Patents by Inventor Yukio Minami

Yukio Minami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200199753
    Abstract: In order to appropriately control temperatures of fluid heating sections that are maintained at different temperatures, the fluid control device (100) comprises a plurality of fluid heating sections (1) connected to each other and each having a flow path or a fluid accommodating portion inside, heaters (10) configured to heat each of the plurality of fluid heating sections to different temperatures, and heat insulating members (13, 13?) disposed between adjacent fluid heating sections.
    Type: Application
    Filed: July 20, 2018
    Publication date: June 25, 2020
    Applicant: FUJIKIN INCORPORATED
    Inventors: Atsushi HIDAKA, Takatoshi NAKATANI, Keisuke NAKATSUJI, Keiji HIRAO, Yukio MINAMI, Nobukazu IKEDA
  • Publication number: 20200161147
    Abstract: A fluid supply device includes a condenser, a tank that stores the fluid, a pump that pressure-feeds the fluid toward a processing chamber, a main pipe connecting the tank and the pump and transferring the liquid stored in the tank to the pump using a weight of the liquid, and a discharging pipe that is connected to the main pipe at a lowest position of the main pipe at one end, is opened to the atmosphere at the other end, and vaporizes and discharges the liquid in the tank and the main pipe to the outside. The discharging pipe is formed so that, after the liquid in the tank and the main pipe is fully discharged, a liquid pool that separates a space on the atmosphere side and a space on the main pipe side of the discharging pipe is temporarily produced in the discharging pipe.
    Type: Application
    Filed: July 31, 2018
    Publication date: May 21, 2020
    Applicant: FUJIKIN INCORPORATED
    Inventors: Toshihide YOSHIDA, Yukio MINAMI, Tsutomu SHINOHARA
  • Publication number: 20200149162
    Abstract: In order to optimally supply a raw material by using a heater, the fluid control device (100) includes a fluid heating section (1) provided with a flow path or a fluid accommodation portion inside, and a heater (10) for heating the fluid heating section, the heater having a heating element (10a) and a metallic heat transfer member (10b) thermally connected to the heating element and arranged so as to surround the fluid heating section, and the surface of the heat transfer member facing the fluid heating section includes a surface (S1) subjected to surface treatment for improving heat dissipation.
    Type: Application
    Filed: July 20, 2018
    Publication date: May 14, 2020
    Applicant: FUJIKIN INCORPORATED
    Inventors: Atsushi HIDAKA, Takatoshi NAKATANI, Keisuke NAKATSUJI, Keiji HIRAO, Yukio MINAMI, Nobukazu IKEDA
  • Patent number: 8469046
    Abstract: The method for parallel operation of moisture generating reactors according to the present invention operates so that an orifice, provided with an orifice hole having a predetermined opening diameter, is disposed on a mixed-gas inlet side of each of a plurality of moisture generating reactors connected in parallel with each other, and mixed gas G consisting of hydrogen and oxygen is supplied from a mixer to each of the moisture generating reactors through each orifice, and the flows of moisture generated by the moisture generating reactors are combined, and the resulting combined moisture is supplied to an apparatus that uses high-purity water. Thus, a need to increase the amount of high-purity water supply is met by allowing a plurality of moisture generating reactors to perform a parallel water generating operation by branching off a mixed gas consisting of H2 and O2 by using a simple orifice construction.
    Type: Grant
    Filed: April 17, 2007
    Date of Patent: June 25, 2013
    Assignee: Fujikin Incorporated
    Inventors: Yukio Minami, Keiji Hirao, Masaharu Taguchi, Toshiro Nariai, Koji Kawada, Akihiro Morimoto, Nobukazu Ikeda
  • Publication number: 20120082596
    Abstract: A reactor for moisture generation generates high-purity moisture at a catalytic reaction temperature that is lower than an ignition point of hydrogen gas and oxygen gas so hydrogen and oxygen gas are supplied into the reactor having a platinum catalyst layer to catalyze the reaction of the gases without combustion, wherein the reactor maintains high adhesion strength for a long time of the platinum catalyst layer to a barrier layer provided between the base material and the platinum catalyst layer. The reactor includes a reactor main body that has a gas inlet and a moisture outlet, and the Y2O3 barrier layer is formed on at least a part of an internal wall surface of the reactor main body, and the platinum catalyst layer is formed on at least a part of the Y2O3 barrier layer. A film thickness of the Y2O3 barrier layer is preferably 50 nm to 5 ?m.
    Type: Application
    Filed: October 17, 2011
    Publication date: April 5, 2012
    Applicants: FUJIKIN INCORPORATED, TOHOKU UNIVERSITY
    Inventors: Tadahiro OHMI, Koji KAWADA, Nobukazu IKEDA, Akihiro MORIMOTO, Yukio MINAMI, Keiji HIRAO, Shinji SAKAMOTO, Masafumi KITANO
  • Patent number: 7815872
    Abstract: A reactor for generating moisture, with which hydrogen and oxygen fed into the reactor contact with a platinum coating catalyst layer to activate reactivity so that hydrogen and oxygen react under conditions of non-combustion, wherein the reactor includes a cooler comprising a heat dissipation body substrate in which a heater insertion hole is made in the center to fix to the outer surface of the reactor structural component on the outlet side and a cooler on the outlet side made up of a plural number of heat dissipation bodies installed vertically in parallel on the part excluding the area where the afore-mentioned heater insertion hole of the heat dissipation body substrate exists, and a part of the heater to heat the reactor is inserted in the heater insertion hole so as to fix to the outer surface of the reactor structural component on the outlet side.
    Type: Grant
    Filed: July 4, 2005
    Date of Patent: October 19, 2010
    Assignee: Fujikin Incorporated
    Inventors: Toshirou Nariai, Kouji Kawada, Keiji Hirao, Yukio Minami, Akihiro Morimoto, Nobukazu Ikeda
  • Publication number: 20100143239
    Abstract: The method for parallel operation of moisture generating reactors according to the present invention operates so that an orifice, provided with an orifice hole having a predetermined opening diameter, is disposed on a mixed-gas inlet side of each of a plurality of moisture generating reactors connected in parallel with each other, and mixed gas G consisting of hydrogen and oxygen is supplied from a mixer to each of the moisture generating reactors through each orifice, and the flows of moisture generated by the moisture generating reactors are combined, and the resulting combined moisture is supplied to an apparatus that uses high-purity water. Thus, a need to increase the amount of high-purity water supply is met by allowing a plurality of moisture generating reactors to perform a parallel water generating operation by branching off a mixed gas consisting of H2 and O2 by using a simple orifice construction.
    Type: Application
    Filed: April 17, 2007
    Publication date: June 10, 2010
    Applicant: FUJIKIN INCORPORATED
    Inventors: Yukio Minami, Keiji Hirao, Masaharu Taguchi, Toshiro Nariai, Koji Kawada, Akihiro Morimoto, Nobukazu Ikeda
  • Patent number: 7673649
    Abstract: The present invention provides a vacuum thermal insulating valve that may be used at high temperature in gas supply systems or gas exhaust systems, and also may be made substantially small and compact in size owing to its excellent thermal insulating performance. With a vacuum thermal insulating valve comprising a valve equipped with a valve body and an actuator, and a vacuum thermal insulating box that houses the valve, the afore-mentioned vacuum thermal insulating box S is formed by a square-shaped lower vacuum jacket S5 having a cylinder-shaped vacuum thermal insulating pipe receiving part J on a side and with its upper face made open, and the square-shaped upper vacuum jackets S4, which is hermetically fitted to the lower vacuum jacket S5 and with its lower face made open.
    Type: Grant
    Filed: January 13, 2005
    Date of Patent: March 9, 2010
    Assignees: Fujikin Incorporated
    Inventors: Tadahiro Ohmi, Yukio Minami, Kenji Tubota, Tsutomu Shinohara, Michio Yamaji, Nobukazu Ikeda, Akihiro Morimoto, Koji Kawada, Toshio Nariai
  • Patent number: 7595087
    Abstract: A barrier film which has uniform thickness and excellent adhesiveness to the base material and superbly functions to protect a platinum film can be formed on the inner wall surface of a moisture-generating reactor at ease and at a low cost. The moisture-generating reactor in which hydrogen and oxygen are reacted to generate moisture without high temperature combustion is made of an alloy containing aluminum. A principally aluminum oxide (Al2O3)-composed barrier film is formed by applying an aluminum selective oxidation treatment on the inner wall surface of the moisture-generating reactor, and thereafter a platinum film is stacked on and stuck to the barrier film so that a platinum coating catalyst layer is formed.
