Patents by Inventor Yuko HORIBA

Yuko HORIBA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate cleaning solution, and using the same, method for manufacturing cleaned substrate and method for manufacturing device
    Patent number: 12068150
    Abstract: [Problem] To obtain a substrate cleaning solution capable of cleaning a substrate and removing particles. [Means for Solution] The present invention is a substrate cleaning solution comprising an insoluble or hardly soluble solute (A), a soluble solute (B), and a solvent (C).
    Type: Grant
    Filed: December 12, 2019
    Date of Patent: August 20, 2024
    Assignee: Merck Patent GmbH
    Inventors: Takafumi Kinuta, Tatsuro Nagahara, Yuko Horiba
  • Substrate pattern filling composition and use of the same
    Patent number: 11859152
    Abstract: To provide a substrate pattern filling composition capable of suppressing pattern collapse and a method for using the same. A substrate pattern filling composition comprising a first solute (A), a second a solute (B) and a solvent (C), and a method for using the same.
    Type: Grant
    Filed: April 15, 2020
    Date of Patent: January 2, 2024
    Assignee: Merck Patent GmbH
    Inventors: Yuko Horiba, Hiroko Kuboki, Tatsuro Nagahara
  • SUBSTRATE PATTERN FILLING COMPOSITION AND USE OF THE SAME
    Publication number: 20220213415
    Abstract: To provide a substrate pattern filling composition capable of suppressing pattern collapse and a method for using the same. A substrate pattern filling composition comprising a first solute (A), a second a solute (B) and a solvent (C), and a method for using the same.
    Type: Application
    Filed: April 15, 2020
    Publication date: July 7, 2022
    Inventors: Yuko HORIBA, Hiroko KUBOKI, Tasuro NAGAHARA
  • SUBSTRATE CLEANING SOLUTION AND METHOD FOR MANUFACTURING DEVICE
    Publication number: 20220056383
    Abstract: To obtain a substrate cleaning solution capable of cleaning a substrate and removing particles. The present invention is a substrate cleaning solution comprising a polymer (A), an alkaline component (B), and a solvent (C), provided that the alkaline component (B) does not comprise ammonia.
    Type: Application
    Filed: December 11, 2019
    Publication date: February 24, 2022
    Inventors: Takafumi KINUTA, Tatsuro NAGAHARA, Yuko HORIBA
  • SUBSTRATE CLEANING SOLUTION, AND USING THE SAME, METHOD FOR MANUFACTURING CLEANED SUBSTRATE AND METHOD FOR MANUFACTURING DEVICE
    Publication number: 20220059344
    Abstract: [Problem] To obtain a substrate cleaning solution capable of cleaning a substrate and removing particles. [Means for Solution] The present invention is a substrate cleaning solution comprising an insoluble or hardly soluble solute (A), a soluble solute (B), and a solvent (C).
    Type: Application
    Filed: December 12, 2019
    Publication date: February 24, 2022
    Inventors: Takafumi KINUTA, Tatsuro NAGAHARA, Yuko HORIBA