Patents by Inventor Yuko Kono

Yuko Kono has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210027457
    Abstract: A semiconductor image processing apparatus has an image input unit inputs a first semiconductor image, an exposure condition input unit configured to input exposure conditions, a generator performs a process of extracting a feature amount in consideration of the exposure conditions while reducing resolution of the first semiconductor image and thereafter use the extracted feature amount to increase the resolution to generate a second semiconductor image, and a discriminator configured to discriminate whether the input image is the second semiconductor image or a third semiconductor image provided in advance. The generator performs learning so that the discriminator erroneously discriminates the second semiconductor image as the third semiconductor image based on a result discriminated by the discriminator.
    Type: Application
    Filed: July 20, 2020
    Publication date: January 28, 2021
    Applicant: Kioxia Corporation
    Inventors: Atsushi NAKAJIMA, Youyang NG, Yuko Kono, Takuji Ohashi, Chihiro Ida
  • Patent number: 9698157
    Abstract: A microstructure body according to an embodiment includes a stacked body. The stacked body includes a plurality of unit structure bodies stacked periodically along a first direction. A configuration of an end portion of the stacked body in a second direction is a stairstep configuration including terraces formed every unit structure body. The second direction intersects the first direction. A first distance in a third direction between end edges of two of the unit structure bodies facing the third direction is shorter than a second distance in the second direction between end edges of the two of the unit structure bodies facing the second direction. The third direction intersects both the first direction and the second direction.
    Type: Grant
    Filed: August 25, 2015
    Date of Patent: July 4, 2017
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yuko Kono, Takaki Hashimoto, Yuji Setta, Toshiya Kotani, Chikaaki Kodama
  • Publication number: 20160268278
    Abstract: A microstructure body according to an embodiment includes a stacked body. The stacked body includes a plurality of unit structure bodies stacked periodically along a first direction. A configuration of an end portion of the stacked body in a second direction is a stairstep configuration including terraces formed every unit structure body. The second direction intersects the first direction. A first distance in a third direction between end edges of two of the unit structure bodies facing the third direction is shorter than a second distance in the second direction between end edges of the two of the unit structure bodies facing the second direction. The third direction intersects both the first direction and the second direction.
    Type: Application
    Filed: August 25, 2015
    Publication date: September 15, 2016
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Yuko KONO, Takaki Hashimoto, Yuji Setta, Toshiya Kotani, Chikaaki Kodama
  • Patent number: 9257367
    Abstract: According to one embodiment, a method for producing a mask layout of an exposure mask for forming wiring of an integrated circuit device, includes estimating shape of the wiring formed based on an edge of a pattern included in an initial layout of the exposure mask. The method includes modifying shape of the edge if the estimated shape of the wiring does not satisfy a requirement.
    Type: Grant
    Filed: August 19, 2013
    Date of Patent: February 9, 2016
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Motohiro Okada, Shuhei Sota, Takaki Hashimoto, Yasunobu Kai, Kazuyuki Masukawa, Yuko Kono, Chikaaki Kodama, Taiga Uno, Hiromitsu Mashita
  • Publication number: 20150263026
    Abstract: According to one embodiment, a semiconductor device includes: a substrate including silicon; and a first element provided on the substrate and extending in a thickness direction of the substrate, a center position of an end face on the substrate side of the first element and a center position of an end face on an opposite side of the substrate side of the first element being different in a direction parallel to a major surface of the substrate.
    Type: Application
    Filed: July 25, 2014
    Publication date: September 17, 2015
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Yuko KONO, Ai Inoue, Toshiya Kotani, Chikaaki Kodama, Yasunobu Kai, Sadatoshi Murakami
  • Patent number: 9086634
    Abstract: According to one embodiment, a production method for a mask layout of an exposure mask includes evaluating a candidate layout by comparison between an imaged image group and a reference image group. The imaged image group is composed of a plurality of imaged images of patterns formed by performing lithography under a plurality of levels of exposure condition using the candidate layout. The reference image group is composed of a plurality of reference images produced by simulation on assumption of a plurality of levels of the exposure condition.
    Type: Grant
    Filed: August 29, 2013
    Date of Patent: July 21, 2015
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yuko Kono, Kazuyuki Masukawa, Toshiya Kotani, Chikaaki Kodama, Yasunobu Kai
  • Publication number: 20140252639
    Abstract: According to one embodiment, a method for producing a mask layout of an exposure mask for forming wiring of an integrated circuit device, includes estimating shape of the wiring formed based on an edge of a pattern included in an initial layout of the exposure mask. The method includes modifying shape of the edge if the estimated shape of the wiring does not satisfy a requirement.
    Type: Application
    Filed: August 19, 2013
    Publication date: September 11, 2014
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Motohiro OKADA, Shuhei SOTA, Takaki HASHIMOTO, Yasunobu KAI, Kazuyuki MASUKAWA, Yuko KONO, Chikaaki KODAMA, Taiga UNO, Hiromitsu MASHITA
  • Publication number: 20140242498
    Abstract: According to one embodiment, a production method for a mask layout of an exposure mask includes evaluating a candidate layout by comparison between an imaged image group and a reference image group. The imaged image group is composed of a plurality of imaged images of patterns formed by performing lithography under a plurality of levels of exposure condition using the candidate layout. The reference image group is composed of a plurality of reference images produced by simulation on assumption of a plurality of levels of the exposure condition.
    Type: Application
    Filed: August 29, 2013
    Publication date: August 28, 2014
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Yuko Kono, Kazuyuki Masukawa, Toshiya Kotani, Chikaaki Kodama, Yasunobu Kai
  • Patent number: 7794899
    Abstract: A photo mask formed with patterns to be transferred to a substrate using an exposure apparatus, the photo mask comprising a pattern row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, and an assist pattern surrounded by the shielding portion or semitransparent film and having a longitudinal direction and a latitudinal direction, the assist pattern being located at a specified distance from the pattern row in a direction orthogonal to the one direction, the longitudinal direction of the assist pattern being substantially parallel with the one direction, the longitudinal length of the assist pattern being equivalent to or larger than the longitudinal length of the pattern row, the assist pattern being not transferred to the substrate.
    Type: Grant
    Filed: May 9, 2008
    Date of Patent: September 14, 2010
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Koji Hashimoto, Tadahito Fujisawa, Yuko Kono, Takashi Obara
  • Patent number: 7662523
    Abstract: A photo mask formed with patterns to be transferred to a substrate using an exposure apparatus, the photo mask comprising a pattern row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, and an assist pattern surrounded by the shielding portion or semitransparent film and having a longitudinal direction and a latitudinal direction, the assist pattern being located at a specified distance from the pattern row in a direction orthogonal to the one direction, the longitudinal direction of the assist pattern being substantially parallel with the one direction, the longitudinal length of the assist pattern being equivalent to or larger than the longitudinal length of the pattern row, the assist pattern being not transferred to the substrate.
    Type: Grant
    Filed: May 9, 2008
    Date of Patent: February 16, 2010
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Koji Hashimoto, Tadahito Fujisawa, Yuko Kono, Takashi Obara
  • Publication number: 20080220377
    Abstract: A photo mask formed with patterns to be transferred to a substrate using an exposure apparatus, the photo mask comprising a pattern row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, and an assist pattern surrounded by the shielding portion or semitransparent film and having a longitudinal direction and a latitudinal direction, the assist pattern being located at a specified distance from the pattern row in a direction orthogonal to the one direction, the longitudinal direction of the assist pattern being substantially parallel with the one direction, the longitudinal length of the assist pattern being equivalent to or larger than the longitudinal length of the pattern row, the assist pattern being not transferred to the substrate.
    Type: Application
    Filed: May 9, 2008
    Publication date: September 11, 2008
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Koji Hashimoto, Tadahito Fujisawa, Yuko Kono, Takashi Obara
  • Publication number: 20080222597
    Abstract: A photo mask formed with patterns to be transferred to a substrate using an exposure apparatus, the photo mask comprising a pattern row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, and an assist pattern surrounded by the shielding portion or semitransparent film and having a longitudinal direction and a latitudinal direction, the assist pattern being located at a specified distance from the pattern row in a direction orthogonal to the one direction, the longitudinal direction of the assist pattern being substantially parallel with the one direction, the longitudinal length of the assist pattern being equivalent to or larger than the longitudinal length of the pattern row, the assist pattern being not transferred to the substrate.
    Type: Application
    Filed: May 9, 2008
    Publication date: September 11, 2008
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Koji Hashimoto, Tadashito Fujisawa, Yuko Kono, Takashi Obara
  • Patent number: 7384712
    Abstract: A photo mask formed with patterns to be transferred to a substrate using an exposure apparatus, the photo mask comprising a pattern row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, and an assist pattern surrounded by the shielding portion or semitransparent film and having a longitudinal direction and a latitudinal direction, the assist pattern being located at a specified distance from the pattern row in a direction orthogonal to the one direction, the longitudinal direction of the assist pattern being substantially parallel with the one direction, the longitudinal length of the assist pattern being equivalent to or larger than the longitudinal length of the pattern row, the assist pattern being not transferred to the substrate.
    Type: Grant
    Filed: April 28, 2004
    Date of Patent: June 10, 2008
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Koji Hashimoto, Tadahito Fujisawa, Yuko Kono, Takashi Obara
  • Publication number: 20050003305
    Abstract: A photo mask formed with patterns to be transferred to a substrate using an exposure apparatus, the photo mask comprising a pattern row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, and an assist pattern surrounded by the shielding portion or semitransparent film and having a longitudinal direction and a latitudinal direction, the assist pattern being located at a specified distance from the pattern row in a direction orthogonal to the one direction, the longitudinal direction of the assist pattern being substantially parallel with the one direction, the longitudinal length of the assist pattern being equivalent to or larger than the longitudinal length of the pattern row, the assist pattern being not transferred to the substrate.
    Type: Application
    Filed: April 28, 2004
    Publication date: January 6, 2005
    Inventors: Koji Hashimoto, Tadahito Fujisawa, Yuko Kono, Takashi Obara