Patents by Inventor Yun-Sung Jang

Yun-Sung Jang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230329979
    Abstract: Provided is a biostable radiopaque substance that is absorbed within living tissue or inflammatory lesion in living tissue and uses thereof. The radiopaque substance does not cause an inflammatory reaction in surrounding tissue and is rapidly absorbed before healing occurs, thereby not interfering with healing and regeneration of damaged tissue. Therefore, the radiopaque substance of the present disclosure can be included in a biotransplantation material, for example, a root canal filling material for endodontic treatment, and be effectively used.
    Type: Application
    Filed: June 22, 2023
    Publication date: October 19, 2023
    Applicant: Maruchi Co., Ltd.
    Inventors: Sung Wook JANG, Yun Sung Jang
  • Patent number: 9732419
    Abstract: A gas blocking layer forming apparatus comprises a vacuum chamber that provides a space where a chemical vapor deposition process and a sputtering process are performed; a holding unit that is provided at a lower side within the vacuum chamber and mounts thereon a target object on which an organic/inorganic mixed multilayer gas blocking layer is formed; a neutral particle generation unit that is provided at an upper side within the vacuum chamber and generates a neutral particle beam having a high-density flux with a current density of about 10 A/m2 or more; and common sputtering devices that are provided at both sides of the neutral particle generation unit, wherein each common sputtering device has a sputtering target of which a surface is inclined toward a surface of the target object.
    Type: Grant
    Filed: February 15, 2013
    Date of Patent: August 15, 2017
    Assignee: KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION
    Inventors: MunPyo Hong, You Jong Lee, Yun-Sung Jang, Jun Young Lee
  • Publication number: 20120000775
    Abstract: Disclosed is an apparatus for forming an electronic material layer, in which charged particles damaging the electronic material layer are prevented from arriving at a substrate but processing gas ions maximizing activation of the electronic material layer are accelerated and passed while the electronic material layer is formed on the substrate or the substrate having a functional layer thereon by sputtering, thereby forming the electronic material layer having good electrical/physical characteristics at room temperature.
    Type: Application
    Filed: April 13, 2011
    Publication date: January 5, 2012
    Applicant: KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION
    Inventors: Mun Pyo Hong, Yoo Jong Lee, Yun-Sung Jang