nonionic surfactant ratio of 1:0.3 to 0.9 (in mass ratio). The method may include purifying the emulsion lubricant after being used for processing the metal wire rod while maintaining the oil-to-nonionic surfactant ratio of 1:0.3 to 0.9 (in mass ratio) and then reusing the purified emulsion lubricant to process the metal wire rod.

Abstract: Provided is an engine generator with improved accessibility to an operation panel. An engine generator includes: a casing; a generator; and an engine that drives the generator, the generator and the engine being housed in the casing, wherein a plurality of panels each having a predetermined dimension are respectively removably provided at side surfaces of the casing, and any selected one of the plurality of panels can be exchanged for a console for the engine generator.

Abstract: A processing method includes processing a metal wire rod using an emulsion lubricant that includes an oil and a nonionic surfactant at an oil-to-nonionic surfactant ratio of 1:0.3 to 0.9 (in mass ratio). The method may include purifying the emulsion lubricant after being used for processing the metal wire rod while maintaining the oil-to-nonionic surfactant ratio of 1:0.3 to 0.9 (in mass ratio) and then reusing the purified emulsion lubricant to process the metal wire rod.

Abstract: This dummy substrate is for use in an inline reactive sputtering apparatus. The main unit thereof is made of a rectangular-plate-like frame structure in which an opening portion in a rectangular shape is formed in a metal plate in a similar shape. It is configured such that a contact portion of a carrier with the main unit is covered with the main unit. As a result, even while the sputtering apparatus is in operation, there is no possibility of the occurrence of undesirable situations such as glass cracking, making it possible to significantly increase the number of times the dummy substrate is used. Furthermore, the dummy substrate continues to cover the contact portion with the carrier. Thereby, it is possible to prevent deposition of a substance left in a sputter deposition chamber, especially a compound thin film, on the contact portion of the carrier with the substrate.

Abstract: A supporting member, carrier and method of supporting are provided with a supporting member main body mounted to freely rotate. The supporting member main body is provided with a plurality of projections extending radially from a central rotation axis. Since the substrate is supported by abutment of the projections with an end of the substrate, the occurrence of cracking in the substrate can be prevented or the durability of the supporting member main body can be increased.

Abstract: A sputtering device includes a vacuum chamber accommodating a substrate stage which rotates a substrate having a film formation surface. A target that has a sputtered surface formed from magnesium oxide is provided in a circumferential direction of the substrate. An angle of a normal to the film formation surface of the substrate and a normal to the sputtered surface of the target is defined as an angle of inclination ? for the target, and the target is disposed such that the angle of inclination ? satisfies ?50+?<?<?35+?. Here, ? is an angle represented by ?=arctan(W/H); H represents the height from the center of the substrate to the center of the target; and W represents the width from the center of the substrate to the center of the target.

Abstract: To provide a vertical substrate transfer apparatus and a film-forming apparatus capable of, regardless of a carrying position of a substrate, subjecting either surface thereof to film-formation, and capable of supporting and carrying the substrate without interfering with a non-film-forming surface. A film-forming apparatus (1) according to the present invention includes a carrier (15) giving support so that either surface of a substrate (W) is processable, a first position changing section (3) changing a carrying position of the carrier (15), and a carrying chamber (9) housing the carrier, whose position is changed therein and which carries the carrier to a film-forming chamber (10). With the above construction, it becomes possible to subject either surface to film-forming processing regardless of the carrying position of the substrate (W). Further, it becomes possible to change a film-forming surface (Wa) in the course of carrying the substrate (W).

Abstract: A substrate stage that is arranged in a vacuum chamber and that has a substrate mounting surface on which a substrate is mounted, including a first magnetic field applying unit that applies a magnetic field to the substrate, in which the internal magnetization direction of the first magnetic field applying unit and the thickness direction of the substrate match.

Abstract: A sputtering apparatus forming a film on a surface of a substrate, including: a table on which the substrate is placed; a plurality of targets disposed so that center axes thereof incline with respect to a normal line of the substrate placed on the table; and a plurality of magnetic field applying devices disposed between the targets and the substrate so as to surround the substrate, wherein the magnetic field applying devices generates a magnetic field, which has a horizontal magnetic field component parallel to the surface of the substrate, above the peripheral edge of the substrate.

