Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.

Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.

Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.

Abstract: Provided are a plasma generating apparatus and a substrate treating apparatus. The plasma generating apparatus includes a plurality of ground electrodes arranged inside a vacuum container and extending parallel to each other and power electrodes arranged between the ground electrodes. An area where a distance between the ground electrode and the power electrode is constant exists, and the power electrodes are tapered in a direction facing the substrate. The power electrodes are connected to an RF power source, and height of the power electrode is greater than that of the ground electrode in the direction facing the substrate.

Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.

Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.

Abstract: Provided are a plasma generating apparatus and a substrate treating apparatus. The plasma generating apparatus includes a plurality of ground electrodes arranged inside a vacuum container and extending parallel to each other and power electrodes arranged between the ground electrodes. An area where a distance between the ground electrode and the power electrode is constant exists, and the power electrodes are tapered in a direction facing the substrate. The power electrodes are connected to an RF power source, and height of the power electrode is greater than that of the ground electrode in the direction facing the substrate.

Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.

Abstract: A flexible electric device includes a first electrode on a flexible member, at least one semiconductor element on the first electrode, at least one filling region adjacent to the semiconductor element and a second electrode on the semiconductor element.

Abstract: A wireless device and method for managing a multicast group within a wireless network are disclosed. The wireless device is included in a first multicast group in which data is directly sent between member devices or data is sent using hopping between the member devices. The wireless device includes a reception unit, a determination unit, and a transmission unit. The reception unit receives a join request for joining a second multicast group from a joining device that attempts to join the second multicast group. The determination unit extracts information about the second multicast group from the join request, and determines whether the second multicast group is identical with the first multicast group based on the information about the second multicast group. The transmission unit forwards the join request to another device or sends a response to the join request to the joining device based on a result of the determination.

Abstract: An inductively-coupled plasma (ICP) generation system may include a dielectric tube, a first inductive coil structure to enclose the dielectric tube, an RF power supply, a first main capacitor between a positive output terminal of the RF power supply and one end of the first inductive coil structure, and a second main capacitor between a negative output terminal of the RF power supply and an opposite end of the first inductive coil structure. The first inductive coil structure may include inductive coils connected in series to each other and placed at different layers, the inductive coils having at least one turn at each layer, and auxiliary capacitors, which are respectively provided between adjacent ones of the inductive coils to distribute a voltage applied to the inductive coils.

Abstract: The present invention discloses a method for providing reliable multicasting service in wireless network. The disclosed method groups a plurality of receiving nodes into a plurality of receiving groups, and decides the ACK transmission time point against each receiving group, which is not overlapped with other receiving groups. The receiving node contained in each receiving group transmits ACK against the received data frame at the ACK transmission time point, which is decided according to the corresponding receiving group.

Abstract: A wireless device and method for managing a multicast group within a wireless network are disclosed. The wireless device is included in a first multicast group in which data is directly sent between member devices or data is sent using hopping between the member devices. The wireless device includes a reception unit, a determination unit, and a transmission unit. The reception unit receives a join request for joining a second multicast group from a joining device that attempts to join the second multicast group. The determination unit extracts information about the second multicast group from the join request, and determines whether the second multicast group is identical with the first multicast group based on the information about the second multicast group. The transmission unit forwards the join request to another device or sends a response to the join request to the joining device based on a result of the determination.

Abstract: A flexible electric device includes a first electrode on a flexible member, at least one semiconductor element on the first electrode, at least one filling region adjacent to the semiconductor element and a second electrode on the semiconductor element.

Abstract: The present invention discloses a method for providing reliable multicasting service in wireless network. The disclosed method groups a plurality of receiving nodes into a plurality of receiving groups, and decides the ACK transmission time point against each receiving group, which is not overlapped with other receiving groups. The receiving node contained in each receiving group transmits ACK against the received data frame at the ACK transmission time point, which is decided according to the corresponding receiving group.

Abstract: A device and method of storing and displaying a music file list in a mobile communication terminal using a hot key are provided. More particularly, a method for storing a music file list by pressing the hot key for an extended period and displaying the music file list by pressing the key for an abbreviated period is provided. A specific music file list is selected from at least one music file list displayed in a music file playback mode. If a number key input occurs after selecting the specific music file list, a determination is made as to whether the number key input is a long press input or short press input. If the number key input is a long press input, the music file list is stored into the number of the number key. If the number key input is a short press input, the music file list stored into the number is displayed. The method facilitates the simple storage and display of a music file list through a hot key input to ultimately increase user convenience.

Abstract: Provided are a plasma generating apparatus and a substrate treating apparatus. The plasma generating apparatus includes a plurality of ground electrodes arranged inside a vacuum container and extending parallel to each other and power electrodes arranged between the ground electrodes. An area where a distance between the ground electrode and the power electrode is constant exists, and the power electrodes are tapered in a direction facing the substrate. The power electrodes are connected to an RF power source, and height of the power electrode is greater than that of the ground electrode in the direction facing the substrate.

Abstract: Provided is a plasma generator which includes a vacuum chamber, a plurality of ground electrodes disposed inside the vacuum container and extending in parallel to each other, a plurality of power electrodes disposed between the ground electrodes inside the vacuum container, and a plurality of electrodes dielectrics disposed between the power electrodes and the ground electrodes inside the vacuum container. The power electrodes are connected to an RF power source.

Abstract: A method for storing a music file in a mobile communication terminal using a number key of the mobile terminal includes: designating a specific music file from at least one music file displayed in a music file playback mode; inputting a number of a music file list in which the designated music file is to be stored, using a corresponding number key; and storing the designated music file in the music file list having the input number. The method simplifies the storage of a music file in a mobile terminal and also facilitates changing the location of a music file stored in a music file list.

Abstract: A device and method of storing and displaying a music file list in a mobile communication terminal using a hot key are provided. More particularly, a method for storing a music file list by pressing the hot key for an extended period and displaying the music file list by pressing the key for an abbreviated period is provided. A specific music file list is selected from at least one music file list displayed in a music file playback mode. If a number key input occurs after selecting the specific music file list, a determination is made as to whether the number key input is a long press input or short press input. If the number key input is a long press input, the music file list is stored into the number of the number key. If the number key input is a short press input, the music file list stored into the number is displayed. The method facilitates the simple storage and display of a music file list through a hot key input to ultimately increase user convenience.