Abstract: A method for detecting a stochastic weak point of a layout pattern of a semiconductor integrated circuit includes: forming a semiconductor integrated circuit by exposing a wafer which is masked by a layout pattern and coated with a photoresist to light, and etching the circuit according to the layout pattern, calculating line edge roughness (LER) of the circuit, and calculating a variability constant for fitting the line edge roughness to a normal distribution from a polymer concentration value of the photoresist. The polymer concentration value is calculated from modeling the layout pattern, a total value of intensity of light reaching the photoresist, and an intensity value of light reaching one point of the photoresist. The method further includes calculating a probability distribution of the polymer concentration value of the layout pattern based on the variability constant, and calculating a stochastic weak point of the layout pattern from the probability distribution.

Abstract: A method for detecting a stochastic weak point of a layout pattern of a semiconductor integrated circuit includes: forming a semiconductor integrated circuit by exposing a wafer which is masked by a layout pattern and coated with a photoresist to light, and etching the circuit according to the layout pattern, calculating line edge roughness (LER) of the circuit, and calculating a variability constant for fitting the line edge roughness to a normal distribution from a polymer concentration value of the photoresist. The polymer concentration value is calculated from modeling the layout pattern, a total value of intensity of light reaching the photoresist, and an intensity value of light reaching one point of the photoresist. The method further includes calculating a probability distribution of the polymer concentration value of the layout pattern based on the variability constant, and calculating a stochastic weak point of the layout pattern from the probability distribution.

Abstract: The present invention relates to a novel YlMPO1 gene which plays an important role in mannosylphosphorylation of an industrial yeast Yarrowia lipolytica, and to a method for preparing a host system capable of producing recombinant glycoproteins free of mannosylphosphate by disruption of the gene. The mannosylphosphorylation is suppressed by the disruption of YlMPO1 gene according to the present invention, thereby achieving humanization of glycosylation pathway of Yarrowia lipolytica.

Abstract: The present invention relates to a novel YlMPOl gene which plays an important role in mannosylphosphorylation of an industrial yeast Yarrowia lipolytica, and to a method for preparing a host system capable of producing recombinant glycoproteins free of mannosylphosphate by disruption of the gene. The mannosylphosphorylation is suppressed by the disruption of YlMPOl gene according to the present invention, thereby achieving humanization of glycosylation pathway of Yarrowia lipolytica.