Patents by Inventor Yun-Ching Lee

Yun-Ching Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11932714
    Abstract: A copolymer, a film composition and a composite material employing the same are provided. The copolymer is a copolymerization product of a composition, wherein the composition includes a monomer (a), a monomer (b) and a monomer (c). The monomer (a) is a compound having a structure represented by Formula (I), the monomer (b) is a compound having a structure represented by Formula (II), and the monomer (c) is a compound having a structure represented by Formula (III) wherein R1, R2, R3, R4, R5 and R6 are as defined in specification.
    Type: Grant
    Filed: July 22, 2022
    Date of Patent: March 19, 2024
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yen-Yi Chu, Yun-Ching Lee, Li-Chun Liang, Wei-Ta Yang, Hsiang-Chin Juan
  • Publication number: 20230063240
    Abstract: A copolymer, a film composition and a composite material employing the same are provided. The copolymer is a copolymerization product of a composition, wherein the composition includes a monomer (a), a monomer (b) and a monomer (c). The monomer (a) is a compound having a structure represented by Formula (I), the monomer (b) is a compound having a structure represented by Formula (II), and the monomer (c) is a compound having a structure represented by Formula (III) wherein R1, R2, R3, R4, R5 and R6 are as defined in specification.
    Type: Application
    Filed: July 22, 2022
    Publication date: March 2, 2023
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yen-Yi CHU, Yun-Ching LEE, Li-Chun LIANG, Wei-Ta YANG, Hsiang-Chin JUAN
  • Patent number: 10844164
    Abstract: An oligomer, composition, and composite material employing the same are provided. The oligomer has a structure represented by Formula (I) wherein R1 and R2 are independently hydrogen, C1-20 alkyl group, C2-20 alkenyl group, C6-12 aryl group, C6-12 alkylaryl group, C5-12 cycloalkyl group, C6-20 cycloalkylalkyl group, alkoxycarbonyl group, or alkylcarbonyloxy group; R1 is not hydrogen when R2 is hydrogen; a is 0 or 1; n?0; m?1; n:m is from 0:100 to 99:1; the oligomer has a number average molecular weight of less than or equal to 12,000; and the repeat unit and the repeat unit are arranged in a random or block fashion.
    Type: Grant
    Filed: December 21, 2017
    Date of Patent: November 24, 2020
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Wei-Ta Yang, Yen-Yi Chu, Ming-Tsung Hong, Li-Chun Liang, Yun-Ching Lee, Meng-Song Yin, Hsi-Yi Chin
  • Patent number: 10179833
    Abstract: An oligomer, composition, and composite material employing the same are provided. The oligomer can be a reaction product of a reactant (a) and a reactant (b). The reactant (a) is a reaction product of a reactant (c) and a reactant (d). The reactant (b) can be or a combination thereof, wherein a is 0 or 1, and R1 is independently hydrogen or and wherein b is 0-6; c is 0 or 1; and, d is 0-6. The reactant (c) is wherein R2 is C5-10 alkyl group. The reactant (d) is wherein e is 0-10.
    Type: Grant
    Filed: December 30, 2016
    Date of Patent: January 15, 2019
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Ming-Tsung Hong, Yun-Ching Lee, Wei-Ta Yang, Meng-Song Yin
  • Publication number: 20180171068
    Abstract: An oligomer, composition, and composite material employing the same are provided. The oligomer has a structure represented by Formula (I) wherein R1 and R2 are independently hydrogen, C1-20 alkyl group, C2-20 alkenyl group, C6-12 aryl group, C6-12 alkylaryl group, C5-12 cycloalkyl group, C6-20 cycloalkylalkyl group, alkoxycarbonyl group, or alkylcarbonyloxy group; R1 is not hydrogen when R2 is hydrogen; a is 0 or 1; n?0; m?1; n:m is from 0:100 to 99:1; the oligomer has a number average molecular weight of less than or equal to 12,000; and the repeat unit and the repeat unit are arranged in a random or block fashion.
    Type: Application
    Filed: December 21, 2017
    Publication date: June 21, 2018
    Applicant: Industrial Technology Research Institute
    Inventors: Wei-Ta Yang, Yen-Yi Chu, Ming-Tsung Hong, Li-Chun Liang, Yun-Ching Lee, Meng-Song Yin, Hsi-Yi Chin
  • Publication number: 20170342200
    Abstract: An oligomer, composition, and composite material employing the same are provided. The oligomer can be a reaction product of a reactant (a) and a reactant (b). The reactant (a) is a reaction product of a reactant (c) and a reactant (d). The reactant (b) can be or a combination thereof, wherein a is 0 or 1, and R1 is independently hydrogen or and wherein b is 0-6; c is 0 or 1; and, d is 0-6. The reactant (c) is wherein R2 is C5-10 alkyl group. The reactant (d) is wherein e is 0-10.
    Type: Application
    Filed: December 30, 2016
    Publication date: November 30, 2017
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Ming-Tsung HONG, Yun-Ching LEE, Wei-Ta YANG, Meng-Song YIN
  • Publication number: 20170342199
    Abstract: An oligomer, composition, and composite material employing the same are provided. The oligomer has a structure represented by Formula (I) wherein R1 and R2 are independently hydrogen, C1-20 alkyl group, C2-20 alkenyl group, C6-12 aryl group, C6-12 alkylaryl group, C5-12 cycloalkyl group, C6-20 cycloalkylalkyl group, alkoxycarbonyl group, or alkylcarbonyloxy group; R1 is not hydrogen when R2 is hydrogen; a is 0 or 1; n?0; m?1; n:m is from 0:100 to 99:1; the oligomer has a number average molecular weight of less than or equal to 12,000; and the repeat unit and the repeat unit are arranged in a random or block fashion.
    Type: Application
    Filed: December 29, 2016
    Publication date: November 30, 2017
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Wei-Ta YANG, Yen-Yi CHU, Ming-Tsung HONG, Li-Chun LIANG, Yun-Ching LEE, Meng-Song YIN
  • Patent number: 9236169
    Abstract: Provided is an electromagnetic wave shielding structure, including: a substrate; and a porous composite film formed on the substrate, wherein the porous composite film includes a continuous phase network fused from a plurality of metal nanoparticles, a first resin composition coated on a surface of the continuous phase network and a plurality of holes which are void spaces in the continuous phase network coated with the first resin composition.
    Type: Grant
    Filed: May 9, 2013
    Date of Patent: January 12, 2016
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Ming-Tsung Hong, Yun-Ching Lee, Li-Chun Liang, Wei-Ta Yang
  • Publication number: 20140141232
    Abstract: Provided is an electromagnetic wave shielding structure, including: a substrate; and a porous composite film formed on the substrate, wherein the porous composite film includes a continuous phase network fused from a plurality of metal nanoparticles, a first resin composition coated on a surface of the continuous phase network and a plurality of holes which are void spaces in the continuous phase network coated with the first resin composition.
    Type: Application
    Filed: May 9, 2013
    Publication date: May 22, 2014
    Applicant: Industrial Technology Research Institute
    Inventors: Ming-Tsung HONG, Yun-Ching LEE, Li-Chun LIANG, Wei-Ta YANG
  • Patent number: 7803425
    Abstract: A nanoporous film and fabrication method thereof. The method for fabricating nanoporous film comprising: providing a substrate with a surface; forming a coating of a composition on the surface, curing the coating to polymerize the oxide gel, thereby forming an organic/inorganic hybrid film; and dissolving the template from the organic/inorganic hybrid film by an organic solvent. Specifically, the composition comprises the following components: an oxide gel, a template and an initiator.
    Type: Grant
    Filed: August 29, 2005
    Date of Patent: September 28, 2010
    Assignee: Industrial Technology Research Institute
    Inventors: Wu-Jing Wang, Yen-Po Wang, Yun-Ching Lee, Joung-Yei Chen, Hsi-Hsin Shih, Hsein-Pin Chen
  • Patent number: 7659352
    Abstract: An antireflective coating composition, antireflection films and fabrication method thereof. The antireflection film is constructed by stacked crosslink colloid particles, having a plurality of nanopores distributed uniformly therein. Due to the nanopores, the antireflection film has a refractive index less than 1.45, reducing the reflectivity of less than 3.0%. Furthermore, since the antireflection film comprises crosslink oxide colloid, the film exhibits superior mechanical strength and is suitable for use in display devices.
    Type: Grant
    Filed: September 9, 2005
    Date of Patent: February 9, 2010
    Assignee: Industrial Technology Research Institute
    Inventors: Wu-Jing Wang, Yen-Po Wang, Yun-Ching Lee, Joung-Yei Chen, Hsi-Hsin Shih
  • Publication number: 20070153909
    Abstract: A method for image encoding is provided, which are capable of encoding video images using a lower memory bandwidth. The method includes the following steps. First, a reference window of a reference frame is read and the position of the reference window is called a first position. Secondly, macroblocks of at least two of the estimated frames are read, and the position of macroblocks is called a second position, wherein the second position corresponds to the first position. Next, block matching is executed between macroblocks and the reference window. Finally, reading position of the first position and the second position are changed, and then the above steps are repeated until block matching of all macroblocks within at least two of the frames is finished in the estimated frames.
    Type: Application
    Filed: December 28, 2006
    Publication date: July 5, 2007
    Applicant: SUNPLUS TECHNOLOGY CO., LTD.
    Inventors: YUN-CHING LEE, PAI-CHU HSIEH, HSIN-TZU LIU
  • Publication number: 20060099407
    Abstract: An antireflective coating composition, antireflection films and fabrication method thereof. The antireflection film is constructed by stacked crosslink colloid particles, having a plurality of nanopores distributed uniformly therein. Due to the nanopores, the antireflection film has a refractive index less than 1.45, reducing the reflectivity of less than 3.0%. Furthermore, since the antireflection film comprises crosslink oxide colloid, the film exhibits superior mechanical strength and is suitable for use in display devices.
    Type: Application
    Filed: September 9, 2005
    Publication date: May 11, 2006
    Inventors: Wu-Jing Wang, Yen-Po Wang, Yun-Ching Lee, Joung-Yei Chen, Hsi-Hsin Shih
  • Publication number: 20060046045
    Abstract: A nanoporous film and fabrication method thereof. The nanoporous film according to the present invention has a plurality of nanopores distributed uniformly therein. Due to the nanopores, the nanoporous film has a refractive index less than 1.45, reducing the reflectivity of less than 3.0%. Furthermore, since the nanoporous film comprises organic-inorganic hybrid with a high crosslink density, the film exhibits superior mechanical strength and is highly suitable for use as anti-reflection and anti-abrasion coatings.
    Type: Application
    Filed: August 29, 2005
    Publication date: March 2, 2006
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Wu-Jing Wang, Yen-Po Wang, Yun-Ching Lee, Joung-Yei Chen, Hsi-Hsin Shih, Hsein-Pin Chen
  • Patent number: D1018907
    Type: Grant
    Filed: November 15, 2021
    Date of Patent: March 19, 2024
    Assignee: CHENG UEI PRECISION INDUSTRY CO., LTD.
    Inventors: Yun-Chien Lee, Yi-Ching Hsu, Pei-Yi Lin, Yu-Hung Su, Sheng-Yuan Huang, Chun-Fu Lin