Abstract: A photosensitive resin composition is disclosed.The photosensitive resin composition is characterized by containing (a) a reaction product of a polymer having a specific segment with (3,4-epoxycylohexyl)-methyl methacrylate, (b) a polymerization initiator allowing the initiation of the polymerization of said reaction product when irradiated with an actinic radiation, and (c) a solvent. Preferably, the composition further contains (d) a thermal crosslinker, a compound having a polymerizable unsaturated bond and/or a pigment in addition to the above ingredients.

Abstract: A radiation-sensitive mixture for use in the production of semiconductor elements, which has high sensitivity and high resolution, which can be developed by an aqueous alkaline solution, and which is based on a novel concept in that a stable acid latent image is controlled by using a radiation-decomposable base.The mixture is characterized by comprising as essential components a) a binder which is insoluble in water but soluble in an aqueous alkaline solution; b.sup.1) a compound having at least one bond which can be cleaved by an acid, or b.sup.2) a compound having at least one bond which is crosslinked with the compound a) by an acid; c) a compound which generates an acid when irradiated; and d) a basic iodonium compound.

Abstract: A colored, photosensitive resin composition of a pigment dispersing-type is disclosed.The colored, photosensitive resin composition is characterized by containing (a) a polymer having alcohlic or phenolic hydroxyl groups, (b) a compound capable of producing a nitrene when irradiated with an actinic radiation, (c) a pigment, and (d) a solvent. Preferably, the composition further contains (e) a heat crosslinking agent and/or (f) a compound having a polymerizable double bond in addition to the above ingredients.According to the present invention, the production of a color filter need not be performed in an inert gas atmosphere, does not require an oxygen barrier film and does not require heating during the period of from the exposure step to the development step. Thus, the use of the composition permits the color filter production steps to be made significantly simple so that the composition provides a great value in industrial utilization.

Abstract: A chemically amplified radiation sensitive composition comprising: (a) a copolymer such as poly(4-hydroxystyrene-co-styrene), (b) a dissolution inhibitor such as polyacetal or (b') a crosslinking agent, (c) a radiation sensitive compound capable of generating an acid upon exposure to actinic radiation, (d) a radiation sensitive base capable of stabilizing the width of lines throughout steps from exposure to post-exposure bake treatment, and (e) a solvent for dissolving the components (a) to (d), can realize fine lines and spaces down to 0.22 microns, for example, using KrF laser, and possesses excellent heat and etch resistance and adhesiveness to substrates, and produces patterns with low standing waves arising due to substrate reflectiveness of exposed light.