Patents by Inventor Yukiya Wakisaka

Yukiya Wakisaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Resins for resists and chemically amplifiable resist compositions
    Patent number: 6927011
    Abstract: A resist resin containing a monomer unit selected from the group comprising a monomer unit represented by Formula (II): wherein a substituent R3 represents an alkyl group, or a functional group comprising an acid-deprotectable protecting group, m representing the number of R3 is 0 (non-substitution), 1, 2 or more, R3 may be different from each other, provided that m is 2 or more, and n represents an integer of 0 to 4, has no rough spots on the surface after etching and so has good dry etching resistance, and therefore the resist resin is preferably used as a photo resist for DUV.
    Type: Grant
    Filed: February 9, 2001
    Date of Patent: August 9, 2005
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Tadayuki Fujiwara, Yukiya Wakisaka, Toru Tokimitsu, Naoshi Murata, Yoshihiro Kamon, Hikaru Momose
  • Chemical amplification resist composition
    Patent number: 6887646
    Abstract: The present invention discloses a chemically amplified resist composition comprising: a resin which becomes soluble in an aqueous alkali solution in the presence of an acid, a photo acid generator, and an amine derivative which shows, in water of 25° C., such a basicity as to form a conjugate acid and has a medium polarity. The amine derivative acts as a quencher. Therefore, the chemically amplified resist composition of the present invention enables formation of a very precise and fine resist pattern and can be suitably used particularly in a lithography using an ArF excimer laser beam.
    Type: Grant
    Filed: July 11, 2000
    Date of Patent: May 3, 2005
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Tadayuki Fujiwara, Yukiya Wakisaka, Masayuki Tooyama
  • Copolymer, process for producing the same, and resist composition
    Patent number: 6706826
    Abstract: The present invention relates to a copolymer for use in paints, resists, and the like; a method for manufacturing the same; and a resist composition using the same. The copolymer according to the present invention is obtained by means of polymerizing at least one monomer containing an alicyclic structure and one monomer containing a lactone structure, and the distribution of the copolymer composition of said monomer containing a lactone structure in said copolymer is in the range of −10 to +10 mol % of the average copolymer composition of said monomer containing a lactone structure in said entire copolymer. In addition, the copolymer according to the present invention is obtained by means of polymerizing a monomer containing an alicyclic structure, a monomer containing a lactone structure, and another vinyl monomer comprising a higher polarity than said monomer containing an alicyclic structure, but a lower polarity than said monomer containing a lactone structure.
    Type: Grant
    Filed: September 27, 2000
    Date of Patent: March 16, 2004
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Tadayuki Fujiwara, Masayuki Tooyama, Yukiya Wakisaka, Koji Nishida, Akira Yanagase
  • Photocurable sheet, moldings thereof, and processes for producing the same
    Patent number: 6630246
    Abstract: A photocuring sheet wherein a photocuring resin composition (A) comprising an acrylic resin with a photopolymerizable functional group on the side chains (a-1) and a photopolymerization initiator (a-2), is laminated on a transparent base sheet (B), photocuring decorative sheets and photocuring insert molding sheets employing it, and molded articles and a process for their manufacture, in which the sheets are used.
    Type: Grant
    Filed: September 5, 2000
    Date of Patent: October 7, 2003
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Akira Yanagase, Tadayuki Fujiwara, Yoko Kakuno, Yukiya Wakisaka
  • Resins for resists and chemically amplifiable resist compositions
    Publication number: 20030148214
    Abstract: A resist resin containing a monomer unit selected from the group consisting of the following Formulas (I) and (II): 1
    Type: Application
    Filed: January 13, 2003
    Publication date: August 7, 2003
    Inventors: Tadayuki Fujiwara, Yukiya Wakisaka, Toru Tokimitsu, Naoshi Murata, Yoshihiro Kamon, Hikaru Momose