Abstract: This dummy substrate is for use in an inline reactive sputtering apparatus. The main unit thereof is made of a rectangular-plate-like frame structure in which an opening portion in a rectangular shape is formed in a metal plate in a similar shape. It is configured such that a contact portion of a carrier with the main unit is covered with the main unit. As a result, even while the sputtering apparatus is in operation, there is no possibility of the occurrence of undesirable situations such as glass cracking, making it possible to significantly increase the number of times the dummy substrate is used. Furthermore, the dummy substrate continues to cover the contact portion with the carrier. Thereby, it is possible to prevent deposition of a substance left in a sputter deposition chamber, especially a compound thin film, on the contact portion of the carrier with the substrate.

Abstract: A supporting member, carrier and method of supporting are provided with a supporting member main body mounted to freely rotate. The supporting member main body is provided with a plurality of projections extending radially from a central rotation axis. Since the substrate is supported by abutment of the projections with an end of the substrate, the occurrence of cracking in the substrate can be prevented or the durability of the supporting member main body can be increased.

Abstract: A sputtering apparatus for performing a film forming process on a substrate surface of a disk-like substrate while rotating the substrate around a rotation axis line, the sputtering apparatus including a chamber, a table that rotates the substrate around the rotation axis line, and a sputtering cathode that has a cathode surface facing the substrate. Assuming that a distance between the rotation axis line and a peripheral edge of the substrate is R, a distance between the rotation axis line and a center point of the cathode surface is OF, and a height from the substrate surface to the center point of the cathode surface is TS, the following relationship is substantially satisfied: R:OF:TS=100:175:190±20. In addition, the rotation axis line intersects a normal line passing through the center point of the cathode surface, and an intersection angle thereof falls within a range of 22°±2°.

Abstract: To provide a vertical substrate transfer apparatus and a film-forming apparatus capable of, regardless of a carrying position of a substrate, subjecting either surface thereof to film-formation, and capable of supporting and carrying the substrate without interfering with a non-film-forming surface. A film-forming apparatus (1) according to the present invention includes a carrier (15) giving support so that either surface of a substrate (W) is processable, a first position changing section (3) changing a carrying position of the carrier (15), and a carrying chamber (9) housing the carrier, whose position is changed therein and which carries the carrier to a film-forming chamber (10). With the above construction, it becomes possible to subject either surface to film-forming processing regardless of the carrying position of the substrate (W). Further, it becomes possible to change a film-forming surface (Wa) in the course of carrying the substrate (W).

Abstract: A method of manufacturing a magnetic multi-layered film including: a first magnetic layer forming step of forming a first magnetic layer on a substrate; a non-magnetic layer forming step of forming a non-magnetic layer on the first magnetic layer; and a second magnetic layer forming step of forming a second magnetic layer on the non-magnetic layer, the method further including, before the non-magnetic layer forming step, a plasma treatment step of introducing the substrate into a plasma treatment apparatus and treating the substrate with inductive coupling-type plasma, with the substrate being electrically insulated from the plasma treatment apparatus.

Abstract: A seamless capsule comprising a content and a film for coating said content is disclosed. The content is a hydrophilic substance. A viscous liquid having a viscosity of not more than 1000 cp at 100.degree. C. which is scarcely miscible with water is present between the content and the film. There is also disclosed a process for producing a seamless capsule which comprises simultaneously extruding a film solution for the seamless capsule, a hydrophilic substance solution and a viscous liquid which is scarcely miscible with water into a cooling solution from a concentrically arranged multiple nozzle composed of at least three nozzles, an outermost nozzle, an innermost nozzle and at least one intermediate nozzle placed in the middle position between the above nozzles, respectively, the diameter of said nozzle gradually increasing in that order.

Abstract: The refrigerated or heated air flow within the storage chamber of a vending machine is varied by an air flow control device. A baffle plate or cover plate, or combination thereof, is used to control the direction of air flow. The position of these plates in turn is controlled by spring elements. One of the spring elements is formed of shaped memory alloy so that its recoil strength changes in accordance with its surrounding temperature. Thus, the difference in recoil strength between these spring elements changes with temperature. That difference is used to position the baffle and/or cover plates to control air circulation.

Abstract: There is provided a disposable temperature indicator utilizing a change in condition of organic compounds at their melting point for the indication of temperature.

Abstract: A process for the thermal cracking of heavy oils with a fluidized particulate heat carrier is carried out while recovering particles of the heat carrier accompanied by a stream of the reaction product by means of a cyclone and a gravitational separator, returning the particles of the heat carrier recovered by the cyclone directly to the reactor and returning the particles of the heat carrier recovered by the gravitational separator to the reactor in the form of suspension in a cracked oil.