    Type: Grant
    Filed: October 14, 2003
    Date of Patent: September 29, 2009
    Assignees: Fujikin Incorporated
    Inventors: Tadahiro Ohmi, Nobukazu Ikeda, Akihiro Morimoto, Masafumi Kitano, Yukio Minami, Koji Kawada
  • Patent number: 7553459
    Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.
    Type: Grant
    Filed: July 26, 2006
    Date of Patent: June 30, 2009
    Assignees: Fujikin Incorporated
    Inventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
  • Publication number: 20090032115
    Abstract: The present invention provides a vacuum thermal insulating valve that may be used at high temperature in gas supply systems or gas exhaust systems, and also may be made substantially small and compact in size owing to its excellent thermal insulating performance. With a vacuum thermal insulating valve comprising a valve equipped with a valve body and an actuator, and a vacuum thermal insulating box that houses the valve, the afore-mentioned vacuum thermal insulating box S is formed by a square-shaped lower vacuum jacket S5 having a cylinder-shaped vacuum thermal insulating pipe receiving part J on a side and with its upper face made open, and the square-shaped upper vacuum jackets S4, which is hermetically fitted to the lower vacuum jacket S5 and with its lower face made open.
    Type: Application
    Filed: January 13, 2005
    Publication date: February 5, 2009
    Inventors: Tadahiro Ohmi, Yukio Minami, Kenji Tubota, Tsutomu Shinohara, Michio Yamaji, Nobukazu Ikeda, Akihiro Morimoto, Koji Kawada, Toshio Nariai
  • Publication number: 20080241022
    Abstract: A reactor for generating moisture, with which hydrogen and oxygen fed into the reactor contact with a platinum coating catalyst layer to activate reactivity so that hydrogen and oxygen react under conditions of non-combustion, wherein the reactor includes a cooler comprising a heat dissipation body substrate in which a heater insertion hole is made in the center to fix to the outer surface of the reactor structural component on the outlet side and a cooler on the outlet side made up of a plural number of heat dissipation bodies installed vertically in parallel on the part excluding the area where the afore-mentioned heater insertion hole of the heat dissipation body substrate exists, and a part of the heater to heat the reactor is inserted in the heater insertion hole so as to fix to the outer surface of the reactor structural component on the outlet side.
    Type: Application
    Filed: July 4, 2005
    Publication date: October 2, 2008
    Applicant: FUJIKIN INCORPORATED
    Inventors: Toshirou Nariai, Kouji Kawada, Keiji Hirao, Yukio Minami, Akihiro Morimoto, Nobukazu Ikeda
  • Patent number: 7368092
    Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.
    Type: Grant
    Filed: December 1, 2003
    Date of Patent: May 6, 2008
    Assignees: Fujikin Incorporated
    Inventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
  • Publication number: 20070231225
    Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.
    Type: Application
    Filed: June 8, 2007
    Publication date: October 4, 2007
    Applicants: FUJIKIN INCORPORATED, Tadahiro OHMI
    Inventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
  • Patent number: 7258845
    Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.
    Type: Grant
    Filed: February 2, 2001
    Date of Patent: August 21, 2007
    Assignee: Fujikin Incorporated
    Inventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
  • Publication number: 20060292047
    Abstract: A safe, reduced pressure apparatus for generating water vapor from hydrogen and oxygen and feeding high purity moisture to processes such as semiconductor production. The apparatus eliminates the possibility of the gas igniting by maintaining the internal pressure of the catalytic reactor for generating moisture at a high level while supplying moisture gas from the reactor under reduced pressure. A heat dissipation reactor improvement substantially increases moisture generation without being an enlargement in size by efficient cooling of the reactor alumite-treated fins.
