Patents by Inventor Yuko Ono

Yuko Ono has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12208625
    Abstract: Provided is an image processing device coupled to a printing device that performs printing on a medium by ejecting ink having a plurality of colors, and configured to convert image data into ink amount data. The image processing device includes: an input unit configured to input a search condition; an acquisition unit configured to acquire a plurality of search values based on the search condition input by the input unit; a table storage unit storing a plurality of image conversion tables for converting the image data into the ink amount data; and a search unit configured to search the plurality of image conversion tables for a target image conversion table based on the plurality of search values acquired by the acquisition unit.
    Type: Grant
    Filed: November 8, 2022
    Date of Patent: January 28, 2025
    Assignee: Seiko Epson Corporation
    Inventors: Katsuyuki Tanaka, Takuya Ono, Yuko Yamamoto, Takumi Shimomukai, Shotaro Matsuda
  • Patent number: 10016481
    Abstract: An object of the present invention is to provide a safety sensation-improving agent that can improve dulled peripheral sensations through daily ingestion or application to the skin. Another object of the present invention is to provide a sensation-improving food, beverage, feed, or cosmetics that can improve dulled peripheral sensations through oral ingestion or application to the skin. A sensation-improving agent containing a milk-derived protein and/or a hydrolysate therefrom as an active ingredient is provided. The milk-derived protein and/or the hydrolysate therefrom can be orally ingested or applied direct to the skin to improve dulled sensations, particularly peripheral sensations, and be formed into a sensation-improving food, beverage, feed, or cosmetics.
    Type: Grant
    Filed: October 2, 2015
    Date of Patent: July 10, 2018
    Assignee: MEGMILK SNOW BRAND CO., LTD.
    Inventors: Ken Katoh, Hiroshi Ueno, Yuko Ono, Noriko Ueda, Toshiya Kobayashi, Takahiro Moriya, Yutaro Obara
  • Patent number: 9884095
    Abstract: A skin sensitivity improving agent which is safe and, when routinely taken or applied to the skin, exerts an effect of improving deterioration in peripheral sensation is provided. The present invention also provides a food, a drink, a feed or a cosmetic for improving sensation which exerts an effect of improving deterioration in peripheral sensation when orally taken or applied to the skin. The skin sensitivity improving agent includes, as the active ingredient, a basic protein fraction derived from milk or a degraded basic protein fraction derived from milk. By orally taking the basic protein fraction derived from milk or the degraded basic protein fraction derived from milk or applying the same directly to the skin, deterioration in sensation, in particular, peripheral sensation can be improved. Thus, a food, a drink, a feed or a cosmetic for improving sensation can be obtained.
    Type: Grant
    Filed: September 10, 2015
    Date of Patent: February 6, 2018
    Assignee: MEGMILK SNOW BRAND CO., LTD.
    Inventors: Ken Katoh, Noriko Ueda, Hiroshi Ueno, Yuko Ono, Norimichi Nakahata, Takahiro Moriya, Daisaku Kobayashi
  • Patent number: 9255123
    Abstract: The invention addresses the problem of providing a skin-beautifying agent with beautifying effects such as skin moisturizing, skin beautification, prevention of rough skin, wrinkle prevention, prevention of reduced elasticity, etc., and a skin-beautifying product such as a cosmetic, food or drink, feed, medicine, etc. that contains said skin-beautifying agent. The skin-beautifying agent is characterized in containing a hydrolyzate of whey protein as an active ingredient. Using a whey protein hydrolyzate having the characteristics of a molecular weight distribution of 10 kDa or less, a main peak of 200 Da-3 kDa, APL (average peptide length) of 2-8, free amino acid content of 20% or less, and a ?-lactoglobulin antigenicity of 1/10,000 or less, in particular, provides a skin-beautifying agent of low allergenicity and low bitterness.
    Type: Grant
    Filed: March 7, 2012
    Date of Patent: February 9, 2016
    Assignee: MEGMILK SNOW BRAND CO., LTD.
