Abstract: A hard coat layer on which adhered fingerprints are inconspicuous is provided. The hard coat layer 1 consists of a cured product. The cured product is formed by curing a curable composition by irradiating it with an ultraviolet ray. The curable composition contains a curable resin. The curable resin contains reactive monomers. The reactive monomers contain an isocyanuric acid derivative. The isocyanuric acid derivative is preferably tri(meth)acrylate of an ethylene oxide and ?-caprolactone adduct of isocyanuric acid.

Abstract: A protective film structure of a metal member for use in an apparatus for manufacturing a semiconductor or the like, the protective film structure including a first coating layer of faultless aluminum oxide formed by direct anodic oxidation of a base-material metal of an aluminum alloy; and a second coating layer formed on the first coating layer and made of yttrium oxide by a plasma spraying method.

Abstract: The hard coat film 1 of the present invention shows a contact angle for water of 110 degrees or smaller and a contact angle for camellia oil of 50 degrees or smaller. According to the present invention, even if fingerprints are adhered to the hard coat film 1, these fingerprints are inconspicuous. The hard coat film 1 of the present invention preferably shows a contact angle for water of 50 degrees or larger and a wet tension of 27 to 45 mN/m. With these characteristics, in addition to inconspicuousness of fingerprints, wiping-off property for fingerprints is improved.

Abstract: A hard coat layer on which adhered fingerprints are inconspicuous is provided. The hard coat layer 1 consists of a cured product. The cured product is formed by curing a curable composition by irradiating it with an ultraviolet ray. The curable composition contains a curable resin. The curable resin contains reactive monomers. The reactive monomers contain an isocyanuric acid derivative. The isocyanuric acid derivative is preferably tri(meth)acrylate of an ethylene oxide and ?-caprolactone adduct of isocyanuric acid.

Abstract: To provide a porous member that can suppress energy loss in a microwave band and can evenly disperse gas when used in a field requiring a high level of cleanness. The porous member is formed of porous ceramics and has a dielectric loss tangent of not more than 1×10?3 in a microwave band. A ceramic member has sintered ceramics including the porous member at a part thereof.

Abstract: Multifunction production equipment enabling a plurality of processes in which deposition of reaction products on the inner wall of the processing chamber of equipment for producing a semiconductor or a flat-plate display, metal contamination due to corrosion of the inner wall, or the like, and fluctuation of the process due to discharged gas are suppressed, and a protective film structure for use therein. On the surface of a metal material, a first coating layer having an oxide coating of 1? thick or less formed as an underlying layer by direct oxidation of a parent material, and a second coating layer of about 200 ?m thick are formed. With such an arrangement, corrosion resistance against irradiation with ions or radicals can be imparted to a second layer protective film, and the effect of a protective layer for preventing corrosion of the surface of parent metal caused by diffusing molecules or ions into the second layer protective film can be imparted to the first layer oxide film.

Abstract: It has been difficult to provide a large-sized ceramic member quickly and economically. A multilayer structure is produced by forming a ceramic film on a base which is made of a material that can be shaped comparatively easily. The ceramic film is formed by a plasma spraying method, CVD method, PVD method, sol-gel method or the like. Alternatively, the ceramic film may be formed by a method combined with a spray deposit film.

Abstract: Cavitation is produced through injection of pressurized water from an injection outlet of an injection nozzle 17a toward the pavement surface in liquid of a liquid storage part T1 formed on the pavement surface. A clogging object in a cavity of a pavement is isolated by impactive force of the cavitation, and the isolated clogging object is removed by suction with water.

Abstract: An electrically conductive ceramics comprises a compound containing at least one element belonging to the Group 3A of the periodic table and TiO2−x (0<x<2) in a range such that the TiO2−x (0<x<2) accounts for 1 to 60 wt % of the total amount of the ceramics, and at least part of the compound and the TiO2−x form a composite oxide.

Abstract: A microwave sintering furnace and a microwave sintering method are disclosed, in which the object to be sintered develops no cracking or deformation in the degreasing process. A microwave sintering furnace (1) comprises a furnace body (2) containing an object (S) to be sintered, a unit (3, 4) for generating and introducing microwaves into the furnace body, a unit (8) for supplying a degreasing gas into the furnace body (2), and a unit (11) for heating the degreasing gas before it reaches the object (S) to be sintered.

