Patents by Inventor Yukio Morishige
Yukio Morishige has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20050082264Abstract: A laser beam machine comprising a chuck table for holding a workpiece and a laser beam application means for applying a laser beam to the workpiece held on the chuck table, wherein the machine further comprises a light detection means for detecting light of a processing portion of the workpiece to which a laser beam is applied from the laser beam application means and a control means for judging whether the output value of the light detection means falls within a predetermined permissible range.Type: ApplicationFiled: October 12, 2004Publication date: April 21, 2005Inventors: Yusuke Nagai, Satoshi Kobayashi, Yukio Morishige, Masaru Nakamura, Masahiro Murata
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Publication number: 20050082267Abstract: A laser beam machine comprising a chuck table for holding a workpiece and a laser beam application means for applying a laser to the workpiece held on the chuck table, wherein the machine further comprises a processing sound wave detection means for detecting processing sound waves generated when a laser beam is applied to the workpiece from the laser beam application means and a control means for judging whether a detection signal from the processing sound wave detection means falls within a predetermined permissible range.Type: ApplicationFiled: September 28, 2004Publication date: April 21, 2005Inventors: Yusuke Nagai, Satoshi Kobayashi, Yukio Morishige, Masaru Nakamura, Masahiro Murata
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Patent number: 6879605Abstract: A method for repairing a pattern by using a laser and a laser-based pattern repair apparatus are provided which are capable of reducing splashes, rolling-up, and damage to a glass substrate to a minimum in pattern defects repairing processing by removing a thin metal layer such as a chromium layer. A part of a string of pulses obtained by slicing, using an optical shutter, pulses from laser light having a pulse width of 10 ps to 300 ps emitted from a Q-switched mode-locked pulse laser is used to produce multi-pulses which are divided into two portions in terms of time base correction using an optical delaying unit.Type: GrantFiled: July 24, 2001Date of Patent: April 12, 2005Assignee: Laserfront Technologies, Inc.Inventors: Yukio Kyusho, Yoichi Yoshino, Yukio Morishige
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Publication number: 20050067392Abstract: A dividing method and apparatus which apply a pulse laser beam capable of passing through a sheet-shaped workpiece to the workpiece, and move the workpiece and the pulse laser beam relative to each other along a division line of the workpiece. The following conditions are set: 0.8?V/(Y×D)?2.5 where Y (Hz) is the repetition frequency of the pulse laser beam, D (mm) is the spot diameter of the pulse laser beam, and V (mm/second) is the relative moving speed of the workpiece and the pulse laser beam.Type: ApplicationFiled: September 20, 2004Publication date: March 31, 2005Inventors: Yusuke Nagai, Satoshi Kobayashi, Yukio Morishige
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Publication number: 20050069000Abstract: A dividing method and apparatus which apply a pulse laser beam capable of passing through a sheet-shaped workpiece to the workpiece, and move the workpiece and the pulse laser beam relative to each other along a division line of the workpiece. The repetition frequency Y (Hz) of the pulse laser beam is set at 200 kHz or more. The following conditions are set: 0.8?V/(Y×D)?2.5 where D (mm) is the spot diameter of the pulse laser beam, and V (mm/second) is the relative moving speed of the workpiece and the pulse laser beam.Type: ApplicationFiled: September 20, 2004Publication date: March 31, 2005Inventors: Yusuke Nagai, Satoshi Kobayashi, Yukio Morishige
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Publication number: 20050061789Abstract: A laser beam machine comprising a workpiece holding means for holding a workpiece, a laser beam application means comprising a condenser for applying a laser beam to the workpiece held on the workpiece holding means, and a focusing point position adjusting means for adjusting the position of the focusing point of the laser beam applied by the condenser, wherein the machine further comprises a temperature detection means for detecting a temperature of the condenser and a control means for controlling the focusing point position adjusting means based on the temperature of the condenser detected by the temperature detection means.Type: ApplicationFiled: September 13, 2004Publication date: March 24, 2005Inventors: Yusuke Nagai, Satoshi Kobayashi, Yukio Morishige, Koichi Shigematsu
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Patent number: 6733848Abstract: A thin film forming equipment and a method for forming thin films are provided which are capable of forming the thin film of high quality and of effectively preventing CVD material gas from leaking to surroundings at a low cost. The thin film equipment contains a substrate, a substrate holding device used to hold the substrate and a device used to provide an atmospheric gas to a surface of the substrate held by the substrate holding device, wherein an upper face of the substrate held by the substrate holding device and an upper face of the substrate holding device are almost on one plane.Type: GrantFiled: November 21, 2001Date of Patent: May 11, 2004Assignee: NEC CorporationInventors: Yukio Morishige, Makoto Omiya
