Patents by Inventor Yun-Jun KIM

Yun-Jun KIM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

HARDMASK COMPOSITION, METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERNS

Publication number: 20150004531

Abstract: A hardmask composition includes a monomer represented by the following Chemical Formula 1, a polymer including a moiety represented by the following Chemical Formula 2, a polymer including a moiety represented by the following Chemical Formula 3, or a combination thereof, and a solvent,

Type: Application

Filed: April 28, 2014

Publication date: January 1, 2015

Inventors: Yoo-Jeong CHOI, Yun-Jun KIM, Go-Un KIM, Young-Min KIM, Hea-Jung KIM, Joon-Young MOON, Yo-Choul PARK, Yu-Shin PARK, You-Jung PARK, Hyun-Ji SONG, Seung-Wook SHIN, Yong-Woon YOON, Chung-Heon LEE, Seung-Hee HONG
MONOMER FOR HARDMASK COMPOSITION AND HARDMASK COMPOSITION INCLUDING THE MONOMER AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION

Publication number: 20150001178

Abstract: A monomer for a hardmask composition is represented by the following Chemical Formula 1,

Type: Application

Filed: April 22, 2014

Publication date: January 1, 2015

Inventors: Hyun-Ji SONG, Yun-Jun KIM, Go-Un KIM, Young-Min KIM, Hea-Jung KIM, Joon-Young MOON, Yo-Choul PARK, Yu-Shin PARK, You-Jung PARK, Seung-Wook SHIN, Yong-Woon YOON, Chung-Heon LEE, Yoo-Jeong CHOI, Seung-Hee HONG
MONOMER FOR A HARDMASK COMPOSITION, HARDMASK COMPOSITION COMPRISING THE MONOMER, AND METHOD FOR FORMING A PATTERN USING THE HARDMASK COMPOSITION

Publication number: 20140342273

Abstract: Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same. In Chemical Formula 1, A, A?, L and n are the same as in the detailed description.

Type: Application

Filed: November 29, 2012

Publication date: November 20, 2014

Inventors: Yun-Jun Kim, Hwan-Sung Cheon, Youn-Jin Cho, Yong-Woon Yoon, Chung-Heon Lee, Hyo-Young Kwon, Yoo-Jeong Choi
HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERNS

Publication number: 20140183701

Abstract: A hardmask composition includes a monomer represented by the following Chemical Formula 1 and an aromatic ring-containing polymer,

Type: Application

Filed: September 26, 2013

Publication date: July 3, 2014

Inventors: Yoo-Jeong CHOI, Yun-Jun KIM, Joon-Young MOON, Bum-Jin LEE, Chung-Heon LEE, Youn-Jin CHO
MONOMER FOR HARDMASK COMPOSITION AND HARDMASK COMPOSITION INCLUDING THE MONOMER AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION

Publication number: 20140186775

Abstract: A monomer for a hardmask composition is represented by the following Chemical Formula 1,

Type: Application

Filed: November 14, 2013

Publication date: July 3, 2014

Inventors: Bum-Jin LEE, Yun-Jun KIM, Youn-Jin CHO

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HARDMASK COMPOSITION, METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERNS

MONOMER FOR HARDMASK COMPOSITION AND HARDMASK COMPOSITION INCLUDING THE MONOMER AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION

MONOMER FOR A HARDMASK COMPOSITION, HARDMASK COMPOSITION COMPRISING THE MONOMER, AND METHOD FOR FORMING A PATTERN USING THE HARDMASK COMPOSITION

HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERNS

MONOMER FOR HARDMASK COMPOSITION AND HARDMASK COMPOSITION INCLUDING THE MONOMER AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION