Patents by Inventor Yun-Yen Yang

Yun-Yen Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods and apparatus for reducing charging during plasma processing
    Patent number: 5904571
    Abstract: An apparatus and method in a plasma processing chamber for reducing charging of a wafer is described. A plasma generating element is configured to cause a plasma including ions and free radicals to be formed in a plasma generating region. A plasma diffusion region is configured so that plasma generated in the plasma generating region can diffuse through the plasma diffusion region. A conductive grid is positioned within the plasma diffusion region between the wafer and the plasma generating region. The conductive grid includes a mesh which is configured to trap a portion of the ions so that a portion of the ions are prevented from diffusing through the diffusion region to reach the wafer.
    Type: Grant
    Filed: June 28, 1996
    Date of Patent: May 18, 1999
    Assignee: Lam Research Corp.
    Inventors: Roger Patrick, Phillip L. Jones, Kambiz Fallahpour, Yun-Yen Yang, Wen-Ben Chou