Patents by Inventor Yun-Ching Lee
Yun-Ching Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11932714Abstract: A copolymer, a film composition and a composite material employing the same are provided. The copolymer is a copolymerization product of a composition, wherein the composition includes a monomer (a), a monomer (b) and a monomer (c). The monomer (a) is a compound having a structure represented by Formula (I), the monomer (b) is a compound having a structure represented by Formula (II), and the monomer (c) is a compound having a structure represented by Formula (III) wherein R1, R2, R3, R4, R5 and R6 are as defined in specification.Type: GrantFiled: July 22, 2022Date of Patent: March 19, 2024Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Yen-Yi Chu, Yun-Ching Lee, Li-Chun Liang, Wei-Ta Yang, Hsiang-Chin Juan
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Publication number: 20230063240Abstract: A copolymer, a film composition and a composite material employing the same are provided. The copolymer is a copolymerization product of a composition, wherein the composition includes a monomer (a), a monomer (b) and a monomer (c). The monomer (a) is a compound having a structure represented by Formula (I), the monomer (b) is a compound having a structure represented by Formula (II), and the monomer (c) is a compound having a structure represented by Formula (III) wherein R1, R2, R3, R4, R5 and R6 are as defined in specification.Type: ApplicationFiled: July 22, 2022Publication date: March 2, 2023Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Yen-Yi CHU, Yun-Ching LEE, Li-Chun LIANG, Wei-Ta YANG, Hsiang-Chin JUAN
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Patent number: 10844164Abstract: An oligomer, composition, and composite material employing the same are provided. The oligomer has a structure represented by Formula (I) wherein R1 and R2 are independently hydrogen, C1-20 alkyl group, C2-20 alkenyl group, C6-12 aryl group, C6-12 alkylaryl group, C5-12 cycloalkyl group, C6-20 cycloalkylalkyl group, alkoxycarbonyl group, or alkylcarbonyloxy group; R1 is not hydrogen when R2 is hydrogen; a is 0 or 1; n?0; m?1; n:m is from 0:100 to 99:1; the oligomer has a number average molecular weight of less than or equal to 12,000; and the repeat unit and the repeat unit are arranged in a random or block fashion.Type: GrantFiled: December 21, 2017Date of Patent: November 24, 2020Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Wei-Ta Yang, Yen-Yi Chu, Ming-Tsung Hong, Li-Chun Liang, Yun-Ching Lee, Meng-Song Yin, Hsi-Yi Chin
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Patent number: 10179833Abstract: An oligomer, composition, and composite material employing the same are provided. The oligomer can be a reaction product of a reactant (a) and a reactant (b). The reactant (a) is a reaction product of a reactant (c) and a reactant (d). The reactant (b) can be or a combination thereof, wherein a is 0 or 1, and R1 is independently hydrogen or and wherein b is 0-6; c is 0 or 1; and, d is 0-6. The reactant (c) is wherein R2 is C5-10 alkyl group. The reactant (d) is wherein e is 0-10.Type: GrantFiled: December 30, 2016Date of Patent: January 15, 2019Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Ming-Tsung Hong, Yun-Ching Lee, Wei-Ta Yang, Meng-Song Yin
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Publication number: 20180171068Abstract: An oligomer, composition, and composite material employing the same are provided. The oligomer has a structure represented by Formula (I) wherein R1 and R2 are independently hydrogen, C1-20 alkyl group, C2-20 alkenyl group, C6-12 aryl group, C6-12 alkylaryl group, C5-12 cycloalkyl group, C6-20 cycloalkylalkyl group, alkoxycarbonyl group, or alkylcarbonyloxy group; R1 is not hydrogen when R2 is hydrogen; a is 0 or 1; n?0; m?1; n:m is from 0:100 to 99:1; the oligomer has a number average molecular weight of less than or equal to 12,000; and the repeat unit and the repeat unit are arranged in a random or block fashion.Type: ApplicationFiled: December 21, 2017Publication date: June 21, 2018Applicant: Industrial Technology Research InstituteInventors: Wei-Ta Yang, Yen-Yi Chu, Ming-Tsung Hong, Li-Chun Liang, Yun-Ching Lee, Meng-Song Yin, Hsi-Yi Chin
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Publication number: 20170342200Abstract: An oligomer, composition, and composite material employing the same are provided. The oligomer can be a reaction product of a reactant (a) and a reactant (b). The reactant (a) is a reaction product of a reactant (c) and a reactant (d). The reactant (b) can be or a combination thereof, wherein a is 0 or 1, and R1 is independently hydrogen or and wherein b is 0-6; c is 0 or 1; and, d is 0-6. The reactant (c) is wherein R2 is C5-10 alkyl group. The reactant (d) is wherein e is 0-10.Type: ApplicationFiled: December 30, 2016Publication date: November 30, 2017Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Ming-Tsung HONG, Yun-Ching LEE, Wei-Ta YANG, Meng-Song YIN
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Publication number: 20170342199Abstract: An oligomer, composition, and composite material employing the same are provided. The oligomer has a structure represented by Formula (I) wherein R1 and R2 are independently hydrogen, C1-20 alkyl group, C2-20 alkenyl group, C6-12 aryl group, C6-12 alkylaryl group, C5-12 cycloalkyl group, C6-20 cycloalkylalkyl group, alkoxycarbonyl group, or alkylcarbonyloxy group; R1 is not hydrogen when R2 is hydrogen; a is 0 or 1; n?0; m?1; n:m is from 0:100 to 99:1; the oligomer has a number average molecular weight of less than or equal to 12,000; and the repeat unit and the repeat unit are arranged in a random or block fashion.Type: ApplicationFiled: December 29, 2016Publication date: November 30, 2017Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Wei-Ta YANG, Yen-Yi CHU, Ming-Tsung HONG, Li-Chun LIANG, Yun-Ching LEE, Meng-Song YIN
