Patents by Inventor Yuko Kariya

Yuko Kariya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130055038
    Abstract: According to the present invention, a computing unit abnormality determining apparatus is disclosed which determines whether there is an abnormality in a computing unit, comprising a comparison operation abnormality determining part configured to perform a comparison operation using the computing unit to determine whether there is an abnormality in the comparison operation; and an arithmetic/logical operation abnormality determining part configured to perform an arithmetic/logical operation of a predetermined operational expression using the computing unit, the predetermined operational expression including at least one of an arithmetic operation and a logical operation, and compare an operational result obtained by the arithmetic/logical operation with a corresponding stored value of a correct value to determine whether there is an abnormality in the arithmetic/logical operation.
    Type: Application
    Filed: May 12, 2010
    Publication date: February 28, 2013
    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Munenori Nakamura, Yuko Kariya
  • Patent number: 8209135
    Abstract: A defect detected by a wafer inspection tool is reliably captured by a defect review tool. A defect review condition in the defect review tool is varied depending on defect attributes provided by the wafer inspection tool so as to optimize the review process. For example, review magnification is varied depending on the size of the defect, or the frame addition number is varied depending on the maximum gray level difference.
    Type: Grant
    Filed: March 4, 2011
    Date of Patent: June 26, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Tomohiro Funakoshi, Junko Konishi, Yuko Kariya, Noritsugu Takahashi, Fumiaki Endo
  • Publication number: 20110211060
    Abstract: A defect detected by a wafer inspection tool is reliably captured by a defect review tool. A defect review condition in the defect review tool is varied depending on defect attributes provided by the wafer inspection tool so as to optimize the review process. For example, review magnification is varied depending on the size of the defect, or the frame addition number is varied depending on the maximum gray level difference.
    Type: Application
    Filed: March 4, 2011
    Publication date: September 1, 2011
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Tomohiro FUNAKOSHI, Junko KONISHI, Yuko KARIYA, Noritsugu TAKAHASHI, Fumiaki ENDO
  • Publication number: 20070105245
    Abstract: A defect detected by a wafer inspection tool is reliably captured by a defect review tool. A defect review condition in the defect review tool is varied depending on defect attributes provided by the wafer inspection tool so as to optimize the review process. For example, review magnification is varied depending on the size of the defect, or the frame addition number is varied depending on the maximum gray level difference.
    Type: Application
    Filed: November 9, 2006
    Publication date: May 10, 2007
    Inventors: Tomohiro Funakoshi, Junko Konishi, Yuko Kariya, Noritsugu Takahashi, Fumiaki Endo