Abstract: A method for manufacturing a photomask includes obtaining a substrate on which a halftone film, a light-shielding film, and a resist film are stacked, irradiating a first region of the resist film at a first dose and a second region of the resist film that surrounds the first region at a second dose greater than the first dose, developing the resist film in the first region to form a mask pattern while leaving the resist film in the second region to form a mask frame pattern, and then patterning the light-shielding film using the mask pattern formed in the resist film.

Abstract: A pattern forming method of an embodiment includes: obtaining a height difference of a transfer surface of a substrate to which a pattern is to be transferred; measuring a focus shift tracking amount with respect to the height difference of an exposure apparatus that performs pattern transfer; calculating a difference between the height difference and the tracking amount; forming a photomask provided with an optical path difference corresponding to the difference; and transferring a pattern to the substrate using the photomask.

Abstract: A method for manufacturing a photomask includes obtaining a substrate on which a halftone film, a light-shielding film, and a resist film are stacked, irradiating a first region of the resist film at a first dose and a second region of the resist film that surrounds the first region at a second dose greater than the first dose, developing the resist film in the first region to form a mask pattern while leaving the resist film in the second region to form a mask frame pattern, and then patterning the light-shielding film using the mask pattern formed in the resist film.

Abstract: The substrate storing case includes a base being made of quartz glass, and having a supporting part that is formed on an upper surface thereof and supports a substrate. The substrate storing case includes a top cover being made of quartz glass, and being in contact with the base to cover the substrate on the upper surface of the base. The substrate includes a first absorptive member that absorbs infrared rays and generates heat. The base or the top cover has an intake port that is in communication with a space enclosed by the upper surface of the base and the top cover and is capable of being opened and closed, and an outlet port that is in communication with the space and is capable of being opened and closed.

Abstract: A substrate processing method uses a processing fluid to selectively process only a region of a portion of a processing surface of a substrate to be processed, by causing a discharge aperture and a suction aperture of a nozzle having the discharge aperture and the suction aperture for the processing fluid and provided movable relative to the substrate to be processed to face the processing surface of the substrate and suctioning the processing fluid supplied onto the processing surface through the suction aperture while supplying the processing fluid from the discharge aperture onto the processing surface.