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Patent number: 9236169Abstract: Provided is an electromagnetic wave shielding structure, including: a substrate; and a porous composite film formed on the substrate, wherein the porous composite film includes a continuous phase network fused from a plurality of metal nanoparticles, a first resin composition coated on a surface of the continuous phase network and a plurality of holes which are void spaces in the continuous phase network coated with the first resin composition.Type: GrantFiled: May 9, 2013Date of Patent: January 12, 2016Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Ming-Tsung Hong, Yun-Ching Lee, Li-Chun Liang, Wei-Ta Yang
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Publication number: 20140141232Abstract: Provided is an electromagnetic wave shielding structure, including: a substrate; and a porous composite film formed on the substrate, wherein the porous composite film includes a continuous phase network fused from a plurality of metal nanoparticles, a first resin composition coated on a surface of the continuous phase network and a plurality of holes which are void spaces in the continuous phase network coated with the first resin composition.Type: ApplicationFiled: May 9, 2013Publication date: May 22, 2014Applicant: Industrial Technology Research InstituteInventors: Ming-Tsung HONG, Yun-Ching LEE, Li-Chun LIANG, Wei-Ta YANG
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Patent number: 7803425Abstract: A nanoporous film and fabrication method thereof. The method for fabricating nanoporous film comprising: providing a substrate with a surface; forming a coating of a composition on the surface, curing the coating to polymerize the oxide gel, thereby forming an organic/inorganic hybrid film; and dissolving the template from the organic/inorganic hybrid film by an organic solvent. Specifically, the composition comprises the following components: an oxide gel, a template and an initiator.Type: GrantFiled: August 29, 2005Date of Patent: September 28, 2010Assignee: Industrial Technology Research InstituteInventors: Wu-Jing Wang, Yen-Po Wang, Yun-Ching Lee, Joung-Yei Chen, Hsi-Hsin Shih, Hsein-Pin Chen
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Patent number: 7659352Abstract: An antireflective coating composition, antireflection films and fabrication method thereof. The antireflection film is constructed by stacked crosslink colloid particles, having a plurality of nanopores distributed uniformly therein. Due to the nanopores, the antireflection film has a refractive index less than 1.45, reducing the reflectivity of less than 3.0%. Furthermore, since the antireflection film comprises crosslink oxide colloid, the film exhibits superior mechanical strength and is suitable for use in display devices.Type: GrantFiled: September 9, 2005Date of Patent: February 9, 2010Assignee: Industrial Technology Research InstituteInventors: Wu-Jing Wang, Yen-Po Wang, Yun-Ching Lee, Joung-Yei Chen, Hsi-Hsin Shih
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Publication number: 20070153909Abstract: A method for image encoding is provided, which are capable of encoding video images using a lower memory bandwidth. The method includes the following steps. First, a reference window of a reference frame is read and the position of the reference window is called a first position. Secondly, macroblocks of at least two of the estimated frames are read, and the position of macroblocks is called a second position, wherein the second position corresponds to the first position. Next, block matching is executed between macroblocks and the reference window. Finally, reading position of the first position and the second position are changed, and then the above steps are repeated until block matching of all macroblocks within at least two of the frames is finished in the estimated frames.Type: ApplicationFiled: December 28, 2006Publication date: July 5, 2007Applicant: SUNPLUS TECHNOLOGY CO., LTD.Inventors: YUN-CHING LEE, PAI-CHU HSIEH, HSIN-TZU LIU
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Publication number: 20060099407Abstract: An antireflective coating composition, antireflection films and fabrication method thereof. The antireflection film is constructed by stacked crosslink colloid particles, having a plurality of nanopores distributed uniformly therein. Due to the nanopores, the antireflection film has a refractive index less than 1.45, reducing the reflectivity of less than 3.0%. Furthermore, since the antireflection film comprises crosslink oxide colloid, the film exhibits superior mechanical strength and is suitable for use in display devices.Type: ApplicationFiled: September 9, 2005Publication date: May 11, 2006Inventors: Wu-Jing Wang, Yen-Po Wang, Yun-Ching Lee, Joung-Yei Chen, Hsi-Hsin Shih
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Publication number: 20060046045Abstract: A nanoporous film and fabrication method thereof. The nanoporous film according to the present invention has a plurality of nanopores distributed uniformly therein. Due to the nanopores, the nanoporous film has a refractive index less than 1.45, reducing the reflectivity of less than 3.0%. Furthermore, since the nanoporous film comprises organic-inorganic hybrid with a high crosslink density, the film exhibits superior mechanical strength and is highly suitable for use as anti-reflection and anti-abrasion coatings.Type: ApplicationFiled: August 29, 2005Publication date: March 2, 2006Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Wu-Jing Wang, Yen-Po Wang, Yun-Ching Lee, Joung-Yei Chen, Hsi-Hsin Shih, Hsein-Pin Chen
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Patent number: D1018907Type: GrantFiled: November 15, 2021Date of Patent: March 19, 2024Assignee: CHENG UEI PRECISION INDUSTRY CO., LTD.Inventors: Yun-Chien Lee, Yi-Ching Hsu, Pei-Yi Lin, Yu-Hung Su, Sheng-Yuan Huang, Chun-Fu Lin