    Type: Application
    Filed: July 26, 2006
    Publication date: December 28, 2006
    Applicant: FUJIKIN INCORPORATED
    Inventors: Tadahiro Ohmi, Nobukazu Ikeda, Yukio Minami, Kouji Kawada, Katunori Komehana, Teruo Honiden, Touru Hirai, Akihiro Morimoto, Toshirou Nariai, Keiji Hirao, Masaharu Taguchi, Osamu Nakamura
  • Patent number: 7103990
    Abstract: It is an object of the present invention to provide a rotation type silicon wafer cleaning device to further raise the stability of a silicon wafer by providing a better hydrogen termination on the silicon wafer after completion of chemical and pure water cleaning treatments. According to the present invention, a rotation type silicon wafer cleaning device has a silicon wafer support/rotation driving mechanism inside the case body for cleaning the silicon wafer at the post chemical cleaning with pure water, drying and hydrogen termination treatments on the outer surface of a silicon wafer is performed by means of installing a silicon wafer drying device comprising a gas supply panel attached to a case body to supply a mixed gas of the hydrogen gas and inactive gas containing a hydrogen gas of more than 0.
    Type: Grant
    Filed: September 11, 2003
    Date of Patent: September 12, 2006
    Assignee: Fujikin Incorporated
    Inventors: Tadahiro Ohmi, Yasuyuki Shirai, Takumi Fujita, Yukio Minami, Nobukazu Ikeda, Akihiro Morimoto, Koji Kawada
  • Patent number: 7008598
    Abstract: A reactor for generating moisture wherein ignition of hydrogen gas, backfire to the gas supply source side, the peeling off of the platinum coat catalyst layer inside are prevented more completely to further increase the safety of the reactor for generating moisture and wherein the dead space in the interior space is reduced to further reduce the size of the reactor shell.
    Type: Grant
    Filed: July 7, 2004
    Date of Patent: March 7, 2006
    Assignees: Fujikin Incorporated, Tadahiro OHMI
    Inventors: Tadahiro Ohmi, Kouji Kawada, Nobukazu Ikeda, Akihiro Morimoto, Yukio Minami, Kenji Tubota, Teruo Honiden, Touru Hirai, Katunori Komehana, Keiji Hirao
  • Publication number: 20050157834
    Abstract: A barrier film which has uniform thickness and excellent adhesiveness to the base material and superbly functions to protect a platinum film can be formed on the inner wall surface of a moisture-generating reactor at ease and at a low cost. The moisture-generating reactor in which hydrogen and oxygen are reacted to generate moisture without high temperature combustion is made of an alloy containing aluminum. A principally aluminum oxide (Al2O3)-composed barrier film is formed by applying an aluminum selective oxidation treatment on the inner wall surface of the moisture-generating reactor, and thereafter a platinum film is stacked on and stuck to the barrier film so that a platinum coating catalyst layer is formed.
    Type: Application
    Filed: October 14, 2003
    Publication date: July 21, 2005
    Applicant: Fujikin Incorporated
    Inventors: Tadahiro Ohmi, Nobukazu Ikeda, Akihiro Morimoto, Masafumi Kitano, Yukio Minami, Koji Kawada
  • Patent number: 6919056
    Abstract: A reactor for generating moisture wherein ignition of hydrogen gas, backfire to the gas supply source side, and the peeling off of the platinum coat catalyst layer inside are all prevented more completely to further increase the safety of the reactor for generating moisture, and wherein the dead space in the interior space is reduced to further reduce the size of the reactor shell. The reactor has a reactor shell A with an interior space; a reflector on an inlet side facing a gas feed port in the interior space of the reactor; a reflector on an outlet side facing a moisture gas take-out port in the interior space; and a platinum coat catalyst layer 8 formed on an inside wall of a reactor structural component on the outlet side. Hydrogen and oxygen fed into the interior space of the reactor react without combustion.
    Type: Grant
    Filed: July 12, 2001
    Date of Patent: July 19, 2005
    Assignees: Fujikin Incorporated
    Inventors: Tadahiro Ohmi, Kouji Kawada, Nobukazu Ikeda, Akihiro Morimoto, Yukio Minami, Kenji Tubota, Teruo Honiden, Touru Hirai, Katunori Komehana, Keiji Hirao