Abstract: Cavitation is produced through injection of pressurized water from an injection outlet of an injection nozzle 17a toward the pavement surface in liquid of a liquid storage part T1 formed on the pavement surface. A clogging object in a cavity of a pavement is isolated by impactive force of the cavitation, and the isolated clogging object is removed by suction with water.

Abstract: A ceramic substrate for a hard disc, a thin film chip capacitor, and hybrid ICs, and a suction carrier for a substrate is constituted by using a titanium oxide or aluminum oxide substrate having an extremely small number of pores having diameters of 3 .mu.m or more on the substrate surface.The substrate is produced by baking highly purified titanium oxide fine powder or highly purified aluminum oxide fine powder in the air, an inert atmosphere or a reducing atmosphere (at 1,100.degree. C. to 1,300.degree. C. for the former and at 1,200.degree. to 1,400.degree. C. for the latter) and HIP treating the baked material.

Abstract: A titania ceramic body consists of a surface thereof not exceeding 35 pores per square millimeter. The titania ceramic body is made by preparing a titania powder having a purity of at least 99.8 wt % titania and an average particle diameter of 0.5 .mu.m, compacting the powder, sintering a compact at a temperature in the range for 1000.degree. to 1300.degree. C. in air or in a non-air surrounding gas under ordinary pressure to produce a sintered body, hot isostatic pressing treating the sintered body in argon at a temperature of from 800.degree. C. to below temperature carried out in above sintering step under pressure of at least 500 kg/cm2, and then grinding and polishing the hot isostatic pressing treated body.

Abstract: An oxide ceramic sintered body of a single component having a purity of at least 99% by weight of titania and a surface with a plurality of pores therein not exceeding 100 pores per square millimeter. The sintered ceramic body is made by preparing a raw titania powder having a purity of at least 99% titania by weight and an average maximum particle diameter of 1 .mu.m, compacting the titania powder to produce a compact, sintering the compact at a temperature in the range of about 1000.degree. C. to about 1300.degree. under ordinary pressure in air, or an inert or reducing atmosphere. The sintered ceramic body may be hot isostatic pressure treated below the sintering temperature in an inert atmosphere under a pressure of at least 500 kg/cm.sup.2 to further reduce the number of pores in the surface.

Abstract: A ceramic mirror having a surface flatness of no more than 1 .mu.m and/or a centerline average height of no more than 1 nm as measured by the laser interference method, is made from a titanium oxide powder having an average particle diameter of 0.5 .mu.m and a minimum purity of 99.8% by weight. The mirror also has a maximum amount of irregular reflection of incident light not exceeding 5% when the angle of projection is between 0.degree. and 90.degree. as measured by a colorimeter and is made by the process including forming a titanium oxide powder having a maximum average particle diameter of 0.5 .mu.m and a minimum purity of 99.8 wt. %, compacting the titanium oxide powder by cold isostatic pressing to produce a compact, sintering the compact of titanium oxide powder in air at a temperature of 1000.degree. C.-1300.degree. C. to produce a ceramic body, hot isostatic pressing the ceramic body after the sintering in an inert atmosphere at 800.degree. C.-1500.degree. C. under a minimum pressure of 500 kg/cm.

Abstract: A ceramic mirror having a maximum surface flatness of 1 .mu.m and/or a maximum centerline average height of 1 nm as measured by the laser interference method, and a method of manufacturing a ceramic mirror by compacting a titanium oxide powder having an average particle diameter no greater than 1 .mu.m and a purity of at least 99% and then sintering the compact in an ordinary, inert, vacuum, or reducing atmosphere at a temperature between 1000.degree. and 1300.degree. C. The sintering pressure may be a minimum of 50 kg/cm.sup.2. After sintering, the product may be further treated by hot isostatic pressing (HIP) in an Ar atmosphere at 1000.degree. C. and a pressure of 1800 kg/cm.sup.2. The sintered bodies are then surface ground or lapped to produce ceramic mirrors having the above characteristics for use in laser and X-ray apparatuses, cameras, and other precision optical instruments.