Patents by Inventor Yuko Ono
Yuko Ono has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 12208625Abstract: Provided is an image processing device coupled to a printing device that performs printing on a medium by ejecting ink having a plurality of colors, and configured to convert image data into ink amount data. The image processing device includes: an input unit configured to input a search condition; an acquisition unit configured to acquire a plurality of search values based on the search condition input by the input unit; a table storage unit storing a plurality of image conversion tables for converting the image data into the ink amount data; and a search unit configured to search the plurality of image conversion tables for a target image conversion table based on the plurality of search values acquired by the acquisition unit.Type: GrantFiled: November 8, 2022Date of Patent: January 28, 2025Assignee: Seiko Epson CorporationInventors: Katsuyuki Tanaka, Takuya Ono, Yuko Yamamoto, Takumi Shimomukai, Shotaro Matsuda
-
Patent number: 10016481Abstract: An object of the present invention is to provide a safety sensation-improving agent that can improve dulled peripheral sensations through daily ingestion or application to the skin. Another object of the present invention is to provide a sensation-improving food, beverage, feed, or cosmetics that can improve dulled peripheral sensations through oral ingestion or application to the skin. A sensation-improving agent containing a milk-derived protein and/or a hydrolysate therefrom as an active ingredient is provided. The milk-derived protein and/or the hydrolysate therefrom can be orally ingested or applied direct to the skin to improve dulled sensations, particularly peripheral sensations, and be formed into a sensation-improving food, beverage, feed, or cosmetics.Type: GrantFiled: October 2, 2015Date of Patent: July 10, 2018Assignee: MEGMILK SNOW BRAND CO., LTD.Inventors: Ken Katoh, Hiroshi Ueno, Yuko Ono, Noriko Ueda, Toshiya Kobayashi, Takahiro Moriya, Yutaro Obara
-
Patent number: 9884095Abstract: A skin sensitivity improving agent which is safe and, when routinely taken or applied to the skin, exerts an effect of improving deterioration in peripheral sensation is provided. The present invention also provides a food, a drink, a feed or a cosmetic for improving sensation which exerts an effect of improving deterioration in peripheral sensation when orally taken or applied to the skin. The skin sensitivity improving agent includes, as the active ingredient, a basic protein fraction derived from milk or a degraded basic protein fraction derived from milk. By orally taking the basic protein fraction derived from milk or the degraded basic protein fraction derived from milk or applying the same directly to the skin, deterioration in sensation, in particular, peripheral sensation can be improved. Thus, a food, a drink, a feed or a cosmetic for improving sensation can be obtained.Type: GrantFiled: September 10, 2015Date of Patent: February 6, 2018Assignee: MEGMILK SNOW BRAND CO., LTD.Inventors: Ken Katoh, Noriko Ueda, Hiroshi Ueno, Yuko Ono, Norimichi Nakahata, Takahiro Moriya, Daisaku Kobayashi
-
Patent number: 9255123Abstract: The invention addresses the problem of providing a skin-beautifying agent with beautifying effects such as skin moisturizing, skin beautification, prevention of rough skin, wrinkle prevention, prevention of reduced elasticity, etc., and a skin-beautifying product such as a cosmetic, food or drink, feed, medicine, etc. that contains said skin-beautifying agent. The skin-beautifying agent is characterized in containing a hydrolyzate of whey protein as an active ingredient. Using a whey protein hydrolyzate having the characteristics of a molecular weight distribution of 10 kDa or less, a main peak of 200 Da-3 kDa, APL (average peptide length) of 2-8, free amino acid content of 20% or less, and a ?-lactoglobulin antigenicity of 1/10,000 or less, in particular, provides a skin-beautifying agent of low allergenicity and low bitterness.Type: GrantFiled: March 7, 2012Date of Patent: February 9, 2016Assignee: MEGMILK SNOW BRAND CO., LTD.Inventors: Ken Katoh, Hiroshi Ueno, Yuko Ono, Noriko Ueda
-
Publication number: 20160022771Abstract: An object of the present invention is to provide a safety sensation-improving agent that can improve dulled peripheral sensations through daily ingestion or application to the skin. Another object of the present invention is to provide a sensation-improving food, beverage, feed, or cosmetics that can improve dulled peripheral sensations through oral ingestion or application to the skin. A sensation-improving agent containing a milk-derived protein and/or a hydrolysate therefrom as an active ingredient is provided. The milk-derived protein and/or the hydrolysate therefrom can be orally ingested or applied direct to the skin to improve dulled sensations, particularly peripheral sensations, and be formed into a sensation-improving food, beverage, feed, or cosmetics.Type: ApplicationFiled: October 2, 2015Publication date: January 28, 2016Applicant: MEGMILK SNOW BRAND CO., LTD.Inventors: Ken KATOH, Hiroshi UENO, Yuko ONO, Noriko UEDA, Toshiya KOBAYASHI, Takahiro MORIYA, Yutaro OBARA
-
Publication number: 20150374797Abstract: A skin sensitivity improving agent which is safe and, when routinely taken or applied to the skin, exerts an effect of improving deterioration in peripheral sensation is provided. The present invention also provides a food, a drink, a feed or a cosmetic for improving sensation which exerts an effect of improving deterioration in peripheral sensation when orally taken or applied to the skin. The skin sensitivity improving agent includes, as the active ingredient, a basic protein fraction derived from milk or a degraded basic protein fraction derived from milk. By orally taking the basic protein fraction derived from milk or the degraded basic protein fraction derived from milk or applying the same directly to the skin, deterioration in sensation, in particular, peripheral sensation can be improved. Thus, a food, a drink, a feed or a cosmetic for improving sensation can be obtained.Type: ApplicationFiled: September 10, 2015Publication date: December 31, 2015Applicant: MEGMILK SNOW BRAND CO., LTD.Inventors: Ken KATOH, Noriko UEDA, Hiroshi UENO, Yuko ONO, Norimichi NAKAHATA, Takahiro MORIYA, Daisaku KOBAYASHI
-
Publication number: 20150064158Abstract: A purpose of the present invention is to provide a sense-improving agent which is safe and, when routinely taken or applied to the skin, exerts an effect of improving deterioration in peripheral sensation. Another purpose of the present invention is to provide a food, a drink, a feed or a cosmetic for improving sensation which exerts an effect of improving deterioration in peripheral sensation when orally taken or applied to the skin. The sense-improving agent comprises, as the active ingredient, a basic protein fraction derived from milk or a degraded basic protein fraction derived from milk. By orally taking the basic protein fraction derived from milk or the degraded basic protein fraction derived from milk or applying the same directly to the skin, deterioration in sensation, in particular, peripheral sensation can be improved. Thus, a food, a drink, a feed or a cosmetic for improving sensation can be obtained.Type: ApplicationFiled: January 13, 2012Publication date: March 5, 2015Applicant: MEGMILK SNOW BRAND CO., LTD.Inventors: Ken Katoh, Noriku Ueda, Hiroshi Ueno, Yuko Ono, Hiroko Nakahata, Takahiro Moriya, Daisaku Kobayashi
-
Publication number: 20140249094Abstract: An object of the present invention is to provide a safety sensation-improving agent that can improve dulled peripheral sensations through daily ingestion or application to the skin. Another object of the present invention is to provide a sensation-improving food, beverage, feed, or cosmetics that can improve dulled peripheral sensations through oral ingestion or application to the skin. A sensation-improving agent containing a milk-derived protein and/or a hydrolysate therefrom as an active ingredient is provided. The milk-derived protein and/or the hydrolysate therefrom can be orally ingested or applied direct to the skin to improve dulled sensations, particularly peripheral sensations, and be formed into a sensation-improving food, beverage, feed, or cosmetics.Type: ApplicationFiled: October 2, 2012Publication date: September 4, 2014Inventors: Ken Katoh, Hiroshi Ueno, Yuko Ono, Noriko Ueda, Toshiya Kobayashi, Takahiro Moriya, Yutaro Obata
-
Publication number: 20130338336Abstract: The invention addresses the problem of providing a skin-beautifying agent with beautifying effects such as skin moisturizing, skin beautification, prevention of rough skin, wrinkle prevention, prevention of reduced elasticity, etc., and a skin-beautifying product such as a cosmetic, food or drink, feed, medicine, etc. that contains said skin-beautifying agent. The skin-beautifying agent is characterized in containing a hydrolyzate of whey protein as an active ingredient. Using a whey protein hydrolyzate having the characteristics of a molecular weight distribution of 10 kDa or less, a main peak of 200 Da-3 kDa, APL (average peptide length) of 2-8, free amino acid content of 20% or less, and a ?-lactoglobulin antigenicity of 1/10,000 or less, in particular, provides a skin-beautifying agent of low allergenicity and low bitterness.Type: ApplicationFiled: March 7, 2012Publication date: December 19, 2013Applicant: MEGMILK SNOW BRAND CO., LTD.Inventors: Ken Katoh, Hiroshi Ueno, Yuko Ono, Noriko Ueda
-
Patent number: 8353986Abstract: In a substrate processing apparatus comprising a processing unit where a specific type of processing is executed on a wafer and a transfer chamber through which a wafer is carried into/out of the processing unit, the transfer chamber includes an air intake unit through which external air is drawn into the transfer chamber, a discharge unit disposed so as to face opposite the air intake unit, through which the discharge gas in the transfer chamber is discharged and a discharge gas filtering means disposed at the discharge unit and constituted with a harmful constituent eliminating filter through which a harmful constituent contained in the discharge gas, at least, is eliminated.Type: GrantFiled: March 29, 2006Date of Patent: January 15, 2013Assignee: Tokyo Electron LimitedInventors: Yoshiaki Sasaski, Yusuke Muraki, Eiichi Nishimura, Yuko Ono
-
Patent number: 8053180Abstract: In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.Type: GrantFiled: October 30, 2009Date of Patent: November 8, 2011Assignee: Tokyo Electron LimitedInventors: Yuko Ono, Junichi Kitano
-
Patent number: 7857530Abstract: In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.Type: GrantFiled: July 10, 2008Date of Patent: December 28, 2010Assignee: Tokyo Electron LimitedInventors: Yuko Ono, Junichi Kitano
-
Patent number: 7794924Abstract: In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.Type: GrantFiled: September 14, 2007Date of Patent: September 14, 2010Assignee: Tokyo Electron LimitedInventors: Yuko Ono, Junichi Kitano
-
Publication number: 20100047725Abstract: In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.Type: ApplicationFiled: October 30, 2009Publication date: February 25, 2010Applicant: TOKYO ELECTRON LIMITEDInventors: Yuko ONO, Junichi Kitano
-
Publication number: 20080284989Abstract: In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.Type: ApplicationFiled: July 10, 2008Publication date: November 20, 2008Applicant: TOKYO ELECTRON LIMITEDInventors: Yuko Ono, Junichi Kitano
-
Patent number: 7427168Abstract: In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.Type: GrantFiled: September 14, 2007Date of Patent: September 23, 2008Assignee: Tokyo Electron LimitedInventors: Yuko Ono, Junichi Kitano
-
Publication number: 20080079917Abstract: In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.Type: ApplicationFiled: September 14, 2007Publication date: April 3, 2008Applicant: TOKYO ELECTRON LIMITEDInventors: Yuko Ono, Junichi Kitano
-
Publication number: 20080013946Abstract: In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.Type: ApplicationFiled: September 14, 2007Publication date: January 17, 2008Applicant: TOKYO ELECTRON LIMITEDInventors: Yuko Ono, Junichi Kitano
-
Publication number: 20060219171Abstract: In a substrate processing apparatus comprising a processing unit where a specific type of processing is executed on a wafer and a transfer chamber through which a wafer is carried into/out of the processing unit, the transfer chamber includes an air intake unit through which external air is drawn into the transfer chamber, a discharge unit disposed so as to face opposite the air intake unit, through which the discharge gas in the transfer chamber is discharged and a discharge gas filtering means disposed at the discharge unit and constituted with a harmful constituent eliminating filter through which a harmful constituent contained in the discharge gas, at least, is eliminated.Type: ApplicationFiled: March 29, 2006Publication date: October 5, 2006Applicant: TOKYO ELECTRON LIMITEDInventors: Yoshiaki Sasaki, Yusuke Muraki, Eiichi Nishimura, Yuko Ono
-
Publication number: 20050266359Abstract: In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.Type: ApplicationFiled: July 15, 2005Publication date: December 1, 2005Applicant: Tokyo Electron LimitedInventors: Yuko Ono, Junichi Kitano