    Inventors: Ken Katoh, Hiroshi Ueno, Yuko Ono, Noriko Ueda
  • Publication number: 20160022771
    Abstract: An object of the present invention is to provide a safety sensation-improving agent that can improve dulled peripheral sensations through daily ingestion or application to the skin. Another object of the present invention is to provide a sensation-improving food, beverage, feed, or cosmetics that can improve dulled peripheral sensations through oral ingestion or application to the skin. A sensation-improving agent containing a milk-derived protein and/or a hydrolysate therefrom as an active ingredient is provided. The milk-derived protein and/or the hydrolysate therefrom can be orally ingested or applied direct to the skin to improve dulled sensations, particularly peripheral sensations, and be formed into a sensation-improving food, beverage, feed, or cosmetics.
    Type: Application
    Filed: October 2, 2015
    Publication date: January 28, 2016
    Applicant: MEGMILK SNOW BRAND CO., LTD.
    Inventors: Ken KATOH, Hiroshi UENO, Yuko ONO, Noriko UEDA, Toshiya KOBAYASHI, Takahiro MORIYA, Yutaro OBARA
  • Publication number: 20150374797
    Abstract: A skin sensitivity improving agent which is safe and, when routinely taken or applied to the skin, exerts an effect of improving deterioration in peripheral sensation is provided. The present invention also provides a food, a drink, a feed or a cosmetic for improving sensation which exerts an effect of improving deterioration in peripheral sensation when orally taken or applied to the skin. The skin sensitivity improving agent includes, as the active ingredient, a basic protein fraction derived from milk or a degraded basic protein fraction derived from milk. By orally taking the basic protein fraction derived from milk or the degraded basic protein fraction derived from milk or applying the same directly to the skin, deterioration in sensation, in particular, peripheral sensation can be improved. Thus, a food, a drink, a feed or a cosmetic for improving sensation can be obtained.
    Type: Application
    Filed: September 10, 2015
    Publication date: December 31, 2015
    Applicant: MEGMILK SNOW BRAND CO., LTD.
    Inventors: Ken KATOH, Noriko UEDA, Hiroshi UENO, Yuko ONO, Norimichi NAKAHATA, Takahiro MORIYA, Daisaku KOBAYASHI
  • Publication number: 20150064158
    Abstract: A purpose of the present invention is to provide a sense-improving agent which is safe and, when routinely taken or applied to the skin, exerts an effect of improving deterioration in peripheral sensation. Another purpose of the present invention is to provide a food, a drink, a feed or a cosmetic for improving sensation which exerts an effect of improving deterioration in peripheral sensation when orally taken or applied to the skin. The sense-improving agent comprises, as the active ingredient, a basic protein fraction derived from milk or a degraded basic protein fraction derived from milk. By orally taking the basic protein fraction derived from milk or the degraded basic protein fraction derived from milk or applying the same directly to the skin, deterioration in sensation, in particular, peripheral sensation can be improved. Thus, a food, a drink, a feed or a cosmetic for improving sensation can be obtained.
    Type: Application
    Filed: January 13, 2012
    Publication date: March 5, 2015
    Applicant: MEGMILK SNOW BRAND CO., LTD.
    Inventors: Ken Katoh, Noriku Ueda, Hiroshi Ueno, Yuko Ono, Hiroko Nakahata, Takahiro Moriya, Daisaku Kobayashi
  • Publication number: 20140249094
    Abstract: An object of the present invention is to provide a safety sensation-improving agent that can improve dulled peripheral sensations through daily ingestion or application to the skin. Another object of the present invention is to provide a sensation-improving food, beverage, feed, or cosmetics that can improve dulled peripheral sensations through oral ingestion or application to the skin. A sensation-improving agent containing a milk-derived protein and/or a hydrolysate therefrom as an active ingredient is provided. The milk-derived protein and/or the hydrolysate therefrom can be orally ingested or applied direct to the skin to improve dulled sensations, particularly peripheral sensations, and be formed into a sensation-improving food, beverage, feed, or cosmetics.
    Type: Application
    Filed: October 2, 2012
    Publication date: September 4, 2014
    Inventors: Ken Katoh, Hiroshi Ueno, Yuko Ono, Noriko Ueda, Toshiya Kobayashi, Takahiro Moriya, Yutaro Obata
  • Publication number: 20130338336
    Abstract: The invention addresses the problem of providing a skin-beautifying agent with beautifying effects such as skin moisturizing, skin beautification, prevention of rough skin, wrinkle prevention, prevention of reduced elasticity, etc., and a skin-beautifying product such as a cosmetic, food or drink, feed, medicine, etc. that contains said skin-beautifying agent. The skin-beautifying agent is characterized in containing a hydrolyzate of whey protein as an active ingredient. Using a whey protein hydrolyzate having the characteristics of a molecular weight distribution of 10 kDa or less, a main peak of 200 Da-3 kDa, APL (average peptide length) of 2-8, free amino acid content of 20% or less, and a ?-lactoglobulin antigenicity of 1/10,000 or less, in particular, provides a skin-beautifying agent of low allergenicity and low bitterness.
