Abstract: An apparatus and method for best effort quality of service scheduling in a graphics processing architecture. For example, one embodiment of an apparatus comprises: a graphics processing unit (GPU) to perform graphics processing operations for a plurality of guests; a plurality of buffers to store one or more graphics commands associated with each guest to be executed by the GPU; and a scheduler to evaluate commands in the buffers of a first guest to estimate a cost of executing the commands, the scheduler to select all or a subset of the buffers of the first guest for execution on the GPU based on a determination that the selected buffers can be executed by the GPU within a remaining time slice allocated to the first guest.

Abstract: Isolated remotely-virtualized computing environment for a mobile device. The mobile device is configured to connect with a virtualized mobile system (VMS) implemented on a remote server. The mobile device accesses local input information via a local input device and a local OS, and transmits the local input information to the VMS. The mobile device further accesses output information from the VMS and passes the output information to be accessed by an output device, such as a display, for instance. Isolation of the output information is maintained where the content of the output information is inaccessible by the OS and the local processes running on the mobile device.

Abstract: Described herein is a technology for collaboration. In accordance with some implementations, the workspace tool is adapted to cooperate with an electronic communication system. Electronic communications related to the workspace tool are stored in a repository and are associated with respective workspaces. The workspace tool allows participants of a workspace to access all information related to the workspace.

Abstract: Systems and methods for incentivizing user interaction with promotional content on a secondary device are provided. The secondary device may be synchronized with the media content displayed on a primary device to provide promotional opportunities relevant to the displayed content. A promotional opportunity may allow a user to identify an object (which may be a product placement) embedded within the primary media content. For instance, the user may be prompted to select the object using a display screen on the secondary device. Alternatively, the user may use the secondary device to capture a photograph of the embedded object as displayed on the primary device. The user may then be rewarded for correctly identifying or photographing the embedded object.

Abstract: A method includes capturing an image of the pattern using one or more scans across a surface of the partially completed wafer. The method includes processing information associated with the captured image of the pattern in a first format (e.g., pixel domain) into a second format, e.g., transform domain. The method includes determining defect information associated with the image of the pattern in the second format and processing the defect information (e.g., wafer identification, product identification, layer information, x-y die scanned) to identify at least one defect associated with a spatial location of a repeating pattern on the partially completed wafer provided by a reticle. The method includes identifying the reticle associated with the defect and a stepper associated with the reticle having the defect and ceasing operation of the stepper. The damaged reticle is replaced, and the process resumes using a replaced reticle.

Abstract: Described herein is a technology for collaboration. In accordance with some implementations, the workspace tool is adapted to cooperate with an electronic communication system. Electronic communications related to the workspace tool are stored in a repository and are associated with respective workspaces. The workspace tool allows participants of a workspace to access all information related to the workspace.

Abstract: A method includes capturing an image of the pattern using one or more scans across a surface of the partially completed wafer. The method includes processing information associated with the captured image of the pattern in a first format (e.g., pixel domain) into a second format, e.g., transform domain. The method includes determining defect information associated with the image of the pattern in the second format and processing the defect information (e.g., wafer identification, product identification, layer information, x-y die scanned) to identify at least one defect associated with a spatial location of a repeating pattern on the partially completed wafer provided by a reticle. The method includes identifying the reticle associated with the defect and a stepper associated with the reticle having the defect and ceasing operation of the stepper. The damaged reticle is replaced, and the process resumes using a replaced reticle.