Patents by Inventor Yukio Toriyama

Yukio Toriyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9703199
    Abstract: A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes forming a photosensitive film on the substrate by said first processing unit before exposure processing by said exposure device and applying washing processing to the substrate by supplying a washing liquid to the substrate in said second processing unit after the formation of said photosensitive film and before the exposure processing. The method also includes applying drying processing to the substrate in said second processing unit after the washing processing by said second processing unit and before the exposure processing and applying development processing to the substrate by said third processing unit after the exposure processing. Applying the drying processing to the substrate includes the step of supplying an inert gas onto the substrate, to which the washing liquid is supplied.
    Type: Grant
    Filed: January 7, 2014
    Date of Patent: July 11, 2017
    Assignee: SCREEN Semiconductor Solutions Co., Ltd.
    Inventors: Toru Asano, Yukio Toriyama, Takashi Taguchi, Tsuyoshi Mitsuhashi
  • Publication number: 20140120477
    Abstract: A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes forming a photosensitive film on the substrate by said first processing unit before exposure processing by said exposure device and applying washing processing to the substrate by supplying a washing liquid to the substrate in said second processing unit after the formation of said photosensitive film and before the exposure processing. The method also includes applying drying processing to the substrate in said second processing unit after the washing processing by said second processing unit and before the exposure processing and applying development processing to the substrate by said third processing unit after the exposure processing. Applying the drying processing to the substrate includes the step of supplying an inert gas onto the substrate, to which the washing liquid is supplied.
    Type: Application
    Filed: January 7, 2014
    Publication date: May 1, 2014
    Inventors: Shuichi Yasuda, Masashi Kanaoka, Koji Kaneyama, Tadashi Miyagi, Kazuhito Shigemori, Toru Asano, Yukio Toriyama, Takashi Taguchi, Tsuyoshi Mitsuhashi, Tsuyoshi Okumura
  • Patent number: 8585830
    Abstract: A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes the steps of: forming a photosensitive film made of a photosensitive material on the substrate by said first processing unit before exposure processing by said exposure device. The method also includes applying washing processing to the substrate by said second processing unit after the formation of said photosensitive film by said first processing unit and before the exposure processing by said exposure device and transporting the substrate after the washing processing to said exposure device. The method further includes transporting the substrate from said exposure device and applying development processing by said third processing unit to the substrate transported after the exposure processing by said exposure device.
    Type: Grant
    Filed: February 2, 2010
    Date of Patent: November 19, 2013
    Assignee: Sokudo Co., Ltd.
    Inventors: Shuichi Yasuda, Masashi Kanaoka, Koji Kaneyama, Tadashi Miyagi, Kazuhito Shigemori, Toru Asano, Yukio Toriyama, Takashi Taguchi, Tsuyoshi Mitsuhashi, Tsuyoshi Okumura
  • Patent number: 8040488
    Abstract: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a processing block for liquid immersion exposure processing, and an interface block. An exposure device is arranged adjacent to the interface block. The processing block for liquid immersion exposure processing comprises a coating processing group for resist cover film and a removal processing group for resist cover film. The resist cover film is formed in the processing block for liquid immersion exposure processing before the exposure processing. The resist cover film is removed in the processing block for liquid immersion exposure processing after the exposure processing.
    Type: Grant
    Filed: December 6, 2005
    Date of Patent: October 18, 2011
    Assignee: Sokudo Co., Ltd.
    Inventors: Shuichi Yasuda, Masashi Kanaoka, Koji Kaneyama, Tadashi Miyagi, Kazuhito Shigemori, Toru Asano, Yukio Toriyama, Takashi Taguchi, Tsuyoshi Mitsuhashi, Tsuyoshi Okumura
  • Publication number: 20100136257
    Abstract: A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes forming a photosensitive film on the substrate by said first processing unit before exposure processing by said exposure device and applying washing processing to the substrate by supplying a washing liquid to the substrate in said second processing unit after the formation of said photosensitive film and before the exposure processing. The method also includes applying drying processing to the substrate in said second processing unit after the washing processing by said second processing unit and before the exposure processing and applying development processing to the substrate by said third processing unit after the exposure processing. Applying the drying processing to the substrate includes the step of supplying an inert gas onto the substrate, to which the washing liquid is supplied.
    Type: Application
    Filed: February 2, 2010
    Publication date: June 3, 2010
    Applicant: Sokudo Co., Ltd.
    Inventors: Shuichi Yasuda, Masashi Kanaoka, Koji Kaneyama, Tadashi Miyagi, Kazuhito Shigemori, Toru Asano, Yukio Toriyama, Takashi Taguchi, Tsuyoshi Mitsuhashi, Tsuyoshi Okumura
  • Publication number: 20100136492
    Abstract: A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes the steps of: forming a photosensitive film made of a photosensitive material on the substrate by said first processing unit before exposure processing by said exposure device. The method also includes applying washing processing to the substrate by said second processing unit after the formation of said photosensitive film by said first processing unit and before the exposure processing by said exposure device and transporting the substrate after the washing processing to said exposure device. The method further includes transporting the substrate from said exposure device and applying development processing by said third processing unit to the substrate transported after the exposure processing by said exposure device.
