Abstract: A method for fabricating semiconductor devices includes forming channel regions over a substrate. The channel regions, in parallel with one another, extend along a first lateral direction. Each channel region includes at least a respective pair of epitaxial structures. The method includes forming a gate structure over the channel regions, wherein the gate structure extends along a second lateral direction. The method includes removing, through a first etching process, a portion of the gate structure that was disposed over a first one of the channel regions. The method includes removing, through a second etching process, a portion of the first channel region. The second etching process includes one silicon etching process and one silicon oxide deposition process. The method includes removing, through a third etching process controlled based on a pulse signal, a portion of the substrate that was disposed below the removed portion of the first channel region.

Abstract: A method for standardizing image annotation includes receiving a defect pattern; marking an image according to the defect pattern to generate a first judgement result; marking the image according to the defect pattern to generate a second judgement result; comparing the first judgement result and the second judgement result to obtain a comparison result; and updating the defect pattern according to the comparison result to standardize the defect pattern. The method for standardizing image annotation of the present specification can improve the marking stability of the training data of a trained image recognition algorithm, thereby improving the accuracy of image recognition of the trained image recognition algorithm.

Abstract: A method for standardizing image annotation includes receiving a defect pattern; marking an image according to the defect pattern to generate a first judgement result; marking the image according to the defect pattern to generate a second judgement result; comparing the first judgement result and the second judgement result to obtain a comparison result; and updating the defect pattern according to the comparison result to standardize the defect pattern. The method for standardizing image annotation of the present specification can improve the marking stability of the training data of a trained image recognition algorithm, thereby improving the accuracy of image recognition of the trained image recognition algorithm.