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Publication number: 20040011289Abstract: A laser CVD device capable of tightening adhesion of a film formed by laser CVD to a film formation face of a substrate and preventing cracks from occurring in the film itself is to be provided. The device comprises a plasma pretreating unit for turning pretreating gas into a plasma state by arc discharge and for supplying the plasma sate gas to the film formation face; and a film forming unit having means for sealing film forming gas while being isolated from an external atmosphere, means for radiating a laser beam to the film forming gas, wherein the film is formed over the film formation face of the substrate.Type: ApplicationFiled: June 20, 2003Publication date: January 22, 2004Applicant: NEC CorporationInventors: Yukio Morishige, Atsushi Ueda
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Patent number: 6678304Abstract: A laser correction apparatus irradiates a laser upward onto a defect on a photomask formed on the bottom surface thereof. The particles generated by the laser irradiation is removed by blowing a gas to the space between the bottom surface of the substrate and a window port. The window port has a top flat surface having a central opening and an inner wall having a top portion of a funnel shape and a bottom portion of a cylindrical shape. The gas introduced to the space passes the central opening, forms a spiral flow while increasing the diameter thereof, and is exhausted from gas outlet ports formed on the cylindrical portion.Type: GrantFiled: August 21, 2001Date of Patent: January 13, 2004Assignee: NEC CorporationInventor: Yukio Morishige
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Patent number: 6664524Abstract: The present focusing method is used in a focus detecting apparatus comprising an objective lens, means for entering a luminous flux for focus detection into a target object from a position inconsistent with an optical axis of the objective lens through at least the objective lens, a condenser lens for converging the luminous flux after it is reflected by the target object and again passes through the objective lens, two two-division sensors disposed with the same optical inclination in front of and behind a position where the reflected luminous flux is converged by the condenser lens when a focus of the objective lens is adjusted to the surface of the target object, and a signal processing circuit for performing operational processing of signals from the two two-division sensors. The focus detecting apparatus detects whether the focus of the objective lens is adjusted to the surface of the target object.Type: GrantFiled: February 21, 2001Date of Patent: December 16, 2003Assignee: NEC CorporationInventors: Yukio Ogura, Hideyuki Moribe, Yukio Morishige
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Publication number: 20030217809Abstract: In a laser machining method for removing remaining defects on a photomask, there has been problems to be resolved that damage is formed at the portion of the substrate where the defect has been removed, thus resulting in degraded quality of machining.Type: ApplicationFiled: May 14, 2003Publication date: November 27, 2003Inventor: Yukio Morishige
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Patent number: 6496255Abstract: A sample is rotated about an axis perpendicular to a surface of the sample in predetermined angular steps. The surface of the sample is irradiated with linearly polarized light, and a reflected intensity of light reflected from the surface of the sample is detected in each angular step. Based on a rotational angle dependency of the reflected intensity, the crystal face orientation of the sample is determined. To improve signal-to-noise ratio, the crystal lattice of the sample is excited. Further, the surface of the sample is irradiated with a plurality of linearly polarized light beams to obtain a plurality of reflected intensities.Type: GrantFiled: August 6, 2001Date of Patent: December 17, 2002Assignee: NEC CorporationInventors: Kazumi Sugai, Belgacem Haba, Yukio Morishige
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Publication number: 20020076509Abstract: A thin film forming equipment and a method for forming thin films are provided which are capable of forming the thin film of high quality and of effectively preventing CVD material gas from leaking to surroundings at a low cost. The thin film equipment contains a substrate, a substrate holding device used to hold the substrate and a device used to provide an atmospheric gas to a surface of the substrate held by the substrate holding device, wherein an upper face of the substrate held by the substrate holding device and an upper face of the substrate holding device are almost on one plane.Type: ApplicationFiled: November 21, 2001Publication date: June 20, 2002Applicant: NEC CorporationInventors: Yukio Morishige, Makoto Omiya
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Publication number: 20020047095Abstract: In order to correct a white defect on a surface of a substrate, the substrate is held with the surface facing downward, laser light is upward irradiated at the defect on the surface in material gas, and as a result, the white defect is covered with film.Type: ApplicationFiled: October 19, 2001Publication date: April 25, 2002Applicant: NEC CORPORATIONInventors: Yukio Morishige, Makoto Oomiya
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Publication number: 20020023907Abstract: A laser correction apparatus irradiates a laser upward onto a defect on a photomask formed on the bottom surface thereof. The particles generated by the laser irradiation is removed by blowing a gas to the space between the bottom surface of the substrate and a window port. The window port has a top flat surface having a central opening and an inner wall having a top portion of a funnel shape and a bottom portion of a cylindrical shape. The gas introduced to the space passes the central opening, forms a spiral flow while increasing the diameter thereof, and is exhausted from gas outlet ports formed on the cylindrical portion.Type: ApplicationFiled: August 21, 2001Publication date: February 28, 2002Applicant: NEC CorporationInventor: Yukio Morishige
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Publication number: 20020009843Abstract: A method for repairing a pattern by using a laser and a laser-basedpattern repair apparatus are providedwhich are capable of reducing splashes, rolling-up, and damage to a glass substrate to a minimum in pattern defects repairing processing by removing a thin metal layer such as a chromium layer. A part of a string of pulses obtained by slicing, using an optical shutter, pulses from laser light having a pulse width of 10 ps to 300 ps emitted from a Q-swiched mode-locked pulse laser is used to produce multi-pulses which are divided into two portions in terms of time base correction using an optical delaying unit.Type: ApplicationFiled: July 24, 2001Publication date: January 24, 2002Applicant: NEC CorporationInventors: Yukio Kyusho, Yoichi Yoshino, Yukio Morishige
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Publication number: 20020005952Abstract: A sample is rotated about an axis perpendicular to a surface of the sample in predetermined angular steps. The surface of the sample is irradiated with linearly polarized light, and a reflected intensity of light reflected from the surface of the sample is detected in each angular step. Based on a rotational angle dependency of the reflected intensity, the crystal face orientation of the sample is determined. To improve signal-to-noise ratio, the crystal lattice of the sample is excited. Further, the surface of the sample is irradiated with a plurality of linearly polarized light beams to obtain a plurality of reflected intensities.Type: ApplicationFiled: August 6, 2001Publication date: January 17, 2002Applicant: NEC CorporationInventors: Kazumi Sugai, Belgacem Haba, Yukio Morishige
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Patent number: 6336975Abstract: A thin film forming equipment and a method for forming thin films are provided which are capable of forming the thin film of high quality and of effectively preventing CVD material gas from leaking to surroundings at a low cost. The thin film equipment contains a substrate, a substrate holding device used to hold the substrate and a device used to provide an atmospheric gas to a surface of the substrate held by the substrate holding device, wherein an upper face of the substrate held by the substrate holding device and an upper face of the substrate holding device are almost on one plane.Type: GrantFiled: March 22, 2000Date of Patent: January 8, 2002Assignee: NEC CorporationInventors: Yukio Morishige, Makoto Omiya
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Patent number: 6333130Abstract: Cr(CO)6 gas is fed into a chamber, in which a photomask substrate having any clear deflect resulting from partial loss of a light-shielding film to fill the inside of the chamber with a Cr(CO)6 gas atmosphere. By irradiating with a laser beam the clear defect of the photomask substrate in the Cr(CO)6 gas atmosphere, the Cr(CO)6 gas is decomposed to form a Cr film over the clear defect. Tetrakis dimethylamino titanium gas (TDMAT) is fed into the chamber to switch the atmosphere in the chamber to a TDMAT gas atmosphere. By irradiating with a laser beam the area of the photomask substrate, arranged in the TDMAT gas atmosphere, where the Cr film has been formed, the TDMAT gas is decomposed to form a TiN film, whose reflectance is smaller than that of the Cr film, over the Cr film.Type: GrantFiled: May 24, 2000Date of Patent: December 25, 2001Assignee: NEC CorporationInventor: Yukio Morishige
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Publication number: 20010019100Abstract: The present focusing method is used in a focus detecting apparatus comprising an objective lens, means for entering a luminous flux for focus detection into a target object from a position inconsistent with an optical axis of the objective lens through at least the objective lens, a condenser lens for converging the luminous flux after it is reflected by the target object and again passes through the objective lens, two two-division sensors disposed with the same optical inclination in front of and behind a position where the reflected luminous flux is converged by the condenser lens when a focus of the objective lens is adjusted to the surface of the target object, and a signal processing circuit for performing operational processing of signals from the two two-division sensors. The focus detecting apparatus detects whether the focus of the objective lens is adjusted to the surface of the target object.Type: ApplicationFiled: February 21, 2001Publication date: September 6, 2001Applicant: NEC CorporationInventors: Yukio Ogura, Hideyuki Moribe, Yukio Morishige