    Type: Application
    Filed: February 2, 2010
    Publication date: June 3, 2010
    Applicant: Sokudo Co., Ltd.
    Inventors: Shuichi Yasuda, Masashi Kanaoka, Koji Kaneyama, Tadashi Miyagi, Kazuhito Shigemori, Toru Asano, Yukio Toriyama, Takashi Taguchi, Tsuyoshi Mitsuhashi, Tsuyoshi Okumura
  • Publication number: 20100129526
    Abstract: A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes the steps of forming a film made of a photosensitive material on the substrate by said first processing unit before exposure processing by said exposure device.
    Type: Application
    Filed: February 2, 2010
    Publication date: May 27, 2010
    Applicant: Sokudo Co., Ltd.
    Inventors: Shuichi Yasuda, Masashi Kanaoka, Koji Kaneyama, Tadashi Miyagi, Kazuhito Shigemori, Toru Asano, Yukio Toriyama, Takashi Taguchi, Tsuyoshi Mitsuhashi, Tsuyoshi Okumura
  • Publication number: 20060159449
    Abstract: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a drying processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The drying processing block comprises a drying processing group. The interface block comprises an interface transport mechanism. A substrate is subjected to exposure processing by the exposure device, and subsequently transported to the drying processing group by the interface transport mechanism. The substrate is subjected to cleaning and drying processing by the drying processing group.
    Type: Application
    Filed: December 6, 2005
    Publication date: July 20, 2006
    Inventors: Shuichi Yasuda, Masashi Kanaoka, Koji Kaneyama, Tadashi Miyagi, Kazuhito Shigemori, Toru Asano, Yukio Toriyama, Takashi Taguchi, Tsuyoshi Mitsuhashi, Tsuyoshi Okumura
  • Publication number: 20060152694
    Abstract: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a washing processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The washing processing block comprises washing processing group. A resist film is formed in the resist film processing block. Before the substrate is subjected to exposure processing by the exposure device, the substrate is subjected to washing and drying processing in the washing processing group.
    Type: Application
    Filed: December 6, 2005
    Publication date: July 13, 2006
    Inventors: Shuichi Yasuda, Masashi Kanaoka, Koji Kaneyama, Tadashi Miyagi, Kazuhito Shigemori, Toru Asano, Yukio Toriyama, Takashi Taguchi, Tsuyoshi Mitsuhashi, Tsuyoshi Okumura
  • Publication number: 20060152693
    Abstract: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a processing block for liquid immersion exposure processing, and an interface block. An exposure device is arranged adjacent to the interface block. The processing block for liquid immersion exposure processing comprises a coating processing group for resist cover film and a removal processing group for resist cover film. The resist cover film is formed in the processing block for liquid immersion exposure processing before the exposure processing. The resist cover film is removed in the processing block for liquid immersion exposure processing after the exposure processing.
    Type: Application
    Filed: December 6, 2005
    Publication date: July 13, 2006
    Inventors: Shuichi Yasuda, Masashi Kanaoka, Koji Kaneyama, Tadashi Miyagi, Kazuhito Shigemori, Toru Asano, Yukio Toriyama, Takashi Taguchi, Tsuyoshi Mitsuhashi, Tsuyoshi Okumura
  • Publication number: 20060147202
    Abstract: A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a washing/development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. A resist film is formed on a substrate by the resist film processing block. The substrate is washed and dried by the washing processing unit in the washing/development processing block before the substrate is subjected to the exposure processing by the exposure device.
    Type: Application
    Filed: December 6, 2005
    Publication date: July 6, 2006
    Inventors: Shuichi Yasuda, Masashi Kanaoka, Koji Kaneyama, Tadashi Miyagi, Kazuhito Shigemori, Toru Asano, Yukio Toriyama, Takashi Taguchi, Tsuyoshi Mitsuhashi, Tsuyoshi Okumura
  • Publication number: 20060147201
    Abstract: An interface transport mechanism employs an upper hand during the transport of a substrate to an exposure device, and employs a lower hand during the transport of the substrate that has been carried out of the exposure device. A fifth central robot employs a lower hand during the transport of a substrate after the exposure processing by an exposure device, and employs an upper hand during the transport of a substrate after the drying processing that has been carried out of a drying processing group. That is, the upper hand is employed to transport a substrate to which no liquid is attached, and the lower hand is employed to transport a substrate to which a liquid is attached after the exposure processing.
    Type: Application
    Filed: December 6, 2005
    Publication date: July 6, 2006
    Inventors: Toru Asano, Yukio Toriyama, Takashi Taguchi, Tsuyoshi Mitsuhashi, Koji Kaneyama, Tsuyoshi Okumura