Patents by Inventor Yukiyoshi ARAMAKI

Yukiyoshi ARAMAKI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma processing apparatus
    Patent number: 10504698
    Abstract: A plasma processing apparatus is provided that is configured to supply a gas into a chamber, generate a plasma from the gas using a power of an electromagnetic wave, and perform a predetermined plasma process on a substrate that is held by a mounting table. The plasma processing apparatus includes a dielectric window through which the electromagnetic wave that is output from an electromagnetic wave generator is propagated and transmitted into the chamber, a support member that supports the dielectric window, a partition member that separates a space where the support member is arranged from a plasma generation space and includes a protrusion abutting against the dielectric window, and a conductive member that is arranged between the partition member and the dielectric window and is protected from being exposed to the plasma generation space by the protrusion.
    Type: Grant
    Filed: September 29, 2015
    Date of Patent: December 10, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Masayuki Kohno, Ryou Son, Naoki Matsumoto, Jun Yoshikawa, Michitaka Aita, Ippei Shimizu, Yusuke Yoshida, Koji Koyama, Masami Sudayama, Yukiyoshi Aramaki
  • PLASMA PROCESSING APPARATUS
    Publication number: 20160118224
    Abstract: A plasma processing apparatus is provided that is configured to supply a gas into a chamber, generate a plasma from the gas using a power of an electromagnetic wave, and perform a predetermined plasma process on a substrate that is held by a mounting table. The plasma processing apparatus includes a dielectric window through which the electromagnetic wave that is output from an electromagnetic wave generator is propagated and transmitted into the chamber, a support member that supports the dielectric window, a partition member that separates a space where the support member is arranged from a plasma generation space and includes a protrusion abutting against the dielectric window, and a conductive member that is arranged between the partition member and the dielectric window and is protected from being exposed to the plasma generation space by the protrusion.
    Type: Application
    Filed: September 29, 2015
    Publication date: April 28, 2016
    Inventors: Masayuki KOHNO, Ryou SON, Naoki MATSUMOTO, Jun YOSHIKAWA, Michitaka AITA, Ippei SHIMIZU, Yusuke YOSHIDA, Koji KOYAMA, Masami SUDAYAMA, Yukiyoshi ARAMAKI