Abstract: A lithography apparatus provided independently of an exposure apparatus includes a carry-in/out block having a placement section in which a receptacle accommodating multiple substrates is placed; and a processing block including multiple processing modules, each processing module each including a hot plate, a transfer space that extends in an apparatus width direction from a side of the carry-in/out block and is provided with a transfer arm, a plurality of heating blocks in which the multiple processing modules are arranged in the apparatus width direction including a front heating block at of a front side of the processing block and a rear heating block at a rear side of the processing block, the front heating block and the rear heating block face each other with the transfer space therebetween and an access opening for personnel into the transfer space.

Abstract: A developing fluid supply apparatus comprises a supply path connected to a developing part configured to develop a substrate on which a metal-containing resist film has been formed and which has been subjected to exposure processing, with a developing fluid containing at least one of gas and mist of a weak acid, a developing fluid generator configured to generate the developing fluid from a developing liquid; and a heating part configured to heat the developing fluid to be supplied to the developing part via the supply path.