Patents by Inventor YUN CHEN CHANG

YUN CHEN CHANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11807746
    Abstract: An impact-resistant polystyrene resin includes a continuous phase and a plurality of particles dispersed in the continuous phase. The average particle size of the particles is about 0.1 to 4.0 ?m, and the average distance between the particles is about 0.3 to 5.0 ?m. The impact-resistant polystyrene resin is made from a polystyrene composition including a polystyrene plastic, a styrene block copolymer, a processing aid, and an antioxidant.
    Type: Grant
    Filed: December 22, 2021
    Date of Patent: November 7, 2023
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Kuan-Yeh Huang, Jin-An Wu, Fu-Ming Chien, Yun-Chen Chang, Fan-Jie Lin
  • Publication number: 20230272214
    Abstract: A thermoplastic vulcanizate and a method for preparing the same are provided. The thermoplastic vulcanizate includes a thermoplastic, a cross-linked rubber particle, and a compatibilizer, wherein the cross-linked rubber particle is dispersed in the thermoplastic serving as a continuous phase, wherein the cross-linked rubber particle is a product of a composition via a cross-linking reaction. The composition includes an ethylene copolymer and a cross-linking agent, wherein the weight ratio of the thermoplastic to the ethylene copolymer is 3:17 to 1:1.
    Type: Application
    Filed: February 23, 2023
    Publication date: August 31, 2023
    Applicants: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE, FORMOSA PLASTICS CORPORATION
    Inventors: Jin-An WU, Fu-Ming CHIEN, Yun-Chen CHANG, Jen-Long WU, Wen-Hao KANG, Kuei-Pin LIN, Ying-Cheng WENG, Shih-Hsun LIN
  • Publication number: 20230042674
    Abstract: An impact-resistant polystyrene resin includes a continuous phase and a plurality of particles dispersed in the continuous phase. The average particle size of the particles is about 0.1 to 4.0 µm, and the average distance between the particles is about 0.3 to 5.0 µm. The impact-resistant polystyrene resin is made from a polystyrene composition including a polystyrene plastic, a styrene block copolymer, a processing aid, and an antioxidant.
    Type: Application
    Filed: December 22, 2021
    Publication date: February 9, 2023
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Kuan-Yeh HUANG, Jin-An WU, Fu-Ming CHIEN, Yun-Chen CHANG, Fan-Jie LIN
  • Publication number: 20220204752
    Abstract: A biodegradable polyester and a method for preparing a biodegradable polyester are provided. The biodegradable polyester is a product of a reactant (A) and a reactant (B) via polycondensation. The reactant (A) is a product of a reactant (C) and a reactant (D) via an esterification reaction. The reactant (B) is at least one epoxy resin with a secondary hydroxyl functional group. The reactant (C) is at least one diol, and the reactant (D) is at least one dicarboxylic acid, at least one acid anhydride, or a combination thereof.
    Type: Application
    Filed: December 31, 2020
    Publication date: June 30, 2022
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Jin-An WU, Jen-Chun CHIU, Sheng-Lung CHANG, Fan-Jie LIN, Yun-Chen CHANG
  • Publication number: 20220135791
    Abstract: A biodegradable material and a method for preparing a biodegradable material are provided. The biodegradable material includes a continuous phase and a dispersed phase. The continuous phase includes a polyester, and the dispersed phase includes a modified saccharide oligomer. In particular, the weight ratio of the modified saccharide oligomer to the polyester is from 3:97 to 30:70. The dispersed phase has a maximum diameter of 100 nm to 900 nm.
    Type: Application
    Filed: October 29, 2021
    Publication date: May 5, 2022
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Jin-An WU, Yun-Chen CHANG, Sheng-Lung CHANG, Shu-Chuan HUANG, Shin-Liang KUO
  • Patent number: 9373162
    Abstract: An auto-contrast enhancement system includes a human visual system (HVS)-based local difference (LD) histogram unit configured to build a LD histogram with respect to intensity values; a histogram classifier configured to categorize histograms of input images based on distribution properties; and a histogram equalization (HE) unit configured to process the input image according to a result of the HVS-based LD histogram unit and the enhancement level determined in the histogram classifier.
    Type: Grant
    Filed: October 10, 2014
    Date of Patent: June 21, 2016
    Assignees: NCKU Research and Development Foundation, Himax Technologies Limited
    Inventors: Ming-Der Shieh, Der-Wei Yang, Yun Chen Chang, Tzung-Ren Wang
  • Publication number: 20160104272
    Abstract: An auto-contrast enhancement system includes a human visual system (HVS)-based local difference (LD) histogram unit configured to build a LD histogram with respect to intensity values; a histogram classifier configured to categorize histograms of input images based on distribution properties; and a histogram equalization (HE) unit configured to process the input image according to a result of the HVS-based LD histogram unit and the enhancement level determined in the histogram classifier.
    Type: Application
    Filed: October 10, 2014
    Publication date: April 14, 2016
    Inventors: MING-DER SHIEH, DER-WEI YANG, YUN CHEN CHANG, TZUNG-REN WANG