Abstract: Disclosed is a thin film characteristic measuring apparatus, which is used for measuring the thickness or width of a thin film of an object to be examined. The thin film characteristic measuring apparatus comprises a light source, a first reflecting mirror, a first actuator and a lens assembly. The lens assembly is formed so that the angle formed by an optical axis and a chief ray of the rays transmitted through the lens assembly is less than or equal to the angle formed by the optical axis and a chief ray of the rays incident to the lens assembly. The light source can comprise superluminescent diodes (SLD).

Abstract: A vertical dipole array structure includes a substrate that supports a film, which is not comprised of a negative-index metamaterial. The film includes a plurality of tilt-oriented portions and apertures. At least two of the tilt-oriented portions are separated by an aperture, and the tilt-oriented portions are configured such that incident radiation is redirected into a negative or positive refraction direction.

Abstract: A vertical dipole array structure includes a substrate that supports a film, which is not comprised of a negative-index metamaterial. The film includes a plurality of tilt-oriented portions and apertures. At least two of the tilt-oriented portions are separated by an aperture, and the tilt-oriented portions are configured such that incident radiation is redirected into a negative or positive refraction direction.

Abstract: A vertical dipole array structure includes a substrate that supports a film, which is not comprised of a negative-index metamaterial. The film includes a plurality of tilt-oriented portions and apertures. At least two of the tilt-oriented portions are separated by an aperture, and the tilt-oriented portions are configured such that incident radiation is redirected into a negative or positive refraction direction.

Abstract: A nanostructured optical device includes a metal film or a plurality of metal islands having an array of a plurality of openings having a width that is less than at least one first predetermined wavelength of incident radiation to be provided onto the film or the islands. The metal film or islands are configured such that the incident radiation is resonant with at least one plasmon mode on the metal film or metal islands.

Abstract: A nanostructured optical device includes a metal film or a plurality of metal islands having an array of a plurality of openings having a width that is less than at least one first predetermined wavelength of incident radiation to be provided onto the film or the islands. The metal film or islands are configured such that the incident radiation is resonant with at least one plasmon mode on the metal film or metal islands.

Abstract: A Fabry-Perot cavity filter includes a first mirror and a second mirror. A gap between the first and the second mirror monotonically varies as a function of width of the filter. This filter may be used with photodetector and a channel selection filter in an optical device, such as a spectrum analyzer. The channel selection filter may be a metal nanooptic filter array which includes plurality of subwavelength apertures in a metal film or between metal islands.

Abstract: A metal nanowire array acts as a band pass filter in the visible to IR range. The filter may be used in a monochromator, spectrometer, color camera, analyte detector or other devices.

Abstract: A metal nanowire array acts as a band pass filter in the visible to IR range. The filter may be used in a monochromator, spectrometer, color camera, analyte detector or other devices.