    Type: Application
    Filed: March 7, 2012
    Publication date: December 19, 2013
    Applicant: MEGMILK SNOW BRAND CO., LTD.
    Inventors: Ken Katoh, Hiroshi Ueno, Yuko Ono, Noriko Ueda
  • Patent number: 8353986
    Abstract: In a substrate processing apparatus comprising a processing unit where a specific type of processing is executed on a wafer and a transfer chamber through which a wafer is carried into/out of the processing unit, the transfer chamber includes an air intake unit through which external air is drawn into the transfer chamber, a discharge unit disposed so as to face opposite the air intake unit, through which the discharge gas in the transfer chamber is discharged and a discharge gas filtering means disposed at the discharge unit and constituted with a harmful constituent eliminating filter through which a harmful constituent contained in the discharge gas, at least, is eliminated.
    Type: Grant
    Filed: March 29, 2006
    Date of Patent: January 15, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Yoshiaki Sasaski, Yusuke Muraki, Eiichi Nishimura, Yuko Ono
  • Patent number: 8053180
    Abstract: In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.
    Type: Grant
    Filed: October 30, 2009
    Date of Patent: November 8, 2011
    Assignee: Tokyo Electron Limited
    Inventors: Yuko Ono, Junichi Kitano
  • Patent number: 7857530
    Abstract: In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.
    Type: Grant
    Filed: July 10, 2008
    Date of Patent: December 28, 2010
    Assignee: Tokyo Electron Limited
    Inventors: Yuko Ono, Junichi Kitano
  • Patent number: 7794924
    Abstract: In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.
    Type: Grant
    Filed: September 14, 2007
    Date of Patent: September 14, 2010
    Assignee: Tokyo Electron Limited
    Inventors: Yuko Ono, Junichi Kitano
  • Publication number: 20100047725
    Abstract: In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.
    Type: Application
    Filed: October 30, 2009
    Publication date: February 25, 2010
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Yuko ONO, Junichi Kitano
  • Publication number: 20080284989
    Abstract: In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.
    Type: Application
    Filed: July 10, 2008
    Publication date: November 20, 2008
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Yuko Ono, Junichi Kitano
  • Patent number: 7427168
    Abstract: In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.
    Type: Grant
    Filed: September 14, 2007
    Date of Patent: September 23, 2008
    Assignee: Tokyo Electron Limited
    Inventors: Yuko Ono, Junichi Kitano
  • Publication number: 20080079917
    Abstract: In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.
    Type: Application
    Filed: September 14, 2007
    Publication date: April 3, 2008
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Yuko Ono, Junichi Kitano
  • Publication number: 20080013946
    Abstract: In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.
    Type: Application
    Filed: September 14, 2007
    Publication date: January 17, 2008
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Yuko Ono, Junichi Kitano
  • Publication number: 20060219171
    Abstract: In a substrate processing apparatus comprising a processing unit where a specific type of processing is executed on a wafer and a transfer chamber through which a wafer is carried into/out of the processing unit, the transfer chamber includes an air intake unit through which external air is drawn into the transfer chamber, a discharge unit disposed so as to face opposite the air intake unit, through which the discharge gas in the transfer chamber is discharged and a discharge gas filtering means disposed at the discharge unit and constituted with a harmful constituent eliminating filter through which a harmful constituent contained in the discharge gas, at least, is eliminated.
    Type: Application
    Filed: March 29, 2006
    Publication date: October 5, 2006
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Yoshiaki Sasaki, Yusuke Muraki, Eiichi Nishimura, Yuko Ono
  • Publication number: 20050266359
    Abstract: In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.
    Type: Application
    Filed: July 15, 2005
    Publication date: December 1, 2005
    Applicant: Tokyo Electron Limited
    Inventors: Yuko Ono